JPH11121366A5 - - Google Patents

Info

Publication number
JPH11121366A5
JPH11121366A5 JP1997303437A JP30343797A JPH11121366A5 JP H11121366 A5 JPH11121366 A5 JP H11121366A5 JP 1997303437 A JP1997303437 A JP 1997303437A JP 30343797 A JP30343797 A JP 30343797A JP H11121366 A5 JPH11121366 A5 JP H11121366A5
Authority
JP
Japan
Prior art keywords
light
receiving system
shot area
photosensitive substrate
light receiving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1997303437A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11121366A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9303437A priority Critical patent/JPH11121366A/ja
Priority claimed from JP9303437A external-priority patent/JPH11121366A/ja
Publication of JPH11121366A publication Critical patent/JPH11121366A/ja
Publication of JPH11121366A5 publication Critical patent/JPH11121366A5/ja
Withdrawn legal-status Critical Current

Links

JP9303437A 1997-10-18 1997-10-18 投影露光方法および装置 Withdrawn JPH11121366A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9303437A JPH11121366A (ja) 1997-10-18 1997-10-18 投影露光方法および装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9303437A JPH11121366A (ja) 1997-10-18 1997-10-18 投影露光方法および装置

Publications (2)

Publication Number Publication Date
JPH11121366A JPH11121366A (ja) 1999-04-30
JPH11121366A5 true JPH11121366A5 (enExample) 2005-06-30

Family

ID=17921001

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9303437A Withdrawn JPH11121366A (ja) 1997-10-18 1997-10-18 投影露光方法および装置

Country Status (1)

Country Link
JP (1) JPH11121366A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001015420A (ja) * 1999-06-30 2001-01-19 Toshiba Corp 半導体ウエハのパターン露光方法およびパターン露光装置
KR100689841B1 (ko) * 2006-02-13 2007-03-08 삼성전자주식회사 반도체 제조장치용 레벨링 알고리듬 및 관련된 장치
CN115921232A (zh) * 2022-12-29 2023-04-07 上海集成电路研发中心有限公司 胶液旋涂装置、控制方法和系统

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