JPH10500950A - ω−ヒドロフルオロアルキルエーテル類、その前駆物質のカルボン酸類と誘導体およびそれらの製造方法と用途 - Google Patents
ω−ヒドロフルオロアルキルエーテル類、その前駆物質のカルボン酸類と誘導体およびそれらの製造方法と用途Info
- Publication number
- JPH10500950A JPH10500950A JP7530369A JP53036995A JPH10500950A JP H10500950 A JPH10500950 A JP H10500950A JP 7530369 A JP7530369 A JP 7530369A JP 53036995 A JP53036995 A JP 53036995A JP H10500950 A JPH10500950 A JP H10500950A
- Authority
- JP
- Japan
- Prior art keywords
- carbon atoms
- group
- ether
- chain
- branched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
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- C07C43/02—Ethers
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Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.一般式: X-Rf-O-(Rf'-O)n-Rf''-H (式中、Hは第一級水素原子であり、 Xはフッ素原子、第一級水素原子または第一級塩素原子であり、 nは0〜7の整数であり、そして Rf,Rf' およびRf''は独立して、直鎖または分枝鎖で未置換のペルフルオ ロアルキレン基、直鎖または分枝鎖のペルフルオロアルキルもしくはペルフルオ ロシクロアルキルで置換されたペルフルオロアルキレン基、およびエーテルの酸 素を含有する部分で置換された直鎖または分枝鎖のペルフルオロアルキレン基か らなる群から選択された、 但し、XがHまたはClの場合、Rfは1〜18個の連鎖炭素原子を有し、Rf' は 1〜12個の連鎖炭素原子を有しそしてRf''は2〜12個の連鎖炭素原子を有し、 さらにXがFの場合、Rfは少なくとも4個の連鎖炭素原子を有し、Rf' は1 個以上の連鎖原子を有し、そしてRf''は2個以上の連鎖炭素原子を有する) で表される、通常液条のω−ヒドロフルオロアルキルエーテル化合物。 2.一般式: X-Rf-O-(Rf'-O)n-Rf''-H (式中、Hは第一級水素原子であり、 Xはフッ素原子、第一級水素原子または第一級塩素原子であり、 nは0〜7の整数であり、そして Rf,Rf' およびRf''は独立して、直鎖または分枝鎖で未置換のペルフルオ ロアルキレン基、直鎖または分枝鎖のペルフルオロアルキルもしくはペルフロオ ロシクアルで置換されたペルフルオロ アルキレン基、およびエーテルの酸素を含有する部分で置換された直鎖または分 枝鎖のペルフルオロアルキル基からなる群から選択され、 但し、XがHまたはClの場合、Rfは1〜18個の連鎖炭素原子を有し、そして Rf' とRf''は各々独立して1〜12個の連鎖炭素原子を有し、そして さらに、XがFの場合、Rfは少なくとも4個の連鎖炭素原子を有し、そして Rf' とRf''は各々独立して1個以上の連鎖炭素原子を有し、そして さらにnがゼロの場合、Rfはペルフルオロシクロアルキルで置換されたペル フルオロアルキレン基である) で表される、通常液状のω−ヒドロフルオロアルキルエーテル化合物。 3.対応する前駆物質のフルオロアルキルエーテルカルボン酸、前記カルボン 酸の加水分解可能な誘導体、または前記カルボン酸もしくは前記誘導体に加水分 解可能な前駆物質を脱炭酸することを含んでなり、前記脱炭酸が、前記前駆物質 のカルボン酸またはエステルと、プロトン性溶媒に無機塩基を溶解した溶液と接 触させ、得られた反応混合物を加熱することによって実施される、請求項1記載 のω−ヒドロフルオロアルキルエーテル化合物を製造する方法。 4.請求の項1記載のω−ヒドロフルオロアルキルエーテルを含んでなる液状 組成物に表面を接触させることからなる、表面から水を除く方法。 5.はんだ付けされる部材を、フッ素化液体の蒸気内に浸漬するかまたは包ん ではんだを溶融させ、次いで該部材を該蒸気体から引き出す蒸気相はんだ付け法 において、フッ素化液体として、請求項1記載のω−ヒドロフルオロアルキルエ ーテル化合物を少なくとも 1種含んでなる組成物を用いることを含んでなる改良。 6.1)請求項1記載のω−ヒドロフルオロアルキルエーテル化合物を少なく とも1種含んでなる発泡剤混合物、 2)触媒、および 3)界面活性剤、 の存在下において、有機ポリイソシアネートと、少なくとも2個の反応性水素 原子を含有する高分子量の化合物とを混合する工程を含んでなる発泡プラスチッ クの製造方法。 7.物品を、請求項1に記載のω−ヒドロフルオロアルキルエーテル化合物を 少なくとも1種含んでなる組成物と接触させることを含んでなる、物品から汚染 物を除去する方法。 8.請求項1記載のω−ヒドロフルオロアルキルエーテル化合物を少なくとも 1種含んでなる組成物を火に加えることを含んでなる消火方法。 9.少なくとも1個の-CF2Cl基を含有する少なくとも1種の化合物を水素ガス と接触させる工程を含んでなり、前記接触を、塩基の溶液および触媒量の少なく とも1種の金属もしくは担持型金属の両者の存在下において、約200℃未満の温 度で実施し、前記金属がニッケル、パラジウムおよび白金からなる群から選択さ れる、-CF2Cl基を-CF2H 基に変換する方法。 10.式: Rfs-O-(CF2)b-Z (式中、Rfsは1〜18個の炭素原子を有する連鎖または分枝類のペルフルオロア ルキル基であり、 “b”は少なくとも3の整数であり、そして Zは、COOH,-COOM1/v,-COONH4,-COOR,-CH2OH,-COF,-COCl,-COR,CONRR ,-CH2NH2,-CH2NCO,-CN,-CH2OSO2R,-CH2OCOR,-CH2OCOCR=CH2,-CONH(CH2)m Si(OR)3および-CH2O(CH2)mSi(OR)3か らなる群から選択され、これらの基において、Mはアンモニウム基または原子価 “V”が1〜4の金属原子であり、各Rは独立して、1〜14個の炭素原子を有す るアルキル基、1〜14個の炭素原子を有するフルオロアルキル基、6〜10個の環 炭素原子を有するアリール基、および1〜14個の炭素原子と、1〜14個の炭素原 子を有するフルオロアルキル基と、6〜10個の環炭素原子を有するアリール基と を有するヘテロ原子含有アルキル基からなる群から選択され、そしてmは1〜11 の整数である)で表される化合物。 11.式: Rft-(O-Rft')c-O-(CF2)b-Z (式中、Rft' は1〜18個の炭素原子を有する連鎖または分枝類のペルフルオロ アルキレン基であり、 Rft' は1〜11個の炭素原子を有する直鎖または分枝鎖のペルフルオロアルキ レン基であり、 cは少なくとも1の整数であり、 dは少なくとも3の整数であり、そして Zは、COOH,-COOM1/v,-COONH4,-COOR,-CH2OH,-COF,-COCl,-COR,CONRR ,-CH2NH2,-CH2NCO,-CN,-CH2OSO2R,-CH2OCOR,-CH2OCOCR=CH2,-CONH(CH2)m Si(OR)3および-CH2O(CH2)mSi(OR)3からなる群から選択され、これらの基におい て、Mはアンモニウム基または原子価“V”が1〜4の金属原子であり、各Rは 独立して、1〜14個の炭素原子を有するアルキル基、1〜14個の炭素原子を有す るフルオロアルキル基、6〜10個の環炭素原子を有するアリール基、および1〜 14個の炭素原子と、1〜14個の炭素原子を有するフルオロアルキル基と、6〜10 個の環炭素原子を有するアリール基とを有するヘテロ原子含有アルキル基からな る群から選択され、そしてmは1〜11の整数である)で表される化合物。
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US08/246,962 | 1994-05-20 | ||
US08/246,962 US5476974A (en) | 1994-05-20 | 1994-05-20 | Omega-hydrofluoroalkyl ethers, precursor carboxylic acids and derivatives thereof, and their preparation and application |
US08/440,450 | 1995-05-12 | ||
US08/440,450 US5658962A (en) | 1994-05-20 | 1995-05-12 | Omega-hydrofluoroalkyl ethers, precursor carboxylic acids and derivatives thereof, and their preparation and application |
PCT/US1995/006110 WO1995032174A1 (en) | 1994-05-20 | 1995-05-15 | Omega-hydrofluoroalkyl ethers, precursor carboxylic acids and derivatives thereof, and their preparation and application |
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JP2004000846A Division JP3971389B2 (ja) | 1994-05-20 | 2004-01-06 | ω−ヒドロフルオロアルキルエーテル類、その前駆物質のカルボン酸類と誘導体およびそれらの製造方法と用途 |
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JP2004000846A Expired - Fee Related JP3971389B2 (ja) | 1994-05-20 | 2004-01-06 | ω−ヒドロフルオロアルキルエーテル類、その前駆物質のカルボン酸類と誘導体およびそれらの製造方法と用途 |
JP2006321806A Pending JP2007186679A (ja) | 1994-05-20 | 2006-11-29 | ω−ヒドロフルオロアルキルエーテル化合物の用途 |
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JP2006321806A Pending JP2007186679A (ja) | 1994-05-20 | 2006-11-29 | ω−ヒドロフルオロアルキルエーテル化合物の用途 |
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- 1995-05-15 CN CN95193106A patent/CN1110473C/zh not_active Expired - Fee Related
- 1995-05-15 WO PCT/US1995/006110 patent/WO1995032174A1/en active IP Right Grant
- 1995-05-15 EP EP01120757A patent/EP1170275A3/en not_active Ceased
- 1995-05-15 CA CA002190116A patent/CA2190116A1/en not_active Abandoned
- 1995-05-15 JP JP53036995A patent/JP3590067B2/ja not_active Expired - Fee Related
- 1995-05-15 RU RU96124387/04A patent/RU2177934C2/ru not_active IP Right Cessation
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1997
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1998
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2002
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2006
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JP2003213251A (ja) * | 2001-10-23 | 2003-07-30 | Ausimont Spa | 電離放射線および/または中性子照射の存在下での熱交換用または作動液としてのフッ素化液体の使用 |
JP2004027178A (ja) * | 2002-01-08 | 2004-01-29 | Ausimont Spa | フッ素化液体の使用 |
WO2005003075A1 (ja) * | 2003-07-02 | 2005-01-13 | Daikin Industries, Ltd. | フルオロアルキルカルボン酸誘導体、含フッ素重合体の製造方法及び含フッ素重合体水性分散液 |
US7589234B2 (en) | 2003-07-02 | 2009-09-15 | Daikin Industries, Ltd. | Fluoroalkyl carboxylic acid derivative, method for producing fluorine-containing polymer, and aqueous dispersion of fluorine-containing polymer |
US8198480B2 (en) | 2003-07-02 | 2012-06-12 | Daikin Industries, Ltd. | Fluoroalkyl carboxylic acid derivative, method for producing fluorine-containing polymer, and aqueous dispersion of fluorine-containing polymer |
EP2082891A2 (en) | 2008-01-16 | 2009-07-29 | Sony Corporation | Thermal transfer recording medium |
JP2011527308A (ja) * | 2008-07-08 | 2011-10-27 | ソルヴェイ・ソレクシス・エッセ・ピ・ア | フルオロ界面活性剤の製造方法 |
US8822136B2 (en) | 2011-10-27 | 2014-09-02 | Shin-Etsu Chemical Co., Ltd. | Patterning process and resist composition |
Also Published As
Publication number | Publication date |
---|---|
US20030166487A1 (en) | 2003-09-04 |
CN1110473C (zh) | 2003-06-04 |
US5658962A (en) | 1997-08-19 |
DE69527527D1 (de) | 2002-08-29 |
US6863211B2 (en) | 2005-03-08 |
CN1148377A (zh) | 1997-04-23 |
US6214253B1 (en) | 2001-04-10 |
RU2177934C2 (ru) | 2002-01-10 |
JP2004203889A (ja) | 2004-07-22 |
EP0760809A1 (en) | 1997-03-12 |
US6204299B1 (en) | 2001-03-20 |
JP2007186679A (ja) | 2007-07-26 |
CA2190116A1 (en) | 1995-11-30 |
US20010027172A1 (en) | 2001-10-04 |
EP0760809B1 (en) | 2002-07-24 |
DE69527527T2 (de) | 2003-05-08 |
EP1170275A2 (en) | 2002-01-09 |
EP1170275A3 (en) | 2004-04-14 |
US6491983B2 (en) | 2002-12-10 |
JP3971389B2 (ja) | 2007-09-05 |
WO1995032174A1 (en) | 1995-11-30 |
US6361713B1 (en) | 2002-03-26 |
US6024176A (en) | 2000-02-15 |
JP3590067B2 (ja) | 2004-11-17 |
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