JPH10261580A5 - - Google Patents

Info

Publication number
JPH10261580A5
JPH10261580A5 JP1997083243A JP8324397A JPH10261580A5 JP H10261580 A5 JPH10261580 A5 JP H10261580A5 JP 1997083243 A JP1997083243 A JP 1997083243A JP 8324397 A JP8324397 A JP 8324397A JP H10261580 A5 JPH10261580 A5 JP H10261580A5
Authority
JP
Japan
Prior art keywords
stage
mask
substrate
exposure apparatus
vibration sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997083243A
Other languages
English (en)
Japanese (ja)
Other versions
JP3826481B2 (ja
JPH10261580A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP08324397A external-priority patent/JP3826481B2/ja
Priority to JP08324397A priority Critical patent/JP3826481B2/ja
Priority to US09/039,562 priority patent/US6490025B1/en
Priority to KR1019980009008A priority patent/KR19980080359A/ko
Priority to EP98104791A priority patent/EP0866374A3/en
Priority to TW087103939A priority patent/TW374936B/zh
Publication of JPH10261580A publication Critical patent/JPH10261580A/ja
Publication of JPH10261580A5 publication Critical patent/JPH10261580A5/ja
Publication of JP3826481B2 publication Critical patent/JP3826481B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP08324397A 1997-03-17 1997-03-17 ステージ装置及び制御ユニット Expired - Lifetime JP3826481B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP08324397A JP3826481B2 (ja) 1997-03-17 1997-03-17 ステージ装置及び制御ユニット
US09/039,562 US6490025B1 (en) 1997-03-17 1998-03-16 Exposure apparatus
TW087103939A TW374936B (en) 1997-03-17 1998-03-17 Exposure apparatus
EP98104791A EP0866374A3 (en) 1997-03-17 1998-03-17 Exposure apparatus
KR1019980009008A KR19980080359A (ko) 1997-03-17 1998-03-17 노광장치 및 노광방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP08324397A JP3826481B2 (ja) 1997-03-17 1997-03-17 ステージ装置及び制御ユニット

Publications (3)

Publication Number Publication Date
JPH10261580A JPH10261580A (ja) 1998-09-29
JPH10261580A5 true JPH10261580A5 (enExample) 2005-02-24
JP3826481B2 JP3826481B2 (ja) 2006-09-27

Family

ID=13796897

Family Applications (1)

Application Number Title Priority Date Filing Date
JP08324397A Expired - Lifetime JP3826481B2 (ja) 1997-03-17 1997-03-17 ステージ装置及び制御ユニット

Country Status (1)

Country Link
JP (1) JP3826481B2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4194160B2 (ja) 1998-02-19 2008-12-10 キヤノン株式会社 投影露光装置
JP2004343075A (ja) 2003-04-14 2004-12-02 Asml Netherlands Bv 投影システム及びその使用方法
US7084958B2 (en) * 2004-04-14 2006-08-01 Asml Netherlands B.V. Lithographic apparatus, control system and device manufacturing method
KR100629390B1 (ko) 2004-09-21 2006-09-29 삼성전자주식회사 광학계 위치제어수단을 갖는 반도체 제조용 노광장치 및이를 이용한 노광방법
KR100690882B1 (ko) 2005-03-21 2007-03-09 삼성전자주식회사 반도체 소자 제조용 노광 장비, 진동 감지 및 위치 측정방법, 반도체 소자 제조 방법
US7352436B2 (en) * 2005-06-20 2008-04-01 Asml Netherlands, B.V. Lithographic apparatus, projection apparatus and device manufacturing method
US7936443B2 (en) * 2006-05-09 2011-05-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL1036511A1 (nl) * 2008-02-13 2009-08-14 Asml Netherlands Bv Movable support, position control system, lithographic apparatus and method of controlling a position of an exchangeable object.
JP5561968B2 (ja) * 2009-08-12 2014-07-30 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置、荷電粒子ビーム描画方法および振動成分抽出方法
CN120546399B (zh) * 2025-07-28 2025-10-03 内蒙古优普森电气有限公司 浮选机永磁直驱系统联轴器精准对中安装方法

Similar Documents

Publication Publication Date Title
EP0866374A3 (en) Exposure apparatus
JP3448991B2 (ja) ステージ移動制御装置、投影型露光装置およびステージ駆動方法ならびに露光方法。
JPH10261580A5 (enExample)
JPH11135400A5 (enExample)
EP1347501A4 (en) WAVE FRONT ABERRATION MEASURING INSTRUMENT, WAVE FRONT ABERRATION MEASUREMENT METHOD, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING MICRODISPOSITIVE DEVICE
KR101963012B1 (ko) 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
CN105045044B (zh) 光学装置、投影光学系统、曝光装置及物品的制造方法
US6285437B1 (en) Method for controlling stages, apparatus therefor, and scanning type exposure apparatus
KR960015755A (ko) 주사형 광노출장치
US4880308A (en) Aligning apparatus
JPH0362011B2 (enExample)
KR20000048159A (ko) 서보 제어법 및 전사 투영장치에의 적용
US6008882A (en) Stage device, method of controlling same, and exposure apparatus using said stage device
JPH0743245B2 (ja) アライメント装置
JP3826481B2 (ja) ステージ装置及び制御ユニット
JPH10289943A (ja) ステージ装置およびデバイス製造方法
JP2001140972A (ja) 除振装置
JPH0636990A (ja) 位置合わせ装置及び方法、並びにこれを用いた露光装置と半導体デバイス製造方法
JPH118189A (ja) 露光装置およびデバイス製造方法
JP2705778B2 (ja) 投影露光装置
JP3429783B2 (ja) パターン露光方法およびその装置
JP2001203148A (ja) 露光における間隙測定装置および間隙測定方法
JPH09219361A (ja) 露光装置
JPH09148236A (ja) 露光装置の基板ステージの移動制御方法及び装置
JPH10106937A5 (enExample)