JP3826481B2 - ステージ装置及び制御ユニット - Google Patents

ステージ装置及び制御ユニット Download PDF

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Publication number
JP3826481B2
JP3826481B2 JP08324397A JP8324397A JP3826481B2 JP 3826481 B2 JP3826481 B2 JP 3826481B2 JP 08324397 A JP08324397 A JP 08324397A JP 8324397 A JP8324397 A JP 8324397A JP 3826481 B2 JP3826481 B2 JP 3826481B2
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JP
Japan
Prior art keywords
stage
reticle
speed
control system
vibration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP08324397A
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English (en)
Japanese (ja)
Other versions
JPH10261580A (ja
JPH10261580A5 (enExample
Inventor
進 牧野内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP08324397A priority Critical patent/JP3826481B2/ja
Priority to US09/039,562 priority patent/US6490025B1/en
Priority to TW087103939A priority patent/TW374936B/zh
Priority to EP98104791A priority patent/EP0866374A3/en
Priority to KR1019980009008A priority patent/KR19980080359A/ko
Publication of JPH10261580A publication Critical patent/JPH10261580A/ja
Publication of JPH10261580A5 publication Critical patent/JPH10261580A5/ja
Application granted granted Critical
Publication of JP3826481B2 publication Critical patent/JP3826481B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP08324397A 1997-03-17 1997-03-17 ステージ装置及び制御ユニット Expired - Lifetime JP3826481B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP08324397A JP3826481B2 (ja) 1997-03-17 1997-03-17 ステージ装置及び制御ユニット
US09/039,562 US6490025B1 (en) 1997-03-17 1998-03-16 Exposure apparatus
TW087103939A TW374936B (en) 1997-03-17 1998-03-17 Exposure apparatus
EP98104791A EP0866374A3 (en) 1997-03-17 1998-03-17 Exposure apparatus
KR1019980009008A KR19980080359A (ko) 1997-03-17 1998-03-17 노광장치 및 노광방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP08324397A JP3826481B2 (ja) 1997-03-17 1997-03-17 ステージ装置及び制御ユニット

Publications (3)

Publication Number Publication Date
JPH10261580A JPH10261580A (ja) 1998-09-29
JPH10261580A5 JPH10261580A5 (enExample) 2005-02-24
JP3826481B2 true JP3826481B2 (ja) 2006-09-27

Family

ID=13796897

Family Applications (1)

Application Number Title Priority Date Filing Date
JP08324397A Expired - Lifetime JP3826481B2 (ja) 1997-03-17 1997-03-17 ステージ装置及び制御ユニット

Country Status (1)

Country Link
JP (1) JP3826481B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120546399A (zh) * 2025-07-28 2025-08-26 内蒙古优普森电气有限公司 浮选机永磁直驱系统联轴器精准对中安装方法

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4194160B2 (ja) 1998-02-19 2008-12-10 キヤノン株式会社 投影露光装置
JP2004343075A (ja) 2003-04-14 2004-12-02 Asml Netherlands Bv 投影システム及びその使用方法
US7084958B2 (en) * 2004-04-14 2006-08-01 Asml Netherlands B.V. Lithographic apparatus, control system and device manufacturing method
KR100629390B1 (ko) 2004-09-21 2006-09-29 삼성전자주식회사 광학계 위치제어수단을 갖는 반도체 제조용 노광장치 및이를 이용한 노광방법
KR100690882B1 (ko) 2005-03-21 2007-03-09 삼성전자주식회사 반도체 소자 제조용 노광 장비, 진동 감지 및 위치 측정방법, 반도체 소자 제조 방법
US7352436B2 (en) * 2005-06-20 2008-04-01 Asml Netherlands, B.V. Lithographic apparatus, projection apparatus and device manufacturing method
US7936443B2 (en) * 2006-05-09 2011-05-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL1036511A1 (nl) * 2008-02-13 2009-08-14 Asml Netherlands Bv Movable support, position control system, lithographic apparatus and method of controlling a position of an exchangeable object.
JP5561968B2 (ja) * 2009-08-12 2014-07-30 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置、荷電粒子ビーム描画方法および振動成分抽出方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120546399A (zh) * 2025-07-28 2025-08-26 内蒙古优普森电气有限公司 浮选机永磁直驱系统联轴器精准对中安装方法

Also Published As

Publication number Publication date
JPH10261580A (ja) 1998-09-29

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