JPH10239847A5 - - Google Patents
Info
- Publication number
- JPH10239847A5 JPH10239847A5 JP1997046000A JP4600097A JPH10239847A5 JP H10239847 A5 JPH10239847 A5 JP H10239847A5 JP 1997046000 A JP1997046000 A JP 1997046000A JP 4600097 A JP4600097 A JP 4600097A JP H10239847 A5 JPH10239847 A5 JP H10239847A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- represent
- different
- same
- hydrogen atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04600097A JP3797505B2 (ja) | 1997-02-28 | 1997-02-28 | ポジ型感光性組成物 |
| US09/025,451 US6042991A (en) | 1997-02-18 | 1998-02-18 | Positive working photosensitive composition |
| KR1019980005036A KR100538968B1 (ko) | 1997-02-18 | 1998-02-18 | 포지티브감광성조성물 |
| US09/497,281 US6416925B1 (en) | 1997-02-18 | 2000-02-02 | Positive working photosensitive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04600097A JP3797505B2 (ja) | 1997-02-28 | 1997-02-28 | ポジ型感光性組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10239847A JPH10239847A (ja) | 1998-09-11 |
| JPH10239847A5 true JPH10239847A5 (enrdf_load_stackoverflow) | 2004-10-07 |
| JP3797505B2 JP3797505B2 (ja) | 2006-07-19 |
Family
ID=12734825
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP04600097A Expired - Fee Related JP3797505B2 (ja) | 1997-02-18 | 1997-02-28 | ポジ型感光性組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3797505B2 (enrdf_load_stackoverflow) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1443363B1 (en) * | 1998-05-25 | 2013-07-10 | Daicel Chemical Industries, Ltd. | Photoresist composition |
| JP3810957B2 (ja) * | 1998-08-06 | 2006-08-16 | 株式会社東芝 | レジスト用樹脂、レジスト組成物およびそれを用いたパターン形成方法 |
| US6303266B1 (en) | 1998-09-24 | 2001-10-16 | Kabushiki Kaisha Toshiba | Resin useful for resist, resist composition and pattern forming process using the same |
| JP3353292B2 (ja) * | 1999-03-29 | 2002-12-03 | 日本電気株式会社 | 化学増幅系レジスト |
| US6479211B1 (en) * | 1999-05-26 | 2002-11-12 | Fuji Photo Film Co., Ltd. | Positive photoresist composition for far ultraviolet exposure |
| US6692888B1 (en) * | 1999-10-07 | 2004-02-17 | Shipley Company, L.L.C. | Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same |
| JP4393010B2 (ja) * | 2001-04-10 | 2010-01-06 | 富士通マイクロエレクトロニクス株式会社 | 化学増幅レジスト組成物及びそれを用いたパターン形成方法 |
| DE10131670A1 (de) | 2001-06-29 | 2003-01-16 | Infineon Technologies Ag | Fotoresists mit Reaktionsankern für eine chemische Nachverstärkung von Resiststrukturen für Belichtungen bei 157 nm |
| JP2004315791A (ja) * | 2003-03-28 | 2004-11-11 | Tokyo Ohka Kogyo Co Ltd | ジカルボン酸モノエステル化合物およびその製造方法ならびに重合体 |
| JP5215228B2 (ja) * | 2009-04-16 | 2013-06-19 | 株式会社ダイセル | フォトレジスト用樹脂組成物の製造法 |
| JP5986825B2 (ja) * | 2012-06-29 | 2016-09-06 | 株式会社ダイセル | 高分子化合物、フォトレジスト用樹脂組成物、及び半導体の製造方法 |
| JP5986826B2 (ja) * | 2012-06-29 | 2016-09-06 | 株式会社ダイセル | 高分子化合物、フォトレジスト用樹脂組成物、及び半導体の製造方法 |
| KR102076529B1 (ko) | 2012-06-29 | 2020-02-13 | 주식회사 다이셀 | 고분자 화합물, 포토레지스트용 수지 조성물, 및 반도체의 제조 방법 |
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1997
- 1997-02-28 JP JP04600097A patent/JP3797505B2/ja not_active Expired - Fee Related