JPH10232495A5 - - Google Patents
Info
- Publication number
- JPH10232495A5 JPH10232495A5 JP1997033958A JP3395897A JPH10232495A5 JP H10232495 A5 JPH10232495 A5 JP H10232495A5 JP 1997033958 A JP1997033958 A JP 1997033958A JP 3395897 A JP3395897 A JP 3395897A JP H10232495 A5 JPH10232495 A5 JP H10232495A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- represent
- same
- different
- substituent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03395897A JP3765440B2 (ja) | 1997-02-18 | 1997-02-18 | ポジ型感光性組成物 |
| US09/025,451 US6042991A (en) | 1997-02-18 | 1998-02-18 | Positive working photosensitive composition |
| KR1019980005036A KR100538968B1 (ko) | 1997-02-18 | 1998-02-18 | 포지티브감광성조성물 |
| US09/497,281 US6416925B1 (en) | 1997-02-18 | 2000-02-02 | Positive working photosensitive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03395897A JP3765440B2 (ja) | 1997-02-18 | 1997-02-18 | ポジ型感光性組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10232495A JPH10232495A (ja) | 1998-09-02 |
| JPH10232495A5 true JPH10232495A5 (enrdf_load_stackoverflow) | 2004-10-07 |
| JP3765440B2 JP3765440B2 (ja) | 2006-04-12 |
Family
ID=12401010
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP03395897A Expired - Fee Related JP3765440B2 (ja) | 1997-02-18 | 1997-02-18 | ポジ型感光性組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3765440B2 (enrdf_load_stackoverflow) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100313150B1 (ko) * | 1997-12-31 | 2001-12-28 | 박종섭 | 리소콜릴에시딜(메타)아크릴레이트 단량체와 그를 도입한 공중합체 수지 및 이 수지를 이용한 포토레지스트 |
| US6692888B1 (en) * | 1999-10-07 | 2004-02-17 | Shipley Company, L.L.C. | Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same |
| JP2002343860A (ja) * | 2001-05-17 | 2002-11-29 | Tokyo Ohka Kogyo Co Ltd | 保護膜形成用材料 |
| KR20130138732A (ko) * | 2010-09-08 | 2013-12-19 | 가부시키가이샤 구라레 | 아크릴산에스테르 유도체, 고분자 화합물 및 포토 레지스트 조성물 |
| JP5986825B2 (ja) * | 2012-06-29 | 2016-09-06 | 株式会社ダイセル | 高分子化合物、フォトレジスト用樹脂組成物、及び半導体の製造方法 |
| JP5986826B2 (ja) * | 2012-06-29 | 2016-09-06 | 株式会社ダイセル | 高分子化合物、フォトレジスト用樹脂組成物、及び半導体の製造方法 |
| CN104379617A (zh) * | 2012-06-29 | 2015-02-25 | 株式会社大赛璐 | 高分子化合物、光致抗蚀剂用树脂组合物、及半导体的制造方法 |
| JP6222057B2 (ja) * | 2014-11-25 | 2017-11-01 | 信越化学工業株式会社 | 化学増幅レジスト材料及びパターン形成方法 |
| JP6411967B2 (ja) * | 2015-07-29 | 2018-10-24 | 信越化学工業株式会社 | レジスト材料並びにこれを用いたパターン形成方法 |
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1997
- 1997-02-18 JP JP03395897A patent/JP3765440B2/ja not_active Expired - Fee Related