JPH10307398A5 - - Google Patents
Info
- Publication number
- JPH10307398A5 JPH10307398A5 JP1997119773A JP11977397A JPH10307398A5 JP H10307398 A5 JPH10307398 A5 JP H10307398A5 JP 1997119773 A JP1997119773 A JP 1997119773A JP 11977397 A JP11977397 A JP 11977397A JP H10307398 A5 JPH10307398 A5 JP H10307398A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- represent
- same
- substituent
- different
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11977397A JP3731776B2 (ja) | 1997-05-09 | 1997-05-09 | ポジ型感光性組成物 |
| EP98108461A EP0877293B1 (en) | 1997-05-09 | 1998-05-08 | Positive photosensitive composition |
| DE69821049T DE69821049T2 (de) | 1997-05-09 | 1998-05-08 | Positiv arbeitende lichtempfindliche Zusammensetzung |
| KR1019980016647A KR100516702B1 (ko) | 1997-05-09 | 1998-05-09 | 포지티브감광성조성물 |
| US09/075,246 US6479209B1 (en) | 1997-05-09 | 1998-05-11 | Positive photosensitive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11977397A JP3731776B2 (ja) | 1997-05-09 | 1997-05-09 | ポジ型感光性組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10307398A JPH10307398A (ja) | 1998-11-17 |
| JPH10307398A5 true JPH10307398A5 (enrdf_load_stackoverflow) | 2004-10-14 |
| JP3731776B2 JP3731776B2 (ja) | 2006-01-05 |
Family
ID=14769863
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11977397A Expired - Lifetime JP3731776B2 (ja) | 1997-05-09 | 1997-05-09 | ポジ型感光性組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3731776B2 (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3963602B2 (ja) * | 1999-01-27 | 2007-08-22 | 富士フイルム株式会社 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| US6692888B1 (en) * | 1999-10-07 | 2004-02-17 | Shipley Company, L.L.C. | Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same |
| US8029969B2 (en) | 2007-05-14 | 2011-10-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Material and method for photolithography |
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1997
- 1997-05-09 JP JP11977397A patent/JP3731776B2/ja not_active Expired - Lifetime