JPH11344808A5 - - Google Patents
Info
- Publication number
- JPH11344808A5 JPH11344808A5 JP1999082407A JP8240799A JPH11344808A5 JP H11344808 A5 JPH11344808 A5 JP H11344808A5 JP 1999082407 A JP1999082407 A JP 1999082407A JP 8240799 A JP8240799 A JP 8240799A JP H11344808 A5 JPH11344808 A5 JP H11344808A5
- Authority
- JP
- Japan
- Prior art keywords
- photoresist composition
- positive photoresist
- group
- composition according
- copolymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP08240799A JP3954233B2 (ja) | 1998-03-30 | 1999-03-25 | ポジ型フォトレジスト組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8416498 | 1998-03-30 | ||
| JP10-84164 | 1998-03-30 | ||
| JP08240799A JP3954233B2 (ja) | 1998-03-30 | 1999-03-25 | ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11344808A JPH11344808A (ja) | 1999-12-14 |
| JPH11344808A5 true JPH11344808A5 (enrdf_load_stackoverflow) | 2005-07-07 |
| JP3954233B2 JP3954233B2 (ja) | 2007-08-08 |
Family
ID=26423436
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP08240799A Expired - Fee Related JP3954233B2 (ja) | 1998-03-30 | 1999-03-25 | ポジ型フォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3954233B2 (enrdf_load_stackoverflow) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3285086B2 (ja) | 1999-05-20 | 2002-05-27 | 日本電気株式会社 | 化学増幅型レジスト組成物 |
| WO2001055789A2 (en) * | 2000-01-25 | 2001-08-02 | Infineon Technologies Ag | Chemically amplified short wavelength resist |
| EP1126321A1 (en) * | 2000-02-10 | 2001-08-22 | Shipley Company LLC | Positive photoresists containing crosslinked polymers |
| TW587086B (en) * | 2000-03-07 | 2004-05-11 | Shinetsu Chemical Co | Chemical amplification, positive resist compositions |
| JP3956088B2 (ja) * | 2000-07-19 | 2007-08-08 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト材料 |
| TWI253543B (en) * | 2000-07-19 | 2006-04-21 | Shinetsu Chemical Co | Chemically amplified positive resist composition |
| JP4694686B2 (ja) * | 2000-08-31 | 2011-06-08 | 東京応化工業株式会社 | 半導体素子製造方法 |
| KR100790418B1 (ko) | 2001-06-22 | 2008-01-02 | 와코 쥰야꾸 고교 가부시키가이샤 | 레지스트 조성물 |
| JP4536546B2 (ja) * | 2005-02-21 | 2010-09-01 | 東京応化工業株式会社 | ポジ型レジスト組成物及びそれを用いたレジストパターン形成方法 |
| JP4893270B2 (ja) * | 2006-11-29 | 2012-03-07 | 住友化学株式会社 | 化学増幅型ポジ型レジスト組成物 |
| JP5553488B2 (ja) * | 2008-06-06 | 2014-07-16 | 株式会社ダイセル | リソグラフィー用重合体並びにその製造方法 |
| JP6028569B2 (ja) | 2010-07-30 | 2016-11-16 | 三菱瓦斯化学株式会社 | 化合物、感放射線性組成物及びレジストパターン形成方法 |
| US20170059989A1 (en) | 2015-08-24 | 2017-03-02 | A School Corporation Kansai University | Polymer compound, radiation sensitive composition and pattern forming method |
| US20170058079A1 (en) | 2015-08-24 | 2017-03-02 | A School Corporation Kansai University | Polymer compound, radiation sensitive composition and pattern forming method |
-
1999
- 1999-03-25 JP JP08240799A patent/JP3954233B2/ja not_active Expired - Fee Related