JP2003233187A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2003233187A5 JP2003233187A5 JP2002032448A JP2002032448A JP2003233187A5 JP 2003233187 A5 JP2003233187 A5 JP 2003233187A5 JP 2002032448 A JP2002032448 A JP 2002032448A JP 2002032448 A JP2002032448 A JP 2002032448A JP 2003233187 A5 JP2003233187 A5 JP 2003233187A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- alicyclic hydrocarbon
- hydrocarbon group
- general formula
- linear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000002723 alicyclic group Chemical group 0.000 claims 8
- 125000000217 alkyl group Chemical group 0.000 claims 6
- 125000004432 carbon atom Chemical group C* 0.000 claims 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000000753 cycloalkyl group Chemical group 0.000 claims 1
- 125000004185 ester group Chemical group 0.000 claims 1
- 125000001033 ether group Chemical group 0.000 claims 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims 1
- 125000005647 linker group Chemical group 0.000 claims 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims 1
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 claims 1
- 125000001412 tetrahydropyranyl group Chemical group 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002032448A JP3860044B2 (ja) | 2002-02-08 | 2002-02-08 | ポジ型レジスト組成物 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002032448A JP3860044B2 (ja) | 2002-02-08 | 2002-02-08 | ポジ型レジスト組成物 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2003233187A JP2003233187A (ja) | 2003-08-22 |
JP2003233187A5 true JP2003233187A5 (enrdf_load_stackoverflow) | 2005-04-07 |
JP3860044B2 JP3860044B2 (ja) | 2006-12-20 |
Family
ID=27775567
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002032448A Expired - Fee Related JP3860044B2 (ja) | 2002-02-08 | 2002-02-08 | ポジ型レジスト組成物 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3860044B2 (enrdf_load_stackoverflow) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004096787A1 (ja) * | 2003-04-28 | 2004-11-11 | Mitsubishi Chemical Corporation | 多環式ラクトン化合物及び多環式ラクトン構造を有する(メタ)アクリレート化合物、並びにその製造方法 |
JP4644457B2 (ja) * | 2003-09-10 | 2011-03-02 | 富士フイルム株式会社 | 感光性組成物及びそれを用いたパターン形成方法 |
JP5124326B2 (ja) * | 2007-03-28 | 2013-01-23 | 富士フイルム株式会社 | ポジ型レジスト組成物およびパターン形成方法 |
EP2017674A1 (en) * | 2007-07-20 | 2009-01-21 | Fujifilm Corporation | Positive resist composition and pattern forming method |
JP6744707B2 (ja) * | 2014-11-11 | 2020-08-19 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
JP7171404B2 (ja) * | 2017-12-22 | 2022-11-15 | 住友化学株式会社 | 樹脂、レジスト組成物及びレジストパターンの製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3390702B2 (ja) * | 1999-08-05 | 2003-03-31 | ダイセル化学工業株式会社 | フォトレジスト用高分子化合物及びフォトレジスト用樹脂組成物 |
JP4154826B2 (ja) * | 2000-02-04 | 2008-09-24 | Jsr株式会社 | 感放射線性樹脂組成物 |
JP2002040662A (ja) * | 2000-07-31 | 2002-02-06 | Fuji Photo Film Co Ltd | ポジ型フォトレジスト組成物 |
JP3589160B2 (ja) * | 2000-07-07 | 2004-11-17 | 日本電気株式会社 | レジスト用材料、化学増幅型レジスト及びそれを用いたパターン形成方法 |
JP2002040661A (ja) * | 2000-07-24 | 2002-02-06 | Toray Ind Inc | ポジ型感放射線性組成物 |
-
2002
- 2002-02-08 JP JP2002032448A patent/JP3860044B2/ja not_active Expired - Fee Related