JP2002303978A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2002303978A5 JP2002303978A5 JP2001107305A JP2001107305A JP2002303978A5 JP 2002303978 A5 JP2002303978 A5 JP 2002303978A5 JP 2001107305 A JP2001107305 A JP 2001107305A JP 2001107305 A JP2001107305 A JP 2001107305A JP 2002303978 A5 JP2002303978 A5 JP 2002303978A5
- Authority
- JP
- Japan
- Prior art keywords
- resist composition
- hydrocarbon group
- formula
- positive resist
- composition according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000001183 hydrocarbyl group Chemical group 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001107305A JP4124978B2 (ja) | 2001-04-05 | 2001-04-05 | ポジ型レジスト組成物 |
| KR1020020017975A KR100907268B1 (ko) | 2001-04-05 | 2002-04-02 | 포지티브 레지스트 조성물 및 이를 사용한 패턴 형성 방법 |
| TW091106744A TW583511B (en) | 2001-04-05 | 2002-04-03 | Positive resist composition |
| US10/114,985 US7179578B2 (en) | 2001-04-05 | 2002-04-04 | Positive resist composition |
| KR1020080101728A KR100920164B1 (ko) | 2001-04-05 | 2008-10-16 | 포지티브 레지스트 조성물 및 이를 사용한 패턴 형성 방법 |
| KR1020090069621A KR100950508B1 (ko) | 2001-04-05 | 2009-07-29 | 포지티브 레지스트 조성물 및 이를 사용한 패턴 형성 방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001107305A JP4124978B2 (ja) | 2001-04-05 | 2001-04-05 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002303978A JP2002303978A (ja) | 2002-10-18 |
| JP2002303978A5 true JP2002303978A5 (enrdf_load_stackoverflow) | 2006-01-19 |
| JP4124978B2 JP4124978B2 (ja) | 2008-07-23 |
Family
ID=18959642
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001107305A Expired - Lifetime JP4124978B2 (ja) | 2001-04-05 | 2001-04-05 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4124978B2 (enrdf_load_stackoverflow) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7452655B2 (en) | 2002-11-05 | 2008-11-18 | Jsr Corporation | Acrylic copolymer and radiation-sensitive resin composition |
| JP4225817B2 (ja) | 2003-03-31 | 2009-02-18 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP4360836B2 (ja) | 2003-06-04 | 2009-11-11 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP4300420B2 (ja) | 2004-06-21 | 2009-07-22 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びパターン形成方法 |
| JP4274057B2 (ja) * | 2004-06-21 | 2009-06-03 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びパターン形成方法 |
| JP4485913B2 (ja) * | 2004-11-05 | 2010-06-23 | 東京応化工業株式会社 | レジスト組成物の製造方法およびレジスト組成物 |
| JP4881687B2 (ja) | 2005-12-09 | 2012-02-22 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP4881686B2 (ja) | 2005-12-09 | 2012-02-22 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| CN101374878B (zh) * | 2006-01-25 | 2012-01-18 | 日产化学工业株式会社 | 正型感光性树脂组合物和由其得到的固化膜 |
| JP4832237B2 (ja) * | 2006-09-27 | 2011-12-07 | 富士フイルム株式会社 | ポジ型レジスト組成物およびそれを用いたパターン形成方法 |
| US7635554B2 (en) | 2007-03-28 | 2009-12-22 | Fujifilm Corporation | Positive resist composition and pattern forming method |
| EP1975714A1 (en) | 2007-03-28 | 2008-10-01 | FUJIFILM Corporation | Positive resist composition and pattern forming method |
| JP4621754B2 (ja) | 2007-03-28 | 2011-01-26 | 富士フイルム株式会社 | ポジ型レジスト組成物およびパターン形成方法 |
| JP5434906B2 (ja) * | 2008-03-04 | 2014-03-05 | Ｊｓｒ株式会社 | 感放射線性組成物及び重合体並びに単量体 |
| JP2011075750A (ja) * | 2009-09-30 | 2011-04-14 | Jsr Corp | 化学増幅型レジスト用感放射線性樹脂組成物および重合体 |
| JP2013088763A (ja) * | 2011-10-21 | 2013-05-13 | Jsr Corp | フォトレジスト組成物 |
-
2001
- 2001-04-05 JP JP2001107305A patent/JP4124978B2/ja not_active Expired - Lifetime