JP4124978B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP4124978B2
JP4124978B2 JP2001107305A JP2001107305A JP4124978B2 JP 4124978 B2 JP4124978 B2 JP 4124978B2 JP 2001107305 A JP2001107305 A JP 2001107305A JP 2001107305 A JP2001107305 A JP 2001107305A JP 4124978 B2 JP4124978 B2 JP 4124978B2
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JP
Japan
Prior art keywords
group
embedded image
acid
general formula
alkyl group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2001107305A
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English (en)
Japanese (ja)
Other versions
JP2002303978A (ja
JP2002303978A5 (enrdf_load_stackoverflow
Inventor
健一郎 佐藤
一也 上西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2001107305A priority Critical patent/JP4124978B2/ja
Priority to KR1020020017975A priority patent/KR100907268B1/ko
Priority to TW091106744A priority patent/TW583511B/zh
Priority to US10/114,985 priority patent/US7179578B2/en
Publication of JP2002303978A publication Critical patent/JP2002303978A/ja
Publication of JP2002303978A5 publication Critical patent/JP2002303978A5/ja
Application granted granted Critical
Publication of JP4124978B2 publication Critical patent/JP4124978B2/ja
Priority to KR1020080101728A priority patent/KR100920164B1/ko
Priority to KR1020090069621A priority patent/KR100950508B1/ko
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2001107305A 2001-04-05 2001-04-05 ポジ型レジスト組成物 Expired - Lifetime JP4124978B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2001107305A JP4124978B2 (ja) 2001-04-05 2001-04-05 ポジ型レジスト組成物
KR1020020017975A KR100907268B1 (ko) 2001-04-05 2002-04-02 포지티브 레지스트 조성물 및 이를 사용한 패턴 형성 방법
TW091106744A TW583511B (en) 2001-04-05 2002-04-03 Positive resist composition
US10/114,985 US7179578B2 (en) 2001-04-05 2002-04-04 Positive resist composition
KR1020080101728A KR100920164B1 (ko) 2001-04-05 2008-10-16 포지티브 레지스트 조성물 및 이를 사용한 패턴 형성 방법
KR1020090069621A KR100950508B1 (ko) 2001-04-05 2009-07-29 포지티브 레지스트 조성물 및 이를 사용한 패턴 형성 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001107305A JP4124978B2 (ja) 2001-04-05 2001-04-05 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2002303978A JP2002303978A (ja) 2002-10-18
JP2002303978A5 JP2002303978A5 (enrdf_load_stackoverflow) 2006-01-19
JP4124978B2 true JP4124978B2 (ja) 2008-07-23

Family

ID=18959642

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001107305A Expired - Lifetime JP4124978B2 (ja) 2001-04-05 2001-04-05 ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP4124978B2 (enrdf_load_stackoverflow)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7452655B2 (en) 2002-11-05 2008-11-18 Jsr Corporation Acrylic copolymer and radiation-sensitive resin composition
JP4225817B2 (ja) 2003-03-31 2009-02-18 富士フイルム株式会社 ポジ型レジスト組成物
JP4360836B2 (ja) 2003-06-04 2009-11-11 富士フイルム株式会社 ポジ型レジスト組成物
JP4300420B2 (ja) 2004-06-21 2009-07-22 信越化学工業株式会社 高分子化合物、レジスト材料及びパターン形成方法
JP4274057B2 (ja) * 2004-06-21 2009-06-03 信越化学工業株式会社 高分子化合物、レジスト材料及びパターン形成方法
JP4485913B2 (ja) * 2004-11-05 2010-06-23 東京応化工業株式会社 レジスト組成物の製造方法およびレジスト組成物
JP4881687B2 (ja) 2005-12-09 2012-02-22 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP4881686B2 (ja) 2005-12-09 2012-02-22 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP5019055B2 (ja) * 2006-01-25 2012-09-05 日産化学工業株式会社 ポジ型感光性樹脂組成物及びそれから得られる硬化膜
JP4832237B2 (ja) * 2006-09-27 2011-12-07 富士フイルム株式会社 ポジ型レジスト組成物およびそれを用いたパターン形成方法
EP1975714A1 (en) 2007-03-28 2008-10-01 FUJIFILM Corporation Positive resist composition and pattern forming method
JP4621754B2 (ja) 2007-03-28 2011-01-26 富士フイルム株式会社 ポジ型レジスト組成物およびパターン形成方法
US7635554B2 (en) 2007-03-28 2009-12-22 Fujifilm Corporation Positive resist composition and pattern forming method
WO2009110388A1 (ja) 2008-03-04 2009-09-11 Jsr株式会社 感放射線性組成物及び重合体並びに単量体
JP2011075750A (ja) * 2009-09-30 2011-04-14 Jsr Corp 化学増幅型レジスト用感放射線性樹脂組成物および重合体
JP2013088763A (ja) * 2011-10-21 2013-05-13 Jsr Corp フォトレジスト組成物

Also Published As

Publication number Publication date
JP2002303978A (ja) 2002-10-18

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