JP3860044B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP3860044B2
JP3860044B2 JP2002032448A JP2002032448A JP3860044B2 JP 3860044 B2 JP3860044 B2 JP 3860044B2 JP 2002032448 A JP2002032448 A JP 2002032448A JP 2002032448 A JP2002032448 A JP 2002032448A JP 3860044 B2 JP3860044 B2 JP 3860044B2
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Japan
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group
general formula
alicyclic hydrocarbon
alkyl group
carbon atoms
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JP2002032448A
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English (en)
Japanese (ja)
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JP2003233187A5 (enrdf_load_stackoverflow
JP2003233187A (ja
Inventor
健一郎 佐藤
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富士フイルムホールディングス株式会社
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Priority to JP2002032448A priority Critical patent/JP3860044B2/ja
Publication of JP2003233187A publication Critical patent/JP2003233187A/ja
Publication of JP2003233187A5 publication Critical patent/JP2003233187A5/ja
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP2002032448A 2002-02-08 2002-02-08 ポジ型レジスト組成物 Expired - Fee Related JP3860044B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002032448A JP3860044B2 (ja) 2002-02-08 2002-02-08 ポジ型レジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002032448A JP3860044B2 (ja) 2002-02-08 2002-02-08 ポジ型レジスト組成物

Publications (3)

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JP2003233187A JP2003233187A (ja) 2003-08-22
JP2003233187A5 JP2003233187A5 (enrdf_load_stackoverflow) 2005-04-07
JP3860044B2 true JP3860044B2 (ja) 2006-12-20

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Family Applications (1)

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JP2002032448A Expired - Fee Related JP3860044B2 (ja) 2002-02-08 2002-02-08 ポジ型レジスト組成物

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JP (1) JP3860044B2 (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004096787A1 (ja) * 2003-04-28 2004-11-11 Mitsubishi Chemical Corporation 多環式ラクトン化合物及び多環式ラクトン構造を有する(メタ)アクリレート化合物、並びにその製造方法
JP4644457B2 (ja) * 2003-09-10 2011-03-02 富士フイルム株式会社 感光性組成物及びそれを用いたパターン形成方法
JP5124326B2 (ja) * 2007-03-28 2013-01-23 富士フイルム株式会社 ポジ型レジスト組成物およびパターン形成方法
EP2017674A1 (en) * 2007-07-20 2009-01-21 Fujifilm Corporation Positive resist composition and pattern forming method
JP6744707B2 (ja) * 2014-11-11 2020-08-19 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
JP7171404B2 (ja) * 2017-12-22 2022-11-15 住友化学株式会社 樹脂、レジスト組成物及びレジストパターンの製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3390702B2 (ja) * 1999-08-05 2003-03-31 ダイセル化学工業株式会社 フォトレジスト用高分子化合物及びフォトレジスト用樹脂組成物
JP4154826B2 (ja) * 2000-02-04 2008-09-24 Jsr株式会社 感放射線性樹脂組成物
JP2002040662A (ja) * 2000-07-31 2002-02-06 Fuji Photo Film Co Ltd ポジ型フォトレジスト組成物
JP3589160B2 (ja) * 2000-07-07 2004-11-17 日本電気株式会社 レジスト用材料、化学増幅型レジスト及びそれを用いたパターン形成方法
JP2002040661A (ja) * 2000-07-24 2002-02-06 Toray Ind Inc ポジ型感放射線性組成物

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Publication number Publication date
JP2003233187A (ja) 2003-08-22

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