JPH10312060A5 - - Google Patents
Info
- Publication number
- JPH10312060A5 JPH10312060A5 JP1997120919A JP12091997A JPH10312060A5 JP H10312060 A5 JPH10312060 A5 JP H10312060A5 JP 1997120919 A JP1997120919 A JP 1997120919A JP 12091997 A JP12091997 A JP 12091997A JP H10312060 A5 JPH10312060 A5 JP H10312060A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- represent
- component
- resist composition
- same
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12091997A JP3731777B2 (ja) | 1997-05-12 | 1997-05-12 | ポジ型レジスト組成物 |
| DE69803117T DE69803117T2 (de) | 1997-05-12 | 1998-05-11 | Positiv arbeitende Resistzusammensetzung |
| EP98108549A EP0878738B1 (en) | 1997-05-12 | 1998-05-11 | Positive resist composition |
| US09/075,818 US6245485B1 (en) | 1997-05-12 | 1998-05-12 | Positive resist composition |
| KR1019980016901A KR100535223B1 (ko) | 1997-05-12 | 1998-05-12 | 포지티브레지스트조성물 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12091997A JP3731777B2 (ja) | 1997-05-12 | 1997-05-12 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10312060A JPH10312060A (ja) | 1998-11-24 |
| JPH10312060A5 true JPH10312060A5 (enrdf_load_stackoverflow) | 2004-10-14 |
| JP3731777B2 JP3731777B2 (ja) | 2006-01-05 |
Family
ID=14798245
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12091997A Expired - Lifetime JP3731777B2 (ja) | 1997-05-12 | 1997-05-12 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3731777B2 (enrdf_load_stackoverflow) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4527212B2 (ja) * | 1998-05-25 | 2010-08-18 | ダイセル化学工業株式会社 | 酸感応性化合物及びフォトレジスト用樹脂組成物 |
| EP1000924A4 (en) * | 1998-05-25 | 2005-01-05 | Daicel Chem | ACID SENSITIVE COMPOUND AND RESIN COMPOSITION FOR PHOTORESIN |
| JP3810957B2 (ja) * | 1998-08-06 | 2006-08-16 | 株式会社東芝 | レジスト用樹脂、レジスト組成物およびそれを用いたパターン形成方法 |
| US6303266B1 (en) | 1998-09-24 | 2001-10-16 | Kabushiki Kaisha Toshiba | Resin useful for resist, resist composition and pattern forming process using the same |
| KR20010054675A (ko) * | 1999-12-07 | 2001-07-02 | 윤종용 | 감광성 중합체 및 이를 포함하는 화학 증폭형포토레지스트 조성물 |
| KR100416916B1 (ko) * | 2001-05-11 | 2004-02-05 | 학교법인 한양학원 | 실리콘 함유 고분자 화합물 및 이를 이용한 레지스트 조성물 |
| JP2002338627A (ja) * | 2001-05-22 | 2002-11-27 | Daicel Chem Ind Ltd | フォトレジスト用高分子化合物及び感光性樹脂組成物 |
| WO2009093419A1 (ja) * | 2008-01-21 | 2009-07-30 | Daicel Chemical Industries, Ltd. | 化学増幅型フォトレジスト用樹脂及びその製造方法 |
| EP2626342B1 (en) * | 2010-10-08 | 2016-08-03 | Nippon Carbide Industries Co., Inc. | Novel vinyl-ether compound and manufacturing method therefor |
-
1997
- 1997-05-12 JP JP12091997A patent/JP3731777B2/ja not_active Expired - Lifetime