JP3765440B2 - ポジ型感光性組成物 - Google Patents

ポジ型感光性組成物 Download PDF

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Publication number
JP3765440B2
JP3765440B2 JP03395897A JP3395897A JP3765440B2 JP 3765440 B2 JP3765440 B2 JP 3765440B2 JP 03395897 A JP03395897 A JP 03395897A JP 3395897 A JP3395897 A JP 3395897A JP 3765440 B2 JP3765440 B2 JP 3765440B2
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JP
Japan
Prior art keywords
group
same
different
substituent
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP03395897A
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English (en)
Japanese (ja)
Other versions
JPH10232495A (ja
JPH10232495A5 (enrdf_load_stackoverflow
Inventor
利明 青合
史郎 丹
健一郎 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP03395897A priority Critical patent/JP3765440B2/ja
Priority to US09/025,451 priority patent/US6042991A/en
Priority to KR1019980005036A priority patent/KR100538968B1/ko
Publication of JPH10232495A publication Critical patent/JPH10232495A/ja
Priority to US09/497,281 priority patent/US6416925B1/en
Publication of JPH10232495A5 publication Critical patent/JPH10232495A5/ja
Application granted granted Critical
Publication of JP3765440B2 publication Critical patent/JP3765440B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP03395897A 1997-02-18 1997-02-18 ポジ型感光性組成物 Expired - Fee Related JP3765440B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP03395897A JP3765440B2 (ja) 1997-02-18 1997-02-18 ポジ型感光性組成物
US09/025,451 US6042991A (en) 1997-02-18 1998-02-18 Positive working photosensitive composition
KR1019980005036A KR100538968B1 (ko) 1997-02-18 1998-02-18 포지티브감광성조성물
US09/497,281 US6416925B1 (en) 1997-02-18 2000-02-02 Positive working photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03395897A JP3765440B2 (ja) 1997-02-18 1997-02-18 ポジ型感光性組成物

Publications (3)

Publication Number Publication Date
JPH10232495A JPH10232495A (ja) 1998-09-02
JPH10232495A5 JPH10232495A5 (enrdf_load_stackoverflow) 2004-10-07
JP3765440B2 true JP3765440B2 (ja) 2006-04-12

Family

ID=12401010

Family Applications (1)

Application Number Title Priority Date Filing Date
JP03395897A Expired - Fee Related JP3765440B2 (ja) 1997-02-18 1997-02-18 ポジ型感光性組成物

Country Status (1)

Country Link
JP (1) JP3765440B2 (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100313150B1 (ko) * 1997-12-31 2001-12-28 박종섭 리소콜릴에시딜(메타)아크릴레이트 단량체와 그를 도입한 공중합체 수지 및 이 수지를 이용한 포토레지스트
US6692888B1 (en) * 1999-10-07 2004-02-17 Shipley Company, L.L.C. Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same
JP2002343860A (ja) * 2001-05-17 2002-11-29 Tokyo Ohka Kogyo Co Ltd 保護膜形成用材料
KR20130138732A (ko) * 2010-09-08 2013-12-19 가부시키가이샤 구라레 아크릴산에스테르 유도체, 고분자 화합물 및 포토 레지스트 조성물
JP5986825B2 (ja) * 2012-06-29 2016-09-06 株式会社ダイセル 高分子化合物、フォトレジスト用樹脂組成物、及び半導体の製造方法
JP5986826B2 (ja) * 2012-06-29 2016-09-06 株式会社ダイセル 高分子化合物、フォトレジスト用樹脂組成物、及び半導体の製造方法
CN104379617A (zh) * 2012-06-29 2015-02-25 株式会社大赛璐 高分子化合物、光致抗蚀剂用树脂组合物、及半导体的制造方法
JP6222057B2 (ja) * 2014-11-25 2017-11-01 信越化学工業株式会社 化学増幅レジスト材料及びパターン形成方法
JP6411967B2 (ja) * 2015-07-29 2018-10-24 信越化学工業株式会社 レジスト材料並びにこれを用いたパターン形成方法

Also Published As

Publication number Publication date
JPH10232495A (ja) 1998-09-02

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