JP2001330957A5 - - Google Patents
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- JP2001330957A5 JP2001330957A5 JP2000150173A JP2000150173A JP2001330957A5 JP 2001330957 A5 JP2001330957 A5 JP 2001330957A5 JP 2000150173 A JP2000150173 A JP 2000150173A JP 2000150173 A JP2000150173 A JP 2000150173A JP 2001330957 A5 JP2001330957 A5 JP 2001330957A5
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive composition
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- positive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 125000001424 substituent group Chemical group 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 2
- 125000005647 linker group Chemical group 0.000 description 2
- -1 polysiloxane Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 229920000734 polysilsesquioxane polymer Polymers 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 125000002993 cycloalkylene group Chemical group 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000150173A JP4235344B2 (ja) | 2000-05-22 | 2000-05-22 | ２層レジスト用ポジ型シリコン含有レジスト組成物及びパターン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000150173A JP4235344B2 (ja) | 2000-05-22 | 2000-05-22 | ２層レジスト用ポジ型シリコン含有レジスト組成物及びパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001330957A JP2001330957A (ja) | 2001-11-30 |
| JP2001330957A5 true JP2001330957A5 (enrdf_load_stackoverflow) | 2006-01-05 |
| JP4235344B2 JP4235344B2 (ja) | 2009-03-11 |
Family
ID=18655926
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000150173A Expired - Fee Related JP4235344B2 (ja) | 2000-05-22 | 2000-05-22 | ２層レジスト用ポジ型シリコン含有レジスト組成物及びパターン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4235344B2 (enrdf_load_stackoverflow) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4141625B2 (ja) * | 2000-08-09 | 2008-08-27 | 東京応化工業株式会社 | ポジ型レジスト組成物およびそのレジスト層を設けた基材 |
| JP4295937B2 (ja) * | 2000-12-05 | 2009-07-15 | 株式会社Ｋｒｉ | 活性成分及びそれを用いた感光性樹脂組成物 |
| JP4262516B2 (ja) | 2003-05-12 | 2009-05-13 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP4494060B2 (ja) * | 2004-03-30 | 2010-06-30 | 東京応化工業株式会社 | ポジ型レジスト組成物 |
| JP4494061B2 (ja) * | 2004-03-30 | 2010-06-30 | 東京応化工業株式会社 | ポジ型レジスト組成物 |
| JP5003894B2 (ja) * | 2007-11-22 | 2012-08-15 | 日産化学工業株式会社 | レジスト下層膜形成組成物及び半導体装置の製造方法 |
| CN105980931A (zh) * | 2014-02-13 | 2016-09-28 | 富士胶片株式会社 | 感光性树脂组合物、固化膜的制造方法、固化膜、液晶显示装置、有机el显示装置及触摸面板显示装置 |
| KR101848656B1 (ko) * | 2015-04-30 | 2018-04-13 | 롬엔드하스전자재료코리아유한회사 | 오버코트 조성물 및 포토리소그래피 방법 |
| CN114690552A (zh) * | 2020-12-30 | 2022-07-01 | 罗门哈斯电子材料有限责任公司 | 光致抗蚀剂组合物及图案形成方法 |
| KR102698642B1 (ko) * | 2020-12-30 | 2024-08-26 | 듀폰 일렉트로닉 머티어리얼즈 인터내셔널, 엘엘씨 | 포토레지스트 탑코트 조성물 및 패턴 형성 방법 |
| KR102515739B1 (ko) * | 2022-12-07 | 2023-03-30 | 타코마테크놀러지 주식회사 | 감광성 수지 및 이를 포함하는 포토레지스트 조성물 |
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2000
- 2000-05-22 JP JP2000150173A patent/JP4235344B2/ja not_active Expired - Fee Related