JPH11305439A5 - - Google Patents

Info

Publication number
JPH11305439A5
JPH11305439A5 JP1998112196A JP11219698A JPH11305439A5 JP H11305439 A5 JPH11305439 A5 JP H11305439A5 JP 1998112196 A JP1998112196 A JP 1998112196A JP 11219698 A JP11219698 A JP 11219698A JP H11305439 A5 JPH11305439 A5 JP H11305439A5
Authority
JP
Japan
Prior art keywords
acid
photosensitive composition
action
composition according
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998112196A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11305439A (ja
JP3851440B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP11219698A priority Critical patent/JP3851440B2/ja
Priority claimed from JP11219698A external-priority patent/JP3851440B2/ja
Publication of JPH11305439A publication Critical patent/JPH11305439A/ja
Publication of JPH11305439A5 publication Critical patent/JPH11305439A5/ja
Application granted granted Critical
Publication of JP3851440B2 publication Critical patent/JP3851440B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP11219698A 1998-04-22 1998-04-22 ポジ型感光性組成物 Expired - Lifetime JP3851440B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11219698A JP3851440B2 (ja) 1998-04-22 1998-04-22 ポジ型感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11219698A JP3851440B2 (ja) 1998-04-22 1998-04-22 ポジ型感光性組成物

Publications (3)

Publication Number Publication Date
JPH11305439A JPH11305439A (ja) 1999-11-05
JPH11305439A5 true JPH11305439A5 (enrdf_load_stackoverflow) 2005-02-24
JP3851440B2 JP3851440B2 (ja) 2006-11-29

Family

ID=14580677

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11219698A Expired - Lifetime JP3851440B2 (ja) 1998-04-22 1998-04-22 ポジ型感光性組成物

Country Status (1)

Country Link
JP (1) JP3851440B2 (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4328428B2 (ja) * 1999-11-08 2009-09-09 富士フイルム株式会社 ポジ型レジスト組成物
JP4177952B2 (ja) * 2000-05-22 2008-11-05 富士フイルム株式会社 ポジ型レジスト組成物
JP2002006483A (ja) * 2000-06-20 2002-01-09 Sumitomo Chem Co Ltd フォトレジスト組成物
US6692897B2 (en) * 2000-07-12 2004-02-17 Fuji Photo Film Co., Ltd. Positive resist composition
JP2006096965A (ja) 2004-02-20 2006-04-13 Tokyo Ohka Kogyo Co Ltd 高分子化合物、該高分子化合物を含有するフォトレジスト組成物、およびレジストパターン形成方法
JP2006291160A (ja) * 2005-03-14 2006-10-26 Fuji Photo Film Co Ltd 膜形成用組成物、それを用いた絶縁膜および電子デバイス
US10520813B2 (en) * 2016-12-15 2019-12-31 Taiwan Semiconductor Manufacturing Co., Ltd Extreme ultraviolet photoresist with high-efficiency electron transfer

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