JP3851440B2 - ポジ型感光性組成物 - Google Patents

ポジ型感光性組成物 Download PDF

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Publication number
JP3851440B2
JP3851440B2 JP11219698A JP11219698A JP3851440B2 JP 3851440 B2 JP3851440 B2 JP 3851440B2 JP 11219698 A JP11219698 A JP 11219698A JP 11219698 A JP11219698 A JP 11219698A JP 3851440 B2 JP3851440 B2 JP 3851440B2
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JP
Japan
Prior art keywords
group
acid
photosensitive composition
compound
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP11219698A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11305439A (ja
JPH11305439A5 (enrdf_load_stackoverflow
Inventor
保雅 河辺
健一郎 佐藤
利明 青合
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP11219698A priority Critical patent/JP3851440B2/ja
Publication of JPH11305439A publication Critical patent/JPH11305439A/ja
Publication of JPH11305439A5 publication Critical patent/JPH11305439A5/ja
Application granted granted Critical
Publication of JP3851440B2 publication Critical patent/JP3851440B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
JP11219698A 1998-04-22 1998-04-22 ポジ型感光性組成物 Expired - Lifetime JP3851440B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11219698A JP3851440B2 (ja) 1998-04-22 1998-04-22 ポジ型感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11219698A JP3851440B2 (ja) 1998-04-22 1998-04-22 ポジ型感光性組成物

Publications (3)

Publication Number Publication Date
JPH11305439A JPH11305439A (ja) 1999-11-05
JPH11305439A5 JPH11305439A5 (enrdf_load_stackoverflow) 2005-02-24
JP3851440B2 true JP3851440B2 (ja) 2006-11-29

Family

ID=14580677

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11219698A Expired - Lifetime JP3851440B2 (ja) 1998-04-22 1998-04-22 ポジ型感光性組成物

Country Status (1)

Country Link
JP (1) JP3851440B2 (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4328428B2 (ja) * 1999-11-08 2009-09-09 富士フイルム株式会社 ポジ型レジスト組成物
JP4177952B2 (ja) * 2000-05-22 2008-11-05 富士フイルム株式会社 ポジ型レジスト組成物
JP2002006483A (ja) * 2000-06-20 2002-01-09 Sumitomo Chem Co Ltd フォトレジスト組成物
US6692897B2 (en) * 2000-07-12 2004-02-17 Fuji Photo Film Co., Ltd. Positive resist composition
JP2006096965A (ja) 2004-02-20 2006-04-13 Tokyo Ohka Kogyo Co Ltd 高分子化合物、該高分子化合物を含有するフォトレジスト組成物、およびレジストパターン形成方法
JP2006291160A (ja) * 2005-03-14 2006-10-26 Fuji Photo Film Co Ltd 膜形成用組成物、それを用いた絶縁膜および電子デバイス
US10520813B2 (en) * 2016-12-15 2019-12-31 Taiwan Semiconductor Manufacturing Co., Ltd Extreme ultraviolet photoresist with high-efficiency electron transfer

Also Published As

Publication number Publication date
JPH11305439A (ja) 1999-11-05

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