JPH10172878A5 - - Google Patents

Info

Publication number
JPH10172878A5
JPH10172878A5 JP1996326669A JP32666996A JPH10172878A5 JP H10172878 A5 JPH10172878 A5 JP H10172878A5 JP 1996326669 A JP1996326669 A JP 1996326669A JP 32666996 A JP32666996 A JP 32666996A JP H10172878 A5 JPH10172878 A5 JP H10172878A5
Authority
JP
Japan
Prior art keywords
optical system
scanning exposure
projection optical
illumination
illumination area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996326669A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10172878A (ja
JP3728613B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP32666996A priority Critical patent/JP3728613B2/ja
Priority claimed from JP32666996A external-priority patent/JP3728613B2/ja
Publication of JPH10172878A publication Critical patent/JPH10172878A/ja
Priority to US09/465,696 priority patent/US6310680B1/en
Publication of JPH10172878A5 publication Critical patent/JPH10172878A5/ja
Application granted granted Critical
Publication of JP3728613B2 publication Critical patent/JP3728613B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP32666996A 1996-12-06 1996-12-06 走査型露光装置の調整方法及び該方法を使用する走査型露光装置 Expired - Fee Related JP3728613B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP32666996A JP3728613B2 (ja) 1996-12-06 1996-12-06 走査型露光装置の調整方法及び該方法を使用する走査型露光装置
US09/465,696 US6310680B1 (en) 1996-12-06 1999-12-17 Method of adjusting a scanning exposure apparatus and scanning exposure apparatus using the method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32666996A JP3728613B2 (ja) 1996-12-06 1996-12-06 走査型露光装置の調整方法及び該方法を使用する走査型露光装置

Publications (3)

Publication Number Publication Date
JPH10172878A JPH10172878A (ja) 1998-06-26
JPH10172878A5 true JPH10172878A5 (enExample) 2005-08-04
JP3728613B2 JP3728613B2 (ja) 2005-12-21

Family

ID=18190351

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32666996A Expired - Fee Related JP3728613B2 (ja) 1996-12-06 1996-12-06 走査型露光装置の調整方法及び該方法を使用する走査型露光装置

Country Status (2)

Country Link
US (1) US6310680B1 (enExample)
JP (1) JP3728613B2 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI283798B (en) * 2000-01-20 2007-07-11 Asml Netherlands Bv A microlithography projection apparatus
JP2001265000A (ja) * 2000-03-16 2001-09-28 Toray Eng Co Ltd レーザー露光装置
US7561270B2 (en) 2000-08-24 2009-07-14 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
TW527526B (en) * 2000-08-24 2003-04-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6753963B1 (en) * 2000-10-26 2004-06-22 General Phosphorix Method of calibration of magnification of optical devices
JP4191923B2 (ja) * 2001-11-02 2008-12-03 株式会社東芝 露光方法および露光装置
EP2466622B1 (en) * 2003-02-26 2015-05-27 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
EP1467253A1 (en) * 2003-04-07 2004-10-13 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101369016B1 (ko) 2003-04-10 2014-02-28 가부시키가이샤 니콘 액침 리소그래피 장치용 진공 배출을 포함하는 환경 시스템
KR101323993B1 (ko) * 2003-04-10 2013-10-30 가부시키가이샤 니콘 액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템
KR101296501B1 (ko) 2003-07-09 2013-08-13 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP3959383B2 (ja) 2003-10-17 2007-08-15 株式会社東芝 露光装置補正システム、露光装置補正方法及び半導体装置製造方法
JP4400200B2 (ja) * 2003-12-10 2010-01-20 セイコーエプソン株式会社 画像表示方法、画像表示装置および画像表示プログラム
KR20180042456A (ko) 2004-03-25 2018-04-25 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
WO2005121739A1 (ja) * 2004-06-08 2005-12-22 Advantest Corporation イメージセンサ用試験装置
TWI396225B (zh) * 2004-07-23 2013-05-11 尼康股份有限公司 成像面測量方法、曝光方法、元件製造方法以及曝光裝置
WO2007043535A1 (ja) * 2005-10-07 2007-04-19 Nikon Corporation 光学特性計測方法、露光方法及びデバイス製造方法、並びに検査装置及び計測方法
JP5006711B2 (ja) * 2007-06-27 2012-08-22 キヤノン株式会社 露光装置、露光方法及びデバイス製造方法
JP6338377B2 (ja) * 2014-01-08 2018-06-06 キヤノン株式会社 露光装置、および物品の製造方法
JP2018045060A (ja) * 2016-09-13 2018-03-22 キヤノン株式会社 照明装置、露光装置及び物品の製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5117255A (en) 1990-09-19 1992-05-26 Nikon Corporation Projection exposure apparatus
US5473410A (en) 1990-11-28 1995-12-05 Nikon Corporation Projection exposure apparatus
US6078380A (en) * 1991-10-08 2000-06-20 Nikon Corporation Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure
JP2946950B2 (ja) * 1992-06-25 1999-09-13 キヤノン株式会社 照明装置及びそれを用いた露光装置
US5591958A (en) * 1993-06-14 1997-01-07 Nikon Corporation Scanning exposure method and apparatus
JP3255312B2 (ja) * 1993-04-28 2002-02-12 株式会社ニコン 投影露光装置
US5581324A (en) 1993-06-10 1996-12-03 Nikon Corporation Thermal distortion compensated projection exposure method and apparatus for manufacturing semiconductors
JP3374991B2 (ja) 1993-06-14 2003-02-10 株式会社ニコン 投影光学系の調整方法、露光方法、及び露光装置
JP3451604B2 (ja) 1994-06-17 2003-09-29 株式会社ニコン 走査型露光装置
JPH08115872A (ja) 1994-10-13 1996-05-07 Nikon Corp 露光装置
US5739899A (en) 1995-05-19 1998-04-14 Nikon Corporation Projection exposure apparatus correcting tilt of telecentricity

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