TWI283798B - A microlithography projection apparatus - Google Patents

Abstract

A microlithography projection apparatus comprises an illuminator, for supplying a beam of radiation for illuminating a pattern on a mask, and a projection system for forming an image of the illuminated portion of the mask on a resist-coated substrate. The image is projected off-axis with respect to the optical axis of the projection system and the aperture of the illuminator is minimized to that of the illuminated portion of the mask. The illuminator is provided with a compensator, such as a tillable mirror or wedge-like transmissive optical element for compensating for telecentricity errors intrinsic to the projection system.

Description

1283798

1283798 5 invention description (2) ·----- The principle is (for example) 'the address area of the reflecting surface will be incident ί:J "such as: to be reversed" and the unaddressed area will be incident light. - a suitable chopper, which can be over-reduced from the reflected beam, σ, according to the matrix-addressable surface: c-light; (d), the appropriate electronic device can be used to generate the required two-pronged More f and matrix addressing related to these mirror arrays can be collected into 5,523 r9m such as / US patent Na... programmable LCD array. The knot = in the test., Na", included in ^ As early as possible, this article ^彳# jfcp contains - mask table and mask 2: some places should be discussed in the above-mentioned pattern device - the original original for the sake of simplicity, the projection system, and this The name must be extensive;: 乂二二:: as a "lens"·' γ, such as refractive optics, the projection of the type of reflected light is included in the rr--the illumination system G s is based on some design patterns Φ Components can be guided, shaped or can be: species and transport can also be common or single The sole view is as follows: lens r first t: the element can be a pattern with two or more, lithography. In these "multiple layers of precedence cover ^; or == Multiple bases may be used in parallel or 'preparation steps' may be used to expose one or more tables and one or more other tables/pieces for exposure. Two-layer lithography

Page 6 1283798 V. Description of invention (3) described in 'for example' US 5, 96 9, 44 1 and US serial number 0 9/280, 0 1 1, included in February 28, 998 (WO 98/2) 866 5 and WO 9 8/40 79 1), which are incorporated herein by reference. The + lithography projection device can be used, for example, to make an integrated circuit (丨Cs). In this case, the pattern device can generate a circuit pattern according to one of the layers of the layer c, and the pattern can be projected onto the target portion coated with a layer of photoresist (resistance). (contains one or more grains). Typically, a single wafer contains the entire network adjacent to the target portion, continuously; I is illuminated by the projection system, one at a time. In today's devices, a pattern is created by a reticle on the reticle table to create contrast in two different types of machines. In a lithographic projection apparatus, each of the target knives performs the entire illumination at a time by exposing the entire reticle pattern to the target portion; this device is generally regarded as a wafer stepper. In another device (generally referred to as a step-and-scan device or scanner), each target portion is illuminated by a projection beam asymptotically scanning the reticle pattern in accordance with a given reference direction scanning "direction" while being parallel to Or scanning the base table synchronously in parallel with this direction; in general, because the projection system has an amplification factor — (generally less than 1), the velocity v when scanning the base table is the product of the factor M and the velocity of the scanning reticle table. Further information relating to the lithography apparatus described herein can be collected from, for example, US 6, 〇 4 6, 7 9 2 and is hereby incorporated by reference. The increased demand for smaller features requires the use of shorter wavelength radiation, for example with 丨 5 7 nm or

V. The problem of the invention (4) 'will reduce the performance of the projection device, the first -, for the generation of shorter wavelengths, there are two long coverages = the first: this color is less and its wave: some The dispersion of the refractive index of the wavelength:: = 曲 = ΐ ΐ = a wide gradient makes the medium more dispersed, and the color is aberration. The method for solving this problem is to design a shape such as a combined lens element, which is composed of a lens material of a knives and a chromatic aberration. However, this will be done by adding $糸

The complexity and cost of the lens system requires two different media. Similarly, when the U ray is made, the number of possible refracting media /, which has a shorter wavelength, is decremented by the number of quotients. This color projection lens becomes very difficult. ·, ..., using an inverted refractive lens system as an alternative to injecting optical components. This allows a single material to be used for all of the lenses. Instead, the use of reflective elements in some projection system designs means that an image = must be projected off the spindle to avoid partial image confusion by specific components in the system. This means that the projected image does not extend to the optical axis (i.e., the center) of the projection system. An embodiment of a refractive lens can be found, for example, in U.S. Patent 5,537,26, the disclosure of which is incorporated herein by reference. However, such a projection system typically has an inherent distance center error. It is a problem to compensate for this error and minimize the size of the illumination system in an off-axis projection system. SUMMARY OF THE INVENTION 1283798 V. DESCRIPTION OF THE INVENTION (5) Microscopic lithography of the present invention The compensation of the compensator portion is replaced in the plane in which the beam is split as described above, according to the projection of the projection device. Preferably, the optical axis is off-center. Preferably, the illumination system is compensated for, preferably, poorly compensated. Preferably, the center distance error of a illuminator is reflected by the distance compensation error. As shown in the figure, it is arranged as 'the other one is included (the compensator makes the projection system deviate from the spindle projection system, because the area of the illumination is away from the main vehicle, the illuminator and its compensator The projection system is used to <avoid or eliminate the above-mentioned problems. The use of the microscopic deviation from the projection system is used for the remote central misalignment of the projection projection system. In a shadow system, such as a reflex spindle, to prevent the aberration-like beam from deviating from the main axis and also to laterally displace the optical axis of the projection system and to substantially align the lens and the optical element with the ruler The emerging optical axis is corrected to light in the case of the long-distance error in the middle and the image is tilted in the projection area by the projection axis. Simplicity, at least the projection, in the reticle lateral mapping system domain The smallest of these can be used to adjust the mirror of the remote central error compensator package and make a dual function. The pre-stored mirror has an element such as a mirror 'or a reflection' that is generally a flat element having one. It can include, for example, beam steering and correcting the far type to be used to roughly complement the non-planar appearance to

P. 1283798 V. INSTRUCTIONS (6) Offset central compensation according to the invention. One part of the mirror. When the symmetry of the lens is such that the wedge-shaped device comprises a single lens, according to the invention, the wedge-shaped light is incident on the reticle or at the center of the error compensation is incident/ejected (decentered according to the present invention: k One at least - providing a use of a pattern to be used; another wedge type advantage of the beam is that the remote insertion is offset from the position of the main more than one of the objective elements and the field of the beam in nature. The optical element lens can be changed by the central mis-beam path axis projecting a wedge type, which is required to be angled to adjust the lens. Preferably, the compensator is preferably comprised of a secondary, + technology that is precisely compensated for, and is sized to compensate for remote central misconnections. A new extra-optimal optics compensator. 2. The specific use of the reticle table is close to the position at the time of use. The advantage is that the position across the reticle is a function (that is, the compensator is provided as a 制造 一 元件 〜 〜 楔 楔 楔 楔 楔 楔 楔 楔 楔 楔 楔 楔 楔 楔 楔 楔 楔 楔 楔 楔 楔 楔 楔 ^ ^ ^ ^ ^ ^ ^ ^ ^ a partially covered illumination projection beam of an illumination system; disposed in a cross-section thereof to provide a vapor-applied light table table with a pattern, a distance median, a reticle-offset field 'contains as a substrate; projection light-will The radiation pattern beam is projected onto the radiation sensitive material of the layer, wherein the pattern beam is projected off the optical axis of the projection system before the pattern is created, and a compensation is applied to compensate for the remote central error of the projection system.

1283798

The difference 0 f f is performed by a lithography projection apparatus according to the present invention. A pattern (e.g., in a light sheet) is projected onto a substrate partially covered by at least one layer of enamel material (resistance). Prior to the projection step, J has already had many procedures, such as printing, applying resist and soft baking:: =, the substrate can be applied to other processes 4, such as a post-exposure bake* (PEB), development, A rigid baking and measurement/detection of the projected features is used to create a pattern of individual layers of a component, such as I ◦. This pattern layer is then subjected to different processes such as etching, ion implantation (doping), metallization, oxidation, chemical mechanical polishing, etc., all of which are used to complete the individual layers. If many layers are required, each new layer must repeat its program, or change the program. Finally, an array of components will be presented on the substrate (曰a circle). These elements can then be separated from one another by techniques such as cutting or sawing, so that individual components can be inlaid into the carrier, attached to the pins, and the like. Additional information on such processes is available, for example, in the title "Microchip Mounting, A Practical Guide to Semiconductor Manufacturing," Third Edition, Pierre Van Jent, McWilli Publishing, 1997, ISBN 0 - 07- 067250 -4, which is hereby incorporated by reference. Although a specific reference to the apparatus according to the present invention used in the production of I Cs is used herein, it must be clearly understood that the apparatus has many other possible applications. For example, it can be used to fabricate integrated optical systems, waveguides and detection patterns for magnetic domain memories, liquid crystal display panels, thin film magnetic heads, and the like. The Bank can appreciate that in the context of such other applications, any of the names used in this article are "reticle", "wafer" or "grain"

1283798

It must be treated separately by the more general name "mask", "base" and "point". ^ Knowing the Department In this document 'name radiation, the radiation beam and beam are in principle containing all types of electromagnetic radiation, including ultraviolet radiation (eg having a suspension wavelength of 365, 24, 193, 157 nm or 126 nm) and EUV. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT OF THE INVENTION The present invention will now be described by way of example only and with the accompanying drawings in which: FIG. 1 depicts a lithographic projection assembly 2(a) according to an embodiment of the present invention and (b) are diagrams depicting non-distant central and remote central lens systems, respectively; only Figure 3 depicts projection soiling errors for one of the illumination systems that deviate from the major axis; and FIG. 4 shows a tiltable mirror according to the present invention. The remote error compensates for a illuminator and projection system; and Figure 5 shows a illumination system incorporating a wedge type remote error compensation device. In the figures, the same reference numerals or numerals denote the same description of the preferred embodiment " Fig. 1 depicts a lithographic projection apparatus in accordance with the present invention. The device comprises: • a radiation system LA, Ex, IL for providing a projected projection light PB (for example UV or EUV radiation); ~ a first substrate (mask table) MT, Have a hold for one

Page 12 1283798 V. INSTRUCTIONS (9) Photomask holder for mask MA (for example, a reticle) • A second tray table (base table) WT, which is used to hold a substrate w ( For example, a substrate support coated with a resistive silicon wafer. or a film lens ") PL (for example, a refraction or a refraction to project a light-emitting portion of a photomask to a base) The purpose is to show the mouth knife c (including one or more crystal grains). The present invention and the device have a transmission type (ie, have - transmit light / / / 'for example (with 1 light Cover), in general, 1 also has a reflection type. /, The lucky δ-ray system contains a peak that can be produced - Α-,,. The light source of the beam of Koshiro (such as a water k or cut (excimer) Laser). This beam is con- singed into the ^ ^ 垆 哭 p p ng", after the injection-illumination system IL Μ column such as - beam Γ η. 2 / and / or internal radiation range ( That is, respectively, the CT name and the 7th day, usually containing many other components, such as an accumulator IN and an ancient. In this way, the light beam PB irradiated to the mask MA is The cross-section has the required uniformity and intensity distribution. With respect to Figure 1, the light source U is usually in the outer cover of the lithography projection device and the 浐M ai is suspended in the case where the light source U is a mercury lamp, but can also be far away. The micro-light beam generated by the micro-input is introduced into the device (for example, a cut: μ guide mirror); this recent solution usually occurs when the light source LA is a case σ. Tian, in the case of the present invention and the patent application The range includes the two types of beams, and then the light that is supported in the reticle holder of a reticle is cut off.

1283798 V. Description of invention (10) Cover MA. After the reticle is cut, the light beam PB passes through the lens portion C. By interfering with displacement and measurement "two I two #: pV乂 accurately moving", for example, to facilitate the different target areas C to be bundled in the path of PB. Similarly, the 'first-positioning device can be used to illuminate the path according to the beam PB The cover (4) is precisely positioned, for example, = f Liί: Α after mechanical recovery or in-scan (four). - like: short; two t mouth movement is drawn by a long stroke (four). However, "Λ λ position ) to achieve 'Figure 1 is not explicitly described _ ^ wj positive round stepper (relative to a step and scan device) and 5 'first cover table μτ can be connected to - short-stroke actuator, or can be fixed . The device being traced can be used in two different modes: to apply π dan / image in one go (ie a single 丨丨 flash ") direction 2;: on the part C. The base table is then extended by X and / heart 2. In the scanning mode, the object is not visible: part C: is illuminated by the light beam PB; single "flash"is; ^ besides the target part of the 疋 C The same scheme is applied at a speed mI. The reticle table 0 moves, for example, in the X direction (so-called "scanning * direction", describing the entire reticle shadow: another 2 bundles? (now a crack with a crack) sweep or the opposite side = 1/5 In this way: - Larger usually: Two 4 ί must sacrifice resolution. Knowing knives C can be exposed while + Figure 2U) and (b) are used for a second plane " Tannin

Page 14 1283798

The surface of the wafer forms a first plane 12, such as a surface-projection image projection system 10. Figure 2 (a) table; two 1 = ^ board,. . Here the name "non-distance center;: species, = the distance between the 2 shirts and the light beam forming the radiation beam (from one of the surfaces 5 on the surface 12 and "the average angle is essentially deviated by 9 〇.. Therefore, if two ^ Or flat: The edge of the circle = the optical axis of the mirror moves up and down, the image will move left and right: as shown in the figure above. Below, we will see the average angle as the angle of the 3 beams. Relative to the projection system of Figure 2 (a) 1〇, in Figure 2(b)

= is the distance from the center: the average beam angles 122 and 142 (in Figure 2(b)) formed by the image forming beam and the plane 12 jin are essentially Μ. Therefore, it does not matter whether the moving object plane or the image plane does not affect the image position. For example, if the plane 12 moves up and down, the image position will not move left or right regardless of its proximity or focus. Such an arrangement is obviously advantageous, for example, when covering a continuous lithography layer.

However, an actual projection lens system is unlikely to have a completely remote center. There are always some small residual far center errors. At both the interface of the remote projection system 10 (the surface facing the surface 12) and the projection surface (the surface facing the surface 14), the average beam angles 122 and 142 in Figure 2b are offset (slightly) by 90. . . This deviation, representing the distance center error, shows the dependence of the optical axis 0 of the projection system on the lateral positioning of point 112. Figure 3 represents a plan view of a projection lens system having a light vehicle of 0, and concentric circles 2 〇, 2 2, 2 4 and 2 6 represent contour lines having substantially the same distance central error. As an embodiment, the contour lines 20 to 26 have values of 夹(111丨丨1丨]:&(^311)(1111^(1), respectively, having values such as +1, 〇, -1 And 2. These representatives are in the division

Page 15 1283798

V. INSTRUCTIONS (12) = Angle error in the other, but of course it will be larger at the wafer level due to the magnification of the projection lens system, for example, M = 1/4 will be more than four times. The Erming system must transmit a remote centrally corrected illumination beam, where the angle of incidence 1 2 3 in Figure 10 + varies with lateral positioning to compensate for the center-to-center distance of the projection system. Theoretically, the point 1 2 1 of the illumination Fig. 2(b) beam is directed such that its average beam angle 123 coincides exactly with the projected beam angle 122 defined by the center error. However, unless an early warning is issued, the lighting system IL will not record the name of the reverse center of the projection system and the name of the offset system. "Compensation device•, and "Compensator compensation" The compensation of the mismatch between the central errors of the concept (that is, the use of the delay and the use of 1 means that the distance error is coaxial with the lens system, then the distance between the center and the center of the lens is the axial value of the king, and the compensation is also caused by Conventional lenses are provided. However, if the axial confrontation is used, the projection of the axis is satisfactory. Rectangular 30 generations, one explained, using the deviation from the main slit, offset from the optical axis of the projection system. The size of the illumination aperture of the Ming system is minimized and large enough. In 6 cases, the exit of the illuminator is favorable. In this example, the slit image 30 of the illumination system is a broken coil with a center. (dashed circle) = field is indicated by the diameter of the circle 32 of the aperture of the illuminator with the main axis 〇 '. It is obvious that it represents the diameter, such as the circle 2 6 . The aperture of the projection system is as shown in Figure 3. The illuminator provides a field 32 of staggered circles 20 22, 24 and compensation, and illuminator Figure 4 shows an arc used to compensate for the 纟, which is asymmetry.

Page 16 1283798

Physical practice. 4 shows an illuminator 40 comprising a beam shaping optics 42 such as an amplifying axial module, and an integrator, such as a fly-eye lens or: an integrated rod 'field lens system, a reticle reticle assembly 46, and Auxiliary 7-knife reticle lens system 4 8. The illuminator 40 provides a laser beam for illumination of the reticle 50 and then projects its image to the circle 5_2 by the projection system 54. The illumination incident on the reticle 50 has a slit shape, which is represented by a rectangle 3 所 of Fig. 3. The reticle 5 and the wafer 52 are scanned in this example such that the slit and its image are swept through the reticle 50 and the wafer 52, respectively. The illuminator 4A includes a mirror 56. The mirror 56 is tiltable such that its angle can be selected to deviate from the illumination beam (in this way, the average angle of incidence of the radiation on the reticle 50 is no longer 90) to compensate for the acyclicity of the projection system 54. The symmetry long-range central misalignment mirror 56 can be used to provide (coarse adjustment) remote central error compensation. However, according to another embodiment, the contour of the mirror 56 can be designed to provide a more accurate distance φ water 4 / strong I Μ π ^ ^ central block difference compensation, making it more in line with the required coma The complement is matched with the projection system, as shown in Figure 3. There are several examples of the difference. Another specific embodiment of Benming is shown in Fig. 5. In the present embodiment, a type of transmission optical element 58 is placed in the illumination beam path. This embodiment' component 58 can be simply a workmanship. The central error compensated wedge prism ' However, refer to Figure 3 杻)): If the diameter of the projection system is the same as the diameter of the projection system and the light = can be converted to compensate for the remote central error, for example, ..... shown. One part of the lens can be followed by one side = temple line 20 = friend, enough to cover

1283798 V. DESCRIPTION OF THE INVENTION (14) The diameter of the illuminator 32, or at least the portion of the slit 3, is wedge-shaped and has a position as a function u. Scythe. This compensation of the lens is generally not possible by other methods. Asymmetric remote center error. Two wedge elements 58 can be obtained from a single piece. Using this technique, at least the contour is made at $= lens across each bit of it. The wedge element 58 is offset to compensate for the far center error of the beam on the contour lines 20 to 26 by an angle. The angle of the (upward) angle given by the optical element 58 can in principle be placed anywhere. In a particular embodiment, the :40 first beam path is placed near the reticle 50. Beans are then used as A cake f, this component will affect the same - (four) 厶; flat:;; = = mirror = lens, the function of the transverse beam position, without the big 4 ring light = 1 : +: the center of the distance The error compensation includes adjusting the reticle 5 . The upper photograph = =, the angle 1 23 is a function of position, and preferably does not significantly affect the aperture of the beam (σ external and σ internal setting). So, a lens, == exact function (exact functiQn). In addition, the optical element ^ is placed in the vicinity of the 7-blade reticle device 46. There is no identical contrast between the position and the included angle at other locations in the illuminator 40; for example, the pupil plane 60 corresponds to the Fourier transform of the beam distribution on the reticle 5, such that the position of the plane 60 corresponds to the division The incident angle of the plate 5〇. Therefore, it is more difficult to provide appropriate compensation for the far center error in the general position where the makeup is shown to be 40. Of course, the wedge elements 58 can be placed on other bonding planes in the illuminator 40' because the angle between the bonding planes is consistent with the change in position. , ';,, ', as shown in Figures 4 and 5, and the features of the above specific embodiments may be combined

Page 18 1283798 V. Description of the Invention (15) For example; an illuminator 40 includes a tiltable mirror and a wedge type optical element. Alternatively, or in addition, the wedge-shaped optical element can be tilted to adjust for remote center error correction. While particular embodiments of the invention have been described above, it will be appreciated that the invention may be practiced otherwise. The present invention is not limited to the description. m

Page 19 1283798 Schematic description «Γ

Page 20

Claims (1)

1283798 Case No. 6. Patent application scope 1. A lithography projection device - an illumination system, 89127>7 Intrusion and Moon I Ρ7Γ ^~' P r-- Correction: Set, which contains: X" which is used to provide a radiation projection beam; a patterning device for making the projection beam according to a desired pattern a pattern; for holding a substrate; and a shadow system for projecting a pattern beam onto the center of the substrate. 2. Using 3. The axis is 4. The tilted distance 5. Tilt 6. Contains a 7. Non- 8. One item, another error such as Shen Yuzhi, such as the horizontal axis of the application, such as the application of the application in the distance, such as Shen Shen, such as the application plane, such as the base table, which deviates from the spindle bidding part, including one for compensation A remote optical component that deviates from the spindle projection system. The device of claim 1, wherein the pattern device comprises a reticle table of a reticle. The device of item 1 or 2, wherein the light of the illumination system is substantially parallel to the optical axis of the projection system, but the patent range is displaced, and the optical center error of the system is claimed. Please patent the scope to make the distance from the center. The scope of the patent range (prof i) is the device of claim 1 or 2, wherein the optical element is a shaft for compensating a device that deviates from item 4 of the spindle projection system, wherein the optical element is adjustable for error compensation The device of item 1 or 2, wherein the optical element comprises the device of item 6, wherein the reflective element has the device of item 1 e), wherein the optical element comprises O:\68\68546-950518.ptc Page 21 1283798 _ Case No. 89127977_年月日日__ VI. Patent application range Wedge transmission optical components. 9. The device of claim 8, wherein the wedge-shaped optical element comprises a prismatic plate. 10. The device of claim 8 wherein the wedge-shaped optical component comprises a portion of a lens that is substantially axially symmetric. A device as claimed in claim 8, wherein the optical component is applied to a position closest to the patterning device or a position intrinsically bonded thereto. 1 2 . A method of fabricating a component comprising the steps of: - providing a substrate partially covered by at least one layer of radiation-sensitive material; - providing a radiation projection beam for a radiation system; - providing a cross-section of the surface using a patterning device a projection beam having a pattern; and - projecting the radiation pattern beam to a target portion of the radiation sensitive material layer using an off-axis projection system, wherein the optical element is adapted to compensate for the distance from the spindle projection system Distance from the center. 1 3. An illumination system for a lithographic projection apparatus for providing a radiation projection beam, essentially produced or projected onto a substrate by an off-axis projection system, including for compensating for deviations Optical component for remote central error of the spindle projection system. O:\68\68546-950518.ptc Page 22