JP2002324752A5 - - Google Patents

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Publication number
JP2002324752A5
JP2002324752A5 JP2002023547A JP2002023547A JP2002324752A5 JP 2002324752 A5 JP2002324752 A5 JP 2002324752A5 JP 2002023547 A JP2002023547 A JP 2002023547A JP 2002023547 A JP2002023547 A JP 2002023547A JP 2002324752 A5 JP2002324752 A5 JP 2002324752A5
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JP
Japan
Prior art keywords
optical system
projection optical
wavefront
pattern
term
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002023547A
Other languages
English (en)
Japanese (ja)
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JP4436029B2 (ja
JP2002324752A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2002023547A external-priority patent/JP4436029B2/ja
Priority to JP2002023547A priority Critical patent/JP4436029B2/ja
Priority to TW092116919A priority patent/TWI220999B/zh
Priority to TW092116920A priority patent/TWI221000B/zh
Priority to TW091102348A priority patent/TW591694B/zh
Priority to TW092116918A priority patent/TWI220998B/zh
Priority to KR1020020007723A priority patent/KR100894238B1/ko
Priority to EP02250904A priority patent/EP1231516A3/en
Priority to US10/072,866 priority patent/US6961115B2/en
Priority to SG200506961-2A priority patent/SG155035A1/en
Priority to SG200200765A priority patent/SG118115A1/en
Priority to CNB02104628XA priority patent/CN100401191C/zh
Publication of JP2002324752A publication Critical patent/JP2002324752A/ja
Priority to US11/214,795 priority patent/US7215408B2/en
Publication of JP2002324752A5 publication Critical patent/JP2002324752A5/ja
Priority to US11/449,694 priority patent/US20060285100A1/en
Publication of JP4436029B2 publication Critical patent/JP4436029B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002023547A 2001-02-13 2002-01-31 投影光学系の製造方法及び調整方法、露光装置及びその製造方法、デバイス製造方法、並びにコンピュータシステム Expired - Fee Related JP4436029B2 (ja)

Priority Applications (13)

Application Number Priority Date Filing Date Title
JP2002023547A JP4436029B2 (ja) 2001-02-13 2002-01-31 投影光学系の製造方法及び調整方法、露光装置及びその製造方法、デバイス製造方法、並びにコンピュータシステム
TW092116919A TWI220999B (en) 2001-02-13 2002-02-08 Measuring method of image formation characteristic, exposure method, exposure apparatus and its adjustment method, manufacture method of device, and recording medium
TW092116920A TWI221000B (en) 2001-02-13 2002-02-08 Manufacturing method of exposure apparatus, adjustment method of exposure apparatus, and exposure method
TW091102348A TW591694B (en) 2001-02-13 2002-02-08 Specification determining method, making method and adjusting method of projection optical system, exposure apparatus and making method thereof, and computer system
TW092116918A TWI220998B (en) 2001-02-13 2002-02-08 Exposure method, exposure apparatus and manufacture method of the same
KR1020020007723A KR100894238B1 (ko) 2001-02-13 2002-02-09 사양결정방법, 투영광학계의 제조방법 및 조정방법, 노광 장치 및 그의 제조방법, 그리고 컴퓨터 시스템
EP02250904A EP1231516A3 (en) 2001-02-13 2002-02-11 Method of forming and adjusting optical system and exposure apparatus, and for determining specification thereof and related computer system
US10/072,866 US6961115B2 (en) 2001-02-13 2002-02-12 Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system
SG200506961-2A SG155035A1 (en) 2001-02-13 2002-02-14 Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system
SG200200765A SG118115A1 (en) 2001-02-13 2002-02-14 Specification determining method projection optical system making method and adjusting method exposure apparatus and making method thereof and computer system
CNB02104628XA CN100401191C (zh) 2001-02-13 2002-02-19 曝光方法、曝光设备以及器件制造方法
US11/214,795 US7215408B2 (en) 2001-02-13 2005-08-31 Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system
US11/449,694 US20060285100A1 (en) 2001-02-13 2006-06-09 Exposure apparatus and exposure method, and device manufacturing method

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2001036184 2001-02-13
JP2001051178 2001-02-26
JP2001-36184 2001-02-26
JP2001-51178 2001-02-26
JP2002023547A JP4436029B2 (ja) 2001-02-13 2002-01-31 投影光学系の製造方法及び調整方法、露光装置及びその製造方法、デバイス製造方法、並びにコンピュータシステム

Publications (3)

Publication Number Publication Date
JP2002324752A JP2002324752A (ja) 2002-11-08
JP2002324752A5 true JP2002324752A5 (enExample) 2005-09-15
JP4436029B2 JP4436029B2 (ja) 2010-03-24

Family

ID=27345976

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002023547A Expired - Fee Related JP4436029B2 (ja) 2001-02-13 2002-01-31 投影光学系の製造方法及び調整方法、露光装置及びその製造方法、デバイス製造方法、並びにコンピュータシステム

Country Status (1)

Country Link
JP (1) JP4436029B2 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1478010A4 (en) 2002-01-29 2007-12-12 Nikon Corp PICTURE CONTROL STATE SETUP SYSTEM, EXPOSURE METHOD, EXPOSURE DEVICE, PROGRAM AND INFORMATION RECORDING MEDIUM
JP4352458B2 (ja) 2002-03-01 2009-10-28 株式会社ニコン 投影光学系の調整方法、予測方法、評価方法、調整方法、露光方法及び露光装置、露光装置の製造方法、プログラム並びにデバイス製造方法
JP4574198B2 (ja) * 2004-03-17 2010-11-04 キヤノン株式会社 露光装置、その調整方法及びデバイス製造方法
DE102004035595B4 (de) * 2004-04-09 2008-02-07 Carl Zeiss Smt Ag Verfahren zur Justage eines Projektionsobjektives
JP4657740B2 (ja) * 2005-01-26 2011-03-23 キヤノン株式会社 荷電粒子線光学系用収差測定装置、該収差測定装置を具備する荷電粒子線露光装置及び該装置を用いたデバイス製造方法
JP4652830B2 (ja) * 2005-01-26 2011-03-16 キヤノン株式会社 収差調整方法、デバイス製造方法及び荷電粒子線露光装置
JP4336671B2 (ja) 2005-07-15 2009-09-30 キヤノン株式会社 露光パラメータの決定をコンピュータに実行させるプログラム、露光パラメータを決定する決定方法、露光方法及びデバイス製造方法。
JP4701030B2 (ja) * 2005-07-22 2011-06-15 キヤノン株式会社 露光装置、露光パラメータを設定する設定方法、露光方法、デバイス製造方法及びプログラム
CN101479667B (zh) * 2006-07-03 2011-12-07 卡尔蔡司Smt有限责任公司 修正/修复光刻投影物镜的方法
WO2008064859A2 (en) 2006-12-01 2008-06-05 Carl Zeiss Smt Ag Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
JP5013921B2 (ja) * 2007-03-29 2012-08-29 キヤノン株式会社 収差計測方法、露光装置及びデバイス製造方法
JP5055141B2 (ja) * 2008-01-10 2012-10-24 キヤノン株式会社 評価方法、調整方法、露光装置、およびプログラム
DE102008042356A1 (de) * 2008-09-25 2010-04-08 Carl Zeiss Smt Ag Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit
NL2006773A (en) 2010-06-23 2011-12-27 Asml Netherlands Bv Lithographic apparatus.
JP6220553B2 (ja) * 2013-05-22 2017-10-25 株式会社ニューフレアテクノロジー 焦点位置調整方法および検査方法
JP6478593B2 (ja) * 2014-11-28 2019-03-06 キヤノン株式会社 投影光学系の製造方法、および、デバイス製造方法
JP6674250B2 (ja) * 2015-12-16 2020-04-01 キヤノン株式会社 露光装置、露光方法、および物品の製造方法
CN110531379B (zh) * 2019-09-02 2022-07-08 中国科学院新疆天文台 副反射面的位姿调整量的确定方法、位姿调整方法及装置

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