JP2009105097A5 - - Google Patents

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Publication number
JP2009105097A5
JP2009105097A5 JP2007273092A JP2007273092A JP2009105097A5 JP 2009105097 A5 JP2009105097 A5 JP 2009105097A5 JP 2007273092 A JP2007273092 A JP 2007273092A JP 2007273092 A JP2007273092 A JP 2007273092A JP 2009105097 A5 JP2009105097 A5 JP 2009105097A5
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JP
Japan
Prior art keywords
characteristic value
adjustment amount
optical characteristic
exposure apparatus
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007273092A
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English (en)
Japanese (ja)
Other versions
JP2009105097A (ja
JP5105474B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2007273092A priority Critical patent/JP5105474B2/ja
Priority claimed from JP2007273092A external-priority patent/JP5105474B2/ja
Priority to TW097138552A priority patent/TW200931192A/zh
Priority to US12/251,780 priority patent/US8102503B2/en
Priority to KR1020080101807A priority patent/KR101124776B1/ko
Publication of JP2009105097A publication Critical patent/JP2009105097A/ja
Publication of JP2009105097A5 publication Critical patent/JP2009105097A5/ja
Application granted granted Critical
Publication of JP5105474B2 publication Critical patent/JP5105474B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2007273092A 2007-10-19 2007-10-19 露光装置及びデバイス製造方法 Expired - Fee Related JP5105474B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007273092A JP5105474B2 (ja) 2007-10-19 2007-10-19 露光装置及びデバイス製造方法
TW097138552A TW200931192A (en) 2007-10-19 2008-10-07 Exposure apparatus and method of manufacturing device
US12/251,780 US8102503B2 (en) 2007-10-19 2008-10-15 Exposure apparatus and method of manufacturing device
KR1020080101807A KR101124776B1 (ko) 2007-10-19 2008-10-17 노광 장치 및 디바이스 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007273092A JP5105474B2 (ja) 2007-10-19 2007-10-19 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2009105097A JP2009105097A (ja) 2009-05-14
JP2009105097A5 true JP2009105097A5 (enExample) 2010-12-24
JP5105474B2 JP5105474B2 (ja) 2012-12-26

Family

ID=40563168

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007273092A Expired - Fee Related JP5105474B2 (ja) 2007-10-19 2007-10-19 露光装置及びデバイス製造方法

Country Status (4)

Country Link
US (1) US8102503B2 (enExample)
JP (1) JP5105474B2 (enExample)
KR (1) KR101124776B1 (enExample)
TW (1) TW200931192A (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008042356A1 (de) * 2008-09-25 2010-04-08 Carl Zeiss Smt Ag Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit
EP2219077A1 (en) 2009-02-12 2010-08-18 Carl Zeiss SMT AG Projection exposure method, projection exposure system and projection objective
JP2010278034A (ja) * 2009-05-26 2010-12-09 Canon Inc 露光装置及びデバイス製造方法
JP5418768B2 (ja) * 2009-06-26 2014-02-19 キヤノン株式会社 露光装置、調整方法及びデバイスの製造方法
CN102540745B (zh) * 2010-12-22 2014-01-22 上海微电子装备有限公司 一种基于空间像主成分控制的曝光系统
JP5969848B2 (ja) * 2012-07-19 2016-08-17 キヤノン株式会社 露光装置、調整対象の調整量を求める方法、プログラム及びデバイスの製造方法
KR101668984B1 (ko) * 2013-09-14 2016-10-24 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 장치의 동작 방법
DE102013225381A1 (de) * 2013-12-10 2014-11-06 Carl Zeiss Smt Gmbh Verfahren zur Kalibrierung eines Manipulators
US9671673B2 (en) * 2014-11-17 2017-06-06 Singapore University Of Technology And Design Optical device for dispersion compensation
CN111492316B (zh) * 2017-12-19 2024-06-28 Asml荷兰有限公司 光刻方法和设备
US10627727B2 (en) 2018-06-13 2020-04-21 Taiwan Semiconductor Manufacturing Co., Ltd. Lens control for lithography tools

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3190844B2 (ja) * 1996-12-20 2001-07-23 日本電気株式会社 コンピュータ演算処理方法
JP3673633B2 (ja) 1997-12-16 2005-07-20 キヤノン株式会社 投影光学系の組立調整方法
JP2001037087A (ja) * 1999-07-14 2001-02-09 Mitsubishi Electric Corp 発電機出力決定装置及び発電機出力決定方法
JP4174660B2 (ja) 2000-12-28 2008-11-05 株式会社ニコン 露光方法及び装置、プログラム及び情報記録媒体、並びにデバイス製造方法
JP4689081B2 (ja) 2001-06-06 2011-05-25 キヤノン株式会社 露光装置、調整方法、およびデバイス製造方法
JP4574198B2 (ja) * 2004-03-17 2010-11-04 キヤノン株式会社 露光装置、その調整方法及びデバイス製造方法
JP2006221676A (ja) * 2006-05-25 2006-08-24 Hitachi Ltd 最適ポートフォリオ決定装置
JP2010278034A (ja) * 2009-05-26 2010-12-09 Canon Inc 露光装置及びデバイス製造方法

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