JP5105474B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

Info

Publication number
JP5105474B2
JP5105474B2 JP2007273092A JP2007273092A JP5105474B2 JP 5105474 B2 JP5105474 B2 JP 5105474B2 JP 2007273092 A JP2007273092 A JP 2007273092A JP 2007273092 A JP2007273092 A JP 2007273092A JP 5105474 B2 JP5105474 B2 JP 5105474B2
Authority
JP
Japan
Prior art keywords
characteristic value
adjustment amount
optical characteristic
value
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007273092A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009105097A (ja
JP2009105097A5 (enExample
Inventor
勇治 品野
俊幸 吉原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Tokyo University of Agriculture and Technology NUC
Original Assignee
Canon Inc
Tokyo University of Agriculture and Technology NUC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc, Tokyo University of Agriculture and Technology NUC filed Critical Canon Inc
Priority to JP2007273092A priority Critical patent/JP5105474B2/ja
Priority to TW097138552A priority patent/TW200931192A/zh
Priority to US12/251,780 priority patent/US8102503B2/en
Priority to KR1020080101807A priority patent/KR101124776B1/ko
Publication of JP2009105097A publication Critical patent/JP2009105097A/ja
Publication of JP2009105097A5 publication Critical patent/JP2009105097A5/ja
Application granted granted Critical
Publication of JP5105474B2 publication Critical patent/JP5105474B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2007273092A 2007-10-19 2007-10-19 露光装置及びデバイス製造方法 Expired - Fee Related JP5105474B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007273092A JP5105474B2 (ja) 2007-10-19 2007-10-19 露光装置及びデバイス製造方法
TW097138552A TW200931192A (en) 2007-10-19 2008-10-07 Exposure apparatus and method of manufacturing device
US12/251,780 US8102503B2 (en) 2007-10-19 2008-10-15 Exposure apparatus and method of manufacturing device
KR1020080101807A KR101124776B1 (ko) 2007-10-19 2008-10-17 노광 장치 및 디바이스 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007273092A JP5105474B2 (ja) 2007-10-19 2007-10-19 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2009105097A JP2009105097A (ja) 2009-05-14
JP2009105097A5 JP2009105097A5 (enExample) 2010-12-24
JP5105474B2 true JP5105474B2 (ja) 2012-12-26

Family

ID=40563168

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007273092A Expired - Fee Related JP5105474B2 (ja) 2007-10-19 2007-10-19 露光装置及びデバイス製造方法

Country Status (4)

Country Link
US (1) US8102503B2 (enExample)
JP (1) JP5105474B2 (enExample)
KR (1) KR101124776B1 (enExample)
TW (1) TW200931192A (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008042356A1 (de) * 2008-09-25 2010-04-08 Carl Zeiss Smt Ag Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit
EP2219077A1 (en) 2009-02-12 2010-08-18 Carl Zeiss SMT AG Projection exposure method, projection exposure system and projection objective
JP2010278034A (ja) * 2009-05-26 2010-12-09 Canon Inc 露光装置及びデバイス製造方法
JP5418768B2 (ja) * 2009-06-26 2014-02-19 キヤノン株式会社 露光装置、調整方法及びデバイスの製造方法
CN102540745B (zh) * 2010-12-22 2014-01-22 上海微电子装备有限公司 一种基于空间像主成分控制的曝光系统
JP5969848B2 (ja) * 2012-07-19 2016-08-17 キヤノン株式会社 露光装置、調整対象の調整量を求める方法、プログラム及びデバイスの製造方法
KR101668984B1 (ko) * 2013-09-14 2016-10-24 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 장치의 동작 방법
DE102013225381A1 (de) * 2013-12-10 2014-11-06 Carl Zeiss Smt Gmbh Verfahren zur Kalibrierung eines Manipulators
US9671673B2 (en) * 2014-11-17 2017-06-06 Singapore University Of Technology And Design Optical device for dispersion compensation
CN111492316B (zh) * 2017-12-19 2024-06-28 Asml荷兰有限公司 光刻方法和设备
US10627727B2 (en) 2018-06-13 2020-04-21 Taiwan Semiconductor Manufacturing Co., Ltd. Lens control for lithography tools

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3190844B2 (ja) * 1996-12-20 2001-07-23 日本電気株式会社 コンピュータ演算処理方法
JP3673633B2 (ja) 1997-12-16 2005-07-20 キヤノン株式会社 投影光学系の組立調整方法
JP2001037087A (ja) * 1999-07-14 2001-02-09 Mitsubishi Electric Corp 発電機出力決定装置及び発電機出力決定方法
JP4174660B2 (ja) 2000-12-28 2008-11-05 株式会社ニコン 露光方法及び装置、プログラム及び情報記録媒体、並びにデバイス製造方法
JP4689081B2 (ja) 2001-06-06 2011-05-25 キヤノン株式会社 露光装置、調整方法、およびデバイス製造方法
JP4574198B2 (ja) * 2004-03-17 2010-11-04 キヤノン株式会社 露光装置、その調整方法及びデバイス製造方法
JP2006221676A (ja) * 2006-05-25 2006-08-24 Hitachi Ltd 最適ポートフォリオ決定装置
JP2010278034A (ja) * 2009-05-26 2010-12-09 Canon Inc 露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
JP2009105097A (ja) 2009-05-14
US8102503B2 (en) 2012-01-24
US20090103065A1 (en) 2009-04-23
KR101124776B1 (ko) 2012-03-23
KR20090040228A (ko) 2009-04-23
TW200931192A (en) 2009-07-16

Similar Documents

Publication Publication Date Title
JP5105474B2 (ja) 露光装置及びデバイス製造方法
JP4352458B2 (ja) 投影光学系の調整方法、予測方法、評価方法、調整方法、露光方法及び露光装置、露光装置の製造方法、プログラム並びにデバイス製造方法
JP4817702B2 (ja) 光学装置及びそれを備えた露光装置
US7965387B2 (en) Image plane measurement method, exposure method, device manufacturing method, and exposure apparatus
JP4174660B2 (ja) 露光方法及び装置、プログラム及び情報記録媒体、並びにデバイス製造方法
US20060008716A1 (en) Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus
JP2006157020A (ja) リソグラフィ投影装置及びそのようなリソグラフィ投影装置を使用したデバイス製造方法
US10488763B2 (en) Pattern-edge placement predictor and monitor for lithographic exposure tool
JP2010278034A (ja) 露光装置及びデバイス製造方法
EP1128217B1 (en) Method of measuring aberration in an optical imaging system
JP2024500021A (ja) リソグラフィ方法
JP5969848B2 (ja) 露光装置、調整対象の調整量を求める方法、プログラム及びデバイスの製造方法
JP2009194107A (ja) 有効光源形状のデータベースの生成方法、光学像の算出方法、プログラム、露光方法及びデバイス製造方法
TWI675259B (zh) 微影系統、模擬裝置、及圖案形成方法
JP5118407B2 (ja) 光学系、露光装置及びデバイス製造方法
JP5418768B2 (ja) 露光装置、調整方法及びデバイスの製造方法
US10018922B2 (en) Tuning of optical projection system to optimize image-edge placement
JP2003045795A (ja) 光学特性計測方法、投影光学系の調整方法及び露光方法、並びに露光装置の製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101019

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20101019

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20101019

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120420

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120507

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120706

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120831

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120927

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20151012

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees