JPH09311278A - 反射屈折光学系 - Google Patents

反射屈折光学系

Info

Publication number
JPH09311278A
JPH09311278A JP8149903A JP14990396A JPH09311278A JP H09311278 A JPH09311278 A JP H09311278A JP 8149903 A JP8149903 A JP 8149903A JP 14990396 A JP14990396 A JP 14990396A JP H09311278 A JPH09311278 A JP H09311278A
Authority
JP
Japan
Prior art keywords
optical system
imaging
group
lens
catadioptric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8149903A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09311278A5 (enExample
Inventor
Yuutou Takahashi
友刀 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8149903A priority Critical patent/JPH09311278A/ja
Priority to US08/858,560 priority patent/US5805334A/en
Publication of JPH09311278A publication Critical patent/JPH09311278A/ja
Priority to US09/659,375 priority patent/USRE39296E1/en
Publication of JPH09311278A5 publication Critical patent/JPH09311278A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8149903A 1993-03-12 1996-05-20 反射屈折光学系 Pending JPH09311278A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8149903A JPH09311278A (ja) 1996-05-20 1996-05-20 反射屈折光学系
US08/858,560 US5805334A (en) 1996-05-20 1997-05-19 Catadioptric projection systems
US09/659,375 USRE39296E1 (en) 1993-03-12 2000-09-08 Catadioptric projection systems

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8149903A JPH09311278A (ja) 1996-05-20 1996-05-20 反射屈折光学系

Publications (2)

Publication Number Publication Date
JPH09311278A true JPH09311278A (ja) 1997-12-02
JPH09311278A5 JPH09311278A5 (enExample) 2004-08-12

Family

ID=15485129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8149903A Pending JPH09311278A (ja) 1993-03-12 1996-05-20 反射屈折光学系

Country Status (2)

Country Link
US (2) US5805334A (enExample)
JP (1) JPH09311278A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000034918A (ko) * 1998-11-10 2000-06-26 헨켈 카르스텐 편광학적으로 보상되는 오브젝티브
JP2003504687A (ja) * 1999-07-07 2003-02-04 ケーエルエー−テンカー テクノロジィース コーポレイション ブロードバンド紫外線カタディオプトリックイメージングシステム
JP4826695B2 (ja) * 2000-03-03 2011-11-30 株式会社ニコン 反射屈折光学系および該光学系を備えた投影露光装置

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JP3395801B2 (ja) * 1994-04-28 2003-04-14 株式会社ニコン 反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法
US6157498A (en) 1996-06-19 2000-12-05 Nikon Corporation Dual-imaging optical system
JP3823436B2 (ja) * 1997-04-03 2006-09-20 株式会社ニコン 投影光学系
EP1079253A4 (en) 1998-04-07 2004-09-01 Nikon Corp DEVICE AND PROCESS FOR PROJECTION EXPOSURE, AND OPTICAL SYSTEM WITH REFLECTION AND REFRACTION
EP1293832A1 (en) 1998-06-08 2003-03-19 Nikon Corporation Projection exposure apparatus and method
EP0989434B1 (en) * 1998-07-29 2006-11-15 Carl Zeiss SMT AG Catadioptric optical system and exposure apparatus having the same
JP2002083766A (ja) 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
US6842298B1 (en) 2000-09-12 2005-01-11 Kla-Tencor Technologies Corporation Broad band DUV, VUV long-working distance catadioptric imaging system
US7136159B2 (en) * 2000-09-12 2006-11-14 Kla-Tencor Technologies Corporation Excimer laser inspection system
US7136234B2 (en) * 2000-09-12 2006-11-14 Kla-Tencor Technologies Corporation Broad band DUV, VUV long-working distance catadioptric imaging system
JP4245286B2 (ja) * 2000-10-23 2009-03-25 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
JP2002244034A (ja) * 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
US6898025B2 (en) * 2002-06-04 2005-05-24 Pentax Corporation Projection aligner and optical system therefor
US7869121B2 (en) 2003-02-21 2011-01-11 Kla-Tencor Technologies Corporation Small ultra-high NA catadioptric objective using aspheric surfaces
US7646533B2 (en) * 2003-02-21 2010-01-12 Kla-Tencor Technologies Corporation Small ultra-high NA catadioptric objective
US7672043B2 (en) * 2003-02-21 2010-03-02 Kla-Tencor Technologies Corporation Catadioptric imaging system exhibiting enhanced deep ultraviolet spectral bandwidth
US7639419B2 (en) * 2003-02-21 2009-12-29 Kla-Tencor Technologies, Inc. Inspection system using small catadioptric objective
US7180658B2 (en) * 2003-02-21 2007-02-20 Kla-Tencor Technologies Corporation High performance catadioptric imaging system
US7884998B2 (en) 2003-02-21 2011-02-08 Kla - Tencor Corporation Catadioptric microscope objective employing immersion liquid for use in broad band microscopy
SG139733A1 (en) 2003-04-11 2008-02-29 Nikon Corp Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
TWI543235B (zh) 2003-06-19 2016-07-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
US20060026431A1 (en) * 2004-07-30 2006-02-02 Hitachi Global Storage Technologies B.V. Cryptographic letterheads
US7301707B2 (en) * 2004-09-03 2007-11-27 Carl Zeiss Smt Ag Projection optical system and method
CN100504506C (zh) * 2005-06-07 2009-06-24 佳世达科技股份有限公司 投影机的光学系统
US8665536B2 (en) 2007-06-19 2014-03-04 Kla-Tencor Corporation External beam delivery system for laser dark-field illumination in a catadioptric optical system

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000034918A (ko) * 1998-11-10 2000-06-26 헨켈 카르스텐 편광학적으로 보상되는 오브젝티브
JP2003504687A (ja) * 1999-07-07 2003-02-04 ケーエルエー−テンカー テクノロジィース コーポレイション ブロードバンド紫外線カタディオプトリックイメージングシステム
JP4761684B2 (ja) * 1999-07-07 2011-08-31 ケーエルエー−テンカー コーポレイション ブロードバンド紫外線カタディオプトリックイメージングシステム
JP4826695B2 (ja) * 2000-03-03 2011-11-30 株式会社ニコン 反射屈折光学系および該光学系を備えた投影露光装置

Also Published As

Publication number Publication date
US5805334A (en) 1998-09-08
USRE39296E1 (en) 2006-09-19

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