JPH09293676A - 投影光学系及び投影露光装置 - Google Patents

投影光学系及び投影露光装置

Info

Publication number
JPH09293676A
JPH09293676A JP8129153A JP12915396A JPH09293676A JP H09293676 A JPH09293676 A JP H09293676A JP 8129153 A JP8129153 A JP 8129153A JP 12915396 A JP12915396 A JP 12915396A JP H09293676 A JPH09293676 A JP H09293676A
Authority
JP
Japan
Prior art keywords
optical system
exposed
illumination light
substrate
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8129153A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09293676A5 (enExample
Inventor
Masami Seki
昌美 関
Hiroshi Chiba
洋 千葉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8129153A priority Critical patent/JPH09293676A/ja
Priority to US08/850,733 priority patent/US5959784A/en
Publication of JPH09293676A publication Critical patent/JPH09293676A/ja
Publication of JPH09293676A5 publication Critical patent/JPH09293676A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/002—Arrays of reflective systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/008—Systems specially adapted to form image relays or chained systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP8129153A 1996-04-24 1996-04-24 投影光学系及び投影露光装置 Pending JPH09293676A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP8129153A JPH09293676A (ja) 1996-04-24 1996-04-24 投影光学系及び投影露光装置
US08/850,733 US5959784A (en) 1996-04-24 1997-04-24 Optical projection systems and projection-exposure apparatus comprising same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8129153A JPH09293676A (ja) 1996-04-24 1996-04-24 投影光学系及び投影露光装置

Publications (2)

Publication Number Publication Date
JPH09293676A true JPH09293676A (ja) 1997-11-11
JPH09293676A5 JPH09293676A5 (enExample) 2004-11-11

Family

ID=15002460

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8129153A Pending JPH09293676A (ja) 1996-04-24 1996-04-24 投影光学系及び投影露光装置

Country Status (2)

Country Link
US (1) US5959784A (enExample)
JP (1) JPH09293676A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000047390A (ja) * 1998-05-22 2000-02-18 Nikon Corp 露光装置およびその製造方法
WO2000038017A1 (en) * 1998-12-21 2000-06-29 The Regents Of The University Of California Projection optics box or assembly
JP2005509893A (ja) * 2001-05-25 2005-04-14 コダック・ポリクローム・グラフィックス・エルエルシー 小型結像ヘッド、高速マルチヘッドレーザ結像アセンブリ、および高速マルチヘッドレーザ結像方法
JP2009217244A (ja) * 2008-02-15 2009-09-24 Canon Inc 露光装置
US9229205B2 (en) 2011-08-24 2016-01-05 Canon Kabushiki Kaisha Projection optical system, exposure apparatus, and method of manufacturing device

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001215718A (ja) 1999-11-26 2001-08-10 Nikon Corp 露光装置及び露光方法
US6569606B1 (en) 2000-07-27 2003-05-27 Advanced Micro Devices, Inc. Method of reducing photoresist shadowing during angled implants
US6407872B1 (en) * 2001-02-16 2002-06-18 Carl Zeiss, Inc. Optical path length scanner using moving prisms
DE10118047A1 (de) * 2001-04-11 2002-10-17 Zeiss Carl Katadioptrisches Objektiv
US20030095339A1 (en) * 2001-11-20 2003-05-22 Pentax Corporation Projection aligner
TWI240850B (en) * 2001-12-26 2005-10-01 Pentax Corp Projection aligner
TWI232347B (en) * 2001-12-26 2005-05-11 Pentax Corp Projection aligner
TWI232348B (en) * 2001-12-26 2005-05-11 Pentax Corp Projection aligner
US6731374B1 (en) * 2002-12-02 2004-05-04 Asml Holding N.V. Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system
JP4289918B2 (ja) * 2003-05-01 2009-07-01 キヤノン株式会社 位置検出装置、及び該位置検出装置を有するアライメント装置
WO2005113804A1 (en) * 2004-05-20 2005-12-01 Trillion Genomics Limited Use of mass labelled probes to detect target nucleic acids using mass spectrometry

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06265824A (ja) * 1993-03-15 1994-09-22 Toshiba Corp 位置合せ装置
JPH0786139A (ja) * 1993-09-14 1995-03-31 Nikon Corp 露光装置
JPH07273000A (ja) * 1994-03-28 1995-10-20 Nikon Corp 走査型露光装置
JPH088158A (ja) * 1994-06-17 1996-01-12 Fujitsu Ltd プロジェクションマスクアライナのフォーカス調整方法
JPH0864501A (ja) * 1994-08-25 1996-03-08 Nikon Corp 投影光学系及びそれを備えた露光装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3724517B2 (ja) * 1995-01-18 2005-12-07 株式会社ニコン 露光装置
US5729331A (en) * 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
US5581075A (en) * 1993-10-06 1996-12-03 Nikon Corporation Multi-beam scanning projection exposure apparatus and method with beam monitoring and control for uniform exposure of large area
US5585972A (en) * 1995-02-15 1996-12-17 Ultratech Stepper, Inc. Arbitrarily wide lens array with an image field to span the width of a substrate

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06265824A (ja) * 1993-03-15 1994-09-22 Toshiba Corp 位置合せ装置
JPH0786139A (ja) * 1993-09-14 1995-03-31 Nikon Corp 露光装置
JPH07273000A (ja) * 1994-03-28 1995-10-20 Nikon Corp 走査型露光装置
JPH088158A (ja) * 1994-06-17 1996-01-12 Fujitsu Ltd プロジェクションマスクアライナのフォーカス調整方法
JPH0864501A (ja) * 1994-08-25 1996-03-08 Nikon Corp 投影光学系及びそれを備えた露光装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000047390A (ja) * 1998-05-22 2000-02-18 Nikon Corp 露光装置およびその製造方法
WO2000038017A1 (en) * 1998-12-21 2000-06-29 The Regents Of The University Of California Projection optics box or assembly
JP2005509893A (ja) * 2001-05-25 2005-04-14 コダック・ポリクローム・グラフィックス・エルエルシー 小型結像ヘッド、高速マルチヘッドレーザ結像アセンブリ、および高速マルチヘッドレーザ結像方法
JP2011043831A (ja) * 2001-05-25 2011-03-03 Kodak Polychrome Graphics Gmbh 小型結像ヘッド、高速マルチヘッドレーザ結像アセンブリ、および高速マルチヘッドレーザ結像方法
JP4913320B2 (ja) * 2001-05-25 2012-04-11 コダック・ポリクロウム・グラフィックス・ゲーエムベーハー 結像アセンブリ、結像システム、印刷プレートを準備する方法、およびレーザ結像アセンブリ
JP2009217244A (ja) * 2008-02-15 2009-09-24 Canon Inc 露光装置
TWI414898B (zh) * 2008-02-15 2013-11-11 Canon Kk 曝光設備
US9229205B2 (en) 2011-08-24 2016-01-05 Canon Kabushiki Kaisha Projection optical system, exposure apparatus, and method of manufacturing device

Also Published As

Publication number Publication date
US5959784A (en) 1999-09-28

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