JPH09293676A5 - - Google Patents

Info

Publication number
JPH09293676A5
JPH09293676A5 JP1996129153A JP12915396A JPH09293676A5 JP H09293676 A5 JPH09293676 A5 JP H09293676A5 JP 1996129153 A JP1996129153 A JP 1996129153A JP 12915396 A JP12915396 A JP 12915396A JP H09293676 A5 JPH09293676 A5 JP H09293676A5
Authority
JP
Japan
Prior art keywords
reflecting surface
optical system
light beam
illumination light
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996129153A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09293676A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8129153A priority Critical patent/JPH09293676A/ja
Priority claimed from JP8129153A external-priority patent/JPH09293676A/ja
Priority to US08/850,733 priority patent/US5959784A/en
Publication of JPH09293676A publication Critical patent/JPH09293676A/ja
Publication of JPH09293676A5 publication Critical patent/JPH09293676A5/ja
Pending legal-status Critical Current

Links

JP8129153A 1996-04-24 1996-04-24 投影光学系及び投影露光装置 Pending JPH09293676A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP8129153A JPH09293676A (ja) 1996-04-24 1996-04-24 投影光学系及び投影露光装置
US08/850,733 US5959784A (en) 1996-04-24 1997-04-24 Optical projection systems and projection-exposure apparatus comprising same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8129153A JPH09293676A (ja) 1996-04-24 1996-04-24 投影光学系及び投影露光装置

Publications (2)

Publication Number Publication Date
JPH09293676A JPH09293676A (ja) 1997-11-11
JPH09293676A5 true JPH09293676A5 (enExample) 2004-11-11

Family

ID=15002460

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8129153A Pending JPH09293676A (ja) 1996-04-24 1996-04-24 投影光学系及び投影露光装置

Country Status (2)

Country Link
US (1) US5959784A (enExample)
JP (1) JPH09293676A (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000047390A (ja) * 1998-05-22 2000-02-18 Nikon Corp 露光装置およびその製造方法
US6147818A (en) * 1998-12-21 2000-11-14 The Regents Of The University Of California Projection optics box
JP2001215718A (ja) 1999-11-26 2001-08-10 Nikon Corp 露光装置及び露光方法
US6569606B1 (en) 2000-07-27 2003-05-27 Advanced Micro Devices, Inc. Method of reducing photoresist shadowing during angled implants
US6643049B2 (en) * 2001-02-01 2003-11-04 Kodak Polychrome Graphics Llc Compact imaging head and high speed multi-head laser imaging assembly and method
US6407872B1 (en) * 2001-02-16 2002-06-18 Carl Zeiss, Inc. Optical path length scanner using moving prisms
DE10118047A1 (de) * 2001-04-11 2002-10-17 Zeiss Carl Katadioptrisches Objektiv
US20030095339A1 (en) * 2001-11-20 2003-05-22 Pentax Corporation Projection aligner
TWI240850B (en) * 2001-12-26 2005-10-01 Pentax Corp Projection aligner
TWI232347B (en) * 2001-12-26 2005-05-11 Pentax Corp Projection aligner
TWI232348B (en) * 2001-12-26 2005-05-11 Pentax Corp Projection aligner
US6731374B1 (en) * 2002-12-02 2004-05-04 Asml Holding N.V. Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system
JP4289918B2 (ja) * 2003-05-01 2009-07-01 キヤノン株式会社 位置検出装置、及び該位置検出装置を有するアライメント装置
WO2005113804A1 (en) * 2004-05-20 2005-12-01 Trillion Genomics Limited Use of mass labelled probes to detect target nucleic acids using mass spectrometry
JP5335397B2 (ja) * 2008-02-15 2013-11-06 キヤノン株式会社 露光装置
JP5782336B2 (ja) 2011-08-24 2015-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3359950B2 (ja) * 1993-03-15 2002-12-24 株式会社東芝 位置合せ装置
JP3724517B2 (ja) * 1995-01-18 2005-12-07 株式会社ニコン 露光装置
US5729331A (en) * 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
JPH0864501A (ja) * 1994-08-25 1996-03-08 Nikon Corp 投影光学系及びそれを備えた露光装置
JP3427128B2 (ja) * 1993-09-14 2003-07-14 株式会社ニコン 露光装置及び露光方法
US5581075A (en) * 1993-10-06 1996-12-03 Nikon Corporation Multi-beam scanning projection exposure apparatus and method with beam monitoring and control for uniform exposure of large area
JP3500618B2 (ja) * 1994-03-28 2004-02-23 株式会社ニコン 走査型露光装置
JPH088158A (ja) * 1994-06-17 1996-01-12 Fujitsu Ltd プロジェクションマスクアライナのフォーカス調整方法
US5585972A (en) * 1995-02-15 1996-12-17 Ultratech Stepper, Inc. Arbitrarily wide lens array with an image field to span the width of a substrate

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