JPH11135420A5 - - Google Patents

Info

Publication number
JPH11135420A5
JPH11135420A5 JP1997316306A JP31630697A JPH11135420A5 JP H11135420 A5 JPH11135420 A5 JP H11135420A5 JP 1997316306 A JP1997316306 A JP 1997316306A JP 31630697 A JP31630697 A JP 31630697A JP H11135420 A5 JPH11135420 A5 JP H11135420A5
Authority
JP
Japan
Prior art keywords
optical system
substrate
projection
optical axis
projected image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1997316306A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11135420A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9316306A priority Critical patent/JPH11135420A/ja
Priority claimed from JP9316306A external-priority patent/JPH11135420A/ja
Publication of JPH11135420A publication Critical patent/JPH11135420A/ja
Publication of JPH11135420A5 publication Critical patent/JPH11135420A5/ja
Withdrawn legal-status Critical Current

Links

JP9316306A 1997-10-30 1997-10-30 投影露光装置 Withdrawn JPH11135420A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9316306A JPH11135420A (ja) 1997-10-30 1997-10-30 投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9316306A JPH11135420A (ja) 1997-10-30 1997-10-30 投影露光装置

Publications (2)

Publication Number Publication Date
JPH11135420A JPH11135420A (ja) 1999-05-21
JPH11135420A5 true JPH11135420A5 (enExample) 2005-07-07

Family

ID=18075669

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9316306A Withdrawn JPH11135420A (ja) 1997-10-30 1997-10-30 投影露光装置

Country Status (1)

Country Link
JP (1) JPH11135420A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002033271A (ja) 2000-05-12 2002-01-31 Nikon Corp 投影露光方法、それを用いたデバイス製造方法、及び投影露光装置
US20060147821A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP6035105B2 (ja) * 2012-10-05 2016-11-30 株式会社Ｓｃｒｅｅｎホールディングス 画像記録装置および画像記録方法
JP6557515B2 (ja) * 2015-06-04 2019-08-07 キヤノン株式会社 走査露光装置、走査露光方法、及びデバイス製造方法

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