JPH11135420A - 投影露光装置 - Google Patents

投影露光装置

Info

Publication number
JPH11135420A
JPH11135420A JP9316306A JP31630697A JPH11135420A JP H11135420 A JPH11135420 A JP H11135420A JP 9316306 A JP9316306 A JP 9316306A JP 31630697 A JP31630697 A JP 31630697A JP H11135420 A JPH11135420 A JP H11135420A
Authority
JP
Japan
Prior art keywords
projection
optical system
substrate
optical axis
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP9316306A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11135420A5 (enExample
Inventor
Kosuke Suzuki
広介 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP9316306A priority Critical patent/JPH11135420A/ja
Publication of JPH11135420A publication Critical patent/JPH11135420A/ja
Publication of JPH11135420A5 publication Critical patent/JPH11135420A5/ja
Withdrawn legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9316306A 1997-10-30 1997-10-30 投影露光装置 Withdrawn JPH11135420A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9316306A JPH11135420A (ja) 1997-10-30 1997-10-30 投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9316306A JPH11135420A (ja) 1997-10-30 1997-10-30 投影露光装置

Publications (2)

Publication Number Publication Date
JPH11135420A true JPH11135420A (ja) 1999-05-21
JPH11135420A5 JPH11135420A5 (enExample) 2005-07-07

Family

ID=18075669

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9316306A Withdrawn JPH11135420A (ja) 1997-10-30 1997-10-30 投影露光装置

Country Status (1)

Country Link
JP (1) JPH11135420A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6509956B2 (en) 2000-05-12 2003-01-21 Nikon Corporation Projection exposure method, manufacturing method for device using same, and projection exposure apparatus
JP2011018925A (ja) * 2004-12-30 2011-01-27 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2014074837A (ja) * 2012-10-05 2014-04-24 Dainippon Screen Mfg Co Ltd 画像記録装置および画像記録方法
JP2017003617A (ja) * 2015-06-04 2017-01-05 キヤノン株式会社 走査露光装置、走査露光方法、及びデバイス製造方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6509956B2 (en) 2000-05-12 2003-01-21 Nikon Corporation Projection exposure method, manufacturing method for device using same, and projection exposure apparatus
JP2011018925A (ja) * 2004-12-30 2011-01-27 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
US8102507B2 (en) 2004-12-30 2012-01-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8354209B2 (en) 2004-12-30 2013-01-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2014074837A (ja) * 2012-10-05 2014-04-24 Dainippon Screen Mfg Co Ltd 画像記録装置および画像記録方法
JP2017003617A (ja) * 2015-06-04 2017-01-05 キヤノン株式会社 走査露光装置、走査露光方法、及びデバイス製造方法

Similar Documents

Publication Publication Date Title
KR100365602B1 (ko) 노광방법및장치와반도체디바이스제조방법
JP3376179B2 (ja) 面位置検出方法
KR101444981B1 (ko) 노광 장치, 노광 방법 및 디바이스 제조 방법
US5483056A (en) Method of projecting exposure with a focus detection mechanism for detecting first and second amounts of defocus
US6151122A (en) Inspection method and apparatus for projection optical systems
JP3308063B2 (ja) 投影露光方法及び装置
TWI401767B (zh) 定位設備、曝光設備及裝置製造方法
US20020080338A1 (en) Projection exposure apparatus
US6310680B1 (en) Method of adjusting a scanning exposure apparatus and scanning exposure apparatus using the method
JP2003347184A (ja) 露光方法及び露光装置、デバイス製造方法
JP2001274080A (ja) 走査型投影露光装置及びその位置合わせ方法
US20110212389A1 (en) Focus test mask, focus measurement method, exposure method and exposure apparatus
US20070229791A1 (en) Step Measuring Device and Apparatus, and Exposure Method and Apparatus
WO1999005709A1 (en) Exposure method and aligner
JPWO2002025711A1 (ja) 結像特性の計測方法及び露光方法
US5963324A (en) Exposure apparatus and method responsive to light beam wavelength variation
JP2000047390A (ja) 露光装置およびその製造方法
JP3526042B2 (ja) 投影露光装置
JP3506155B2 (ja) 投影露光装置
JPH11186129A (ja) 走査型露光方法及び装置
JPH08288192A (ja) 投影露光装置
JPH11135420A (ja) 投影露光装置
US6473156B2 (en) Scanning exposure apparatus and device manufacturing method
KR20230113145A (ko) 노광 방법, 노광 장치 및 물품의 제조 방법
KR20050092434A (ko) 노광 장치

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20041027

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20041027

A761 Written withdrawal of application

Free format text: JAPANESE INTERMEDIATE CODE: A761

Effective date: 20061228