JPH08236721A - 半導体装置及びその製造方法 - Google Patents

半導体装置及びその製造方法

Info

Publication number
JPH08236721A
JPH08236721A JP7064904A JP6490495A JPH08236721A JP H08236721 A JPH08236721 A JP H08236721A JP 7064904 A JP7064904 A JP 7064904A JP 6490495 A JP6490495 A JP 6490495A JP H08236721 A JPH08236721 A JP H08236721A
Authority
JP
Japan
Prior art keywords
peripheral circuit
capacitor
layer
wiring
conductive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7064904A
Other languages
English (en)
Japanese (ja)
Inventor
Yoichi Miyai
羊一 宮井
Koichi Mizobuchi
孝一 溝渕
Yoshihiro Ogata
善広 尾形
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Japan Ltd
Original Assignee
Texas Instruments Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Japan Ltd filed Critical Texas Instruments Japan Ltd
Priority to JP7064904A priority Critical patent/JPH08236721A/ja
Priority to TW085104325A priority patent/TW301788B/zh
Publication of JPH08236721A publication Critical patent/JPH08236721A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Semiconductor Memories (AREA)
JP7064904A 1995-02-28 1995-02-28 半導体装置及びその製造方法 Pending JPH08236721A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP7064904A JPH08236721A (ja) 1995-02-28 1995-02-28 半導体装置及びその製造方法
TW085104325A TW301788B (enExample) 1995-02-28 1996-04-12

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7064904A JPH08236721A (ja) 1995-02-28 1995-02-28 半導体装置及びその製造方法

Publications (1)

Publication Number Publication Date
JPH08236721A true JPH08236721A (ja) 1996-09-13

Family

ID=13271524

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7064904A Pending JPH08236721A (ja) 1995-02-28 1995-02-28 半導体装置及びその製造方法

Country Status (2)

Country Link
JP (1) JPH08236721A (enExample)
TW (1) TW301788B (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010004976A (ko) * 1999-06-30 2001-01-15 김영환 반도체 소자의 콘택 홀 형성방법
KR100273987B1 (ko) * 1997-10-31 2001-02-01 윤종용 디램 장치 및 제조 방법
KR20030033697A (ko) * 2001-10-24 2003-05-01 주식회사 하이닉스반도체 반도체소자 및 그 제조방법
KR100714268B1 (ko) * 2001-06-04 2007-05-02 삼성전자주식회사 반도체 소자 제조방법
KR100866708B1 (ko) * 2002-07-18 2008-11-03 주식회사 하이닉스반도체 반도체소자의 제조방법

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100273987B1 (ko) * 1997-10-31 2001-02-01 윤종용 디램 장치 및 제조 방법
KR20010004976A (ko) * 1999-06-30 2001-01-15 김영환 반도체 소자의 콘택 홀 형성방법
KR100714268B1 (ko) * 2001-06-04 2007-05-02 삼성전자주식회사 반도체 소자 제조방법
KR20030033697A (ko) * 2001-10-24 2003-05-01 주식회사 하이닉스반도체 반도체소자 및 그 제조방법
KR100866708B1 (ko) * 2002-07-18 2008-11-03 주식회사 하이닉스반도체 반도체소자의 제조방법

Also Published As

Publication number Publication date
TW301788B (enExample) 1997-04-01

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