JPH0751221Y2 - 真空チャック - Google Patents

真空チャック

Info

Publication number
JPH0751221Y2
JPH0751221Y2 JP8205090U JP8205090U JPH0751221Y2 JP H0751221 Y2 JPH0751221 Y2 JP H0751221Y2 JP 8205090 U JP8205090 U JP 8205090U JP 8205090 U JP8205090 U JP 8205090U JP H0751221 Y2 JPH0751221 Y2 JP H0751221Y2
Authority
JP
Japan
Prior art keywords
ceramics
conductive
vacuum chuck
conductive member
porous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP8205090U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0442343U (US20020128544A1-20020912-P00008.png
Inventor
和彦 三嶋
敏一 輪竹
幸男 久郷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP8205090U priority Critical patent/JPH0751221Y2/ja
Publication of JPH0442343U publication Critical patent/JPH0442343U/ja
Application granted granted Critical
Publication of JPH0751221Y2 publication Critical patent/JPH0751221Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Jigs For Machine Tools (AREA)
JP8205090U 1990-07-31 1990-07-31 真空チャック Expired - Lifetime JPH0751221Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8205090U JPH0751221Y2 (ja) 1990-07-31 1990-07-31 真空チャック

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8205090U JPH0751221Y2 (ja) 1990-07-31 1990-07-31 真空チャック

Publications (2)

Publication Number Publication Date
JPH0442343U JPH0442343U (US20020128544A1-20020912-P00008.png) 1992-04-10
JPH0751221Y2 true JPH0751221Y2 (ja) 1995-11-22

Family

ID=31628523

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8205090U Expired - Lifetime JPH0751221Y2 (ja) 1990-07-31 1990-07-31 真空チャック

Country Status (1)

Country Link
JP (1) JPH0751221Y2 (US20020128544A1-20020912-P00008.png)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002025947A (ja) * 2000-07-10 2002-01-25 Dowa Mining Co Ltd 半導体素子の製造方法
KR100709776B1 (ko) * 1999-05-21 2007-04-19 가부시키가이샤 브리지스톤 제품 홀더
KR20140055984A (ko) * 2012-10-31 2014-05-09 가부시기가이샤 디스코 가공 장치
JP2015162555A (ja) * 2014-02-27 2015-09-07 株式会社ディスコ 切削装置

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06143073A (ja) * 1992-10-27 1994-05-24 Sony Corp バキュームチャックプレート
JP2010184331A (ja) * 2009-02-13 2010-08-26 Disco Abrasive Syst Ltd 保持テーブルおよび加工装置
JP5378089B2 (ja) * 2009-07-16 2013-12-25 株式会社ディスコ 保護テープ剥離装置
JP5340841B2 (ja) * 2009-07-21 2013-11-13 株式会社ディスコ 切削装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100709776B1 (ko) * 1999-05-21 2007-04-19 가부시키가이샤 브리지스톤 제품 홀더
JP2002025947A (ja) * 2000-07-10 2002-01-25 Dowa Mining Co Ltd 半導体素子の製造方法
KR20140055984A (ko) * 2012-10-31 2014-05-09 가부시기가이샤 디스코 가공 장치
JP2014090105A (ja) * 2012-10-31 2014-05-15 Disco Abrasive Syst Ltd 加工装置
JP2015162555A (ja) * 2014-02-27 2015-09-07 株式会社ディスコ 切削装置

Also Published As

Publication number Publication date
JPH0442343U (US20020128544A1-20020912-P00008.png) 1992-04-10

Similar Documents

Publication Publication Date Title
EP0794566B1 (en) Wafer spacing mask for a substrate support chuck and method of fabricating same
US6639188B2 (en) Ceramic heater
US7084376B2 (en) Semiconductor production device ceramic plate
JPH0751221Y2 (ja) 真空チャック
JP2979194B2 (ja) 真空吸着装置
EP0806793A2 (en) Insulated wafer spacing mask for a substrate support chuck and method of fabricating same
CA2028692A1 (en) Ceramic filter and process for making it
JP3121886B2 (ja) 真空吸着装置
JP3865872B2 (ja) 真空吸着保持装置
TW466666B (en) Method and apparatus for fabricating a wafer spacing mask on a substrate support chuck
JP2003282688A (ja) 静電チャック
JP4703590B2 (ja) 真空吸着装置及びそれを用いた吸着方法
JPH0819927A (ja) 真空吸着装置とその製造方法
JP4545536B2 (ja) 真空吸着用治具
JPH11243135A (ja) 真空吸着盤
JPH056933A (ja) セラミツク製静電チヤツク
JPH09150339A (ja) 真空吸着装置
JP5300363B2 (ja) 保持用治具およびそれを用いた搬送装置
JP2004283936A (ja) 真空吸着装置
JP2002151580A (ja) ウエハー保持具の製造方法及びウエハー保持具
JP2002170871A (ja) 静電チャック
JP7122174B2 (ja) 静電チャック、および、静電チャックの製造方法
JP3320706B2 (ja) ウエハプローバ、ウエハプローバに使用されるセラミック基板およびウエハプローバ装置
JP3370532B2 (ja) 静電チャック
JPH0531239U (ja) 静電チヤツク

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term