JPH07168366A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPH07168366A
JPH07168366A JP5235351A JP23535193A JPH07168366A JP H07168366 A JPH07168366 A JP H07168366A JP 5235351 A JP5235351 A JP 5235351A JP 23535193 A JP23535193 A JP 23535193A JP H07168366 A JPH07168366 A JP H07168366A
Authority
JP
Japan
Prior art keywords
mask
film
substrate
exposure
masks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5235351A
Other languages
English (en)
Japanese (ja)
Inventor
Katsuya Sannomiya
宮 勝 也 三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adtec Engineering Co Ltd
Canon Components Inc
Original Assignee
Adtec Engineering Co Ltd
Canon Components Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adtec Engineering Co Ltd, Canon Components Inc filed Critical Adtec Engineering Co Ltd
Priority to JP5235351A priority Critical patent/JPH07168366A/ja
Priority to TW083101434A priority patent/TW288255B/zh
Priority to GB9413941A priority patent/GB2281980A/en
Priority to KR1019940017474A priority patent/KR950006540A/ko
Publication of JPH07168366A publication Critical patent/JPH07168366A/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00Photographic printing apparatus
    • G03B27/02Exposure apparatus for contact printing
    • G03B27/14Details
    • G03B27/18Maintaining or producing contact pressure between original and light-sensitive material
    • G03B27/20Maintaining or producing contact pressure between original and light-sensitive material by using a vacuum or fluid pressure
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0073Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP5235351A 1993-08-26 1993-08-26 露光装置 Pending JPH07168366A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP5235351A JPH07168366A (ja) 1993-08-26 1993-08-26 露光装置
TW083101434A TW288255B (cs) 1993-08-26 1994-02-21
GB9413941A GB2281980A (en) 1993-08-26 1994-07-11 Printing frame
KR1019940017474A KR950006540A (ko) 1993-08-26 1994-07-20 노광 장치(aligner)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5235351A JPH07168366A (ja) 1993-08-26 1993-08-26 露光装置

Publications (1)

Publication Number Publication Date
JPH07168366A true JPH07168366A (ja) 1995-07-04

Family

ID=16984807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5235351A Pending JPH07168366A (ja) 1993-08-26 1993-08-26 露光装置

Country Status (4)

Country Link
JP (1) JPH07168366A (cs)
KR (1) KR950006540A (cs)
GB (1) GB2281980A (cs)
TW (1) TW288255B (cs)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100315950B1 (ko) * 1999-12-15 2001-12-24 김규환 라벨용 열전사지의 제조방법 및 그 제조방법에 의하여제조된 라벨용 열전사지
FR2822968B1 (fr) * 2001-03-28 2003-08-15 Automa Tech Sa Chassis d'exposition a la lumiere d'un circuit imprime
FR2822966B1 (fr) * 2001-03-28 2003-12-12 Automa Tech Sa Chassis d'exposition a la lumiere d'un circuit imprime
KR20030054444A (ko) * 2001-12-26 2003-07-02 한맥전자 (주) 감광성 레지스터로 적층된 인쇄 회로 기판용 노광장치의진공흡입판과 마스크캐리어장치
FR2842617B1 (fr) * 2002-07-17 2005-01-21 Automa Tech Sa Machine d'exposition de panneaux de circuit imprime
EP1494075B1 (en) 2003-06-30 2008-06-25 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
FR2917850B1 (fr) * 2007-10-12 2009-10-16 Automa Tech Sa Machine d'exposition pour panneaux de circuit imprime

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1222299A (en) * 1969-10-20 1971-02-10 Charles Game An improved apparatus for use in the reproduction of sheet originals
GB1511332A (en) * 1974-04-30 1978-05-17 Hoechst Ag Printing frame
US4054383A (en) * 1976-02-02 1977-10-18 International Business Machines Corporation Jig and process for contact printing
US4504142A (en) * 1983-09-26 1985-03-12 Richards Sr Chester L Photography printing frame
US4704028A (en) * 1986-01-24 1987-11-03 Richards Sr Chester L Vacuum printing frame

Also Published As

Publication number Publication date
GB9413941D0 (en) 1994-08-31
KR950006540A (ko) 1995-03-21
GB2281980A (en) 1995-03-22
TW288255B (cs) 1996-10-11

Similar Documents

Publication Publication Date Title
EP0418427A2 (en) Exposure process
JPS6057216B2 (ja) ジグ
JPH07168366A (ja) 露光装置
JPS5892221A (ja) 半導体基板露光装置
JPH0850357A (ja) 露光装置
JP2001209192A (ja) 基板露光方法および装置
KR20080039202A (ko) 노광장치
JP2001305744A (ja) 密着露光装置
JPH07219234A (ja) 露光機の密着装置
JP2003021909A (ja) 露光装置
JP2004184940A (ja) 露光装置
JP2651052B2 (ja) 密着露光装置
JP3285158B2 (ja) 真空密着焼付装置
JP2000275862A (ja) 密着露光装置
JPH0327045A (ja) プリント配線基板用露光装置
JPS62196826A (ja) 露光装置
JPS5967634A (ja) 半導体装置の加工方法
JP2928847B2 (ja) 真空密着焼付装置
JPH0627644A (ja) ペリクルおよびペリクルの製造方法
JPS63188942A (ja) レジスト光硬化装置
JPH07111258A (ja) X線マスク用バックエッチング装置
JPH04356037A (ja) 真空密着焼付方法及び真空密着焼付装置
JPH0950132A (ja) マスクフィルムを基板面に密着させる方法
JP2003015324A (ja) 露光装置
KR100194403B1 (ko) 진공밀착인화장치,인화대 및 인화방법