JPH07168366A - 露光装置 - Google Patents
露光装置Info
- Publication number
- JPH07168366A JPH07168366A JP5235351A JP23535193A JPH07168366A JP H07168366 A JPH07168366 A JP H07168366A JP 5235351 A JP5235351 A JP 5235351A JP 23535193 A JP23535193 A JP 23535193A JP H07168366 A JPH07168366 A JP H07168366A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- film
- substrate
- exposure
- masks
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 22
- 239000007779 soft material Substances 0.000 claims description 7
- 239000012530 fluid Substances 0.000 claims description 4
- 238000003825 pressing Methods 0.000 claims description 3
- 230000006837 decompression Effects 0.000 claims description 2
- 230000005540 biological transmission Effects 0.000 claims 2
- 239000011521 glass Substances 0.000 abstract description 16
- 238000000034 method Methods 0.000 abstract description 6
- 239000003570 air Substances 0.000 description 23
- 239000002184 metal Substances 0.000 description 4
- 238000012856 packing Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 239000012080 ambient air Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/02—Exposure apparatus for contact printing
- G03B27/14—Details
- G03B27/18—Maintaining or producing contact pressure between original and light-sensitive material
- G03B27/20—Maintaining or producing contact pressure between original and light-sensitive material by using a vacuum or fluid pressure
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5235351A JPH07168366A (ja) | 1993-08-26 | 1993-08-26 | 露光装置 |
| TW083101434A TW288255B (cs) | 1993-08-26 | 1994-02-21 | |
| GB9413941A GB2281980A (en) | 1993-08-26 | 1994-07-11 | Printing frame |
| KR1019940017474A KR950006540A (ko) | 1993-08-26 | 1994-07-20 | 노광 장치(aligner) |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5235351A JPH07168366A (ja) | 1993-08-26 | 1993-08-26 | 露光装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH07168366A true JPH07168366A (ja) | 1995-07-04 |
Family
ID=16984807
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5235351A Pending JPH07168366A (ja) | 1993-08-26 | 1993-08-26 | 露光装置 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPH07168366A (cs) |
| KR (1) | KR950006540A (cs) |
| GB (1) | GB2281980A (cs) |
| TW (1) | TW288255B (cs) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100315950B1 (ko) * | 1999-12-15 | 2001-12-24 | 김규환 | 라벨용 열전사지의 제조방법 및 그 제조방법에 의하여제조된 라벨용 열전사지 |
| FR2822968B1 (fr) * | 2001-03-28 | 2003-08-15 | Automa Tech Sa | Chassis d'exposition a la lumiere d'un circuit imprime |
| FR2822966B1 (fr) * | 2001-03-28 | 2003-12-12 | Automa Tech Sa | Chassis d'exposition a la lumiere d'un circuit imprime |
| KR20030054444A (ko) * | 2001-12-26 | 2003-07-02 | 한맥전자 (주) | 감광성 레지스터로 적층된 인쇄 회로 기판용 노광장치의진공흡입판과 마스크캐리어장치 |
| FR2842617B1 (fr) * | 2002-07-17 | 2005-01-21 | Automa Tech Sa | Machine d'exposition de panneaux de circuit imprime |
| EP1494075B1 (en) | 2003-06-30 | 2008-06-25 | ASML Netherlands B.V. | Lithographic projection apparatus and device manufacturing method |
| FR2917850B1 (fr) * | 2007-10-12 | 2009-10-16 | Automa Tech Sa | Machine d'exposition pour panneaux de circuit imprime |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1222299A (en) * | 1969-10-20 | 1971-02-10 | Charles Game | An improved apparatus for use in the reproduction of sheet originals |
| GB1511332A (en) * | 1974-04-30 | 1978-05-17 | Hoechst Ag | Printing frame |
| US4054383A (en) * | 1976-02-02 | 1977-10-18 | International Business Machines Corporation | Jig and process for contact printing |
| US4504142A (en) * | 1983-09-26 | 1985-03-12 | Richards Sr Chester L | Photography printing frame |
| US4704028A (en) * | 1986-01-24 | 1987-11-03 | Richards Sr Chester L | Vacuum printing frame |
-
1993
- 1993-08-26 JP JP5235351A patent/JPH07168366A/ja active Pending
-
1994
- 1994-02-21 TW TW083101434A patent/TW288255B/zh active
- 1994-07-11 GB GB9413941A patent/GB2281980A/en not_active Withdrawn
- 1994-07-20 KR KR1019940017474A patent/KR950006540A/ko not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| GB9413941D0 (en) | 1994-08-31 |
| KR950006540A (ko) | 1995-03-21 |
| GB2281980A (en) | 1995-03-22 |
| TW288255B (cs) | 1996-10-11 |
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