KR950006540A - 노광 장치(aligner) - Google Patents

노광 장치(aligner) Download PDF

Info

Publication number
KR950006540A
KR950006540A KR1019940017474A KR19940017474A KR950006540A KR 950006540 A KR950006540 A KR 950006540A KR 1019940017474 A KR1019940017474 A KR 1019940017474A KR 19940017474 A KR19940017474 A KR 19940017474A KR 950006540 A KR950006540 A KR 950006540A
Authority
KR
South Korea
Prior art keywords
mask
exposure
substrate
film
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1019940017474A
Other languages
English (en)
Korean (ko)
Inventor
가쓰야 상구
Original Assignee
미즈따니 군지
가부시끼가이샤 아도테크엔지니어링
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미즈따니 군지, 가부시끼가이샤 아도테크엔지니어링 filed Critical 미즈따니 군지
Publication of KR950006540A publication Critical patent/KR950006540A/ko
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/02—Exposure apparatus for contact printing
    • G03B27/14—Details
    • G03B27/18—Maintaining or producing contact pressure between original and light-sensitive material
    • G03B27/20—Maintaining or producing contact pressure between original and light-sensitive material by using a vacuum or fluid pressure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1019940017474A 1993-08-26 1994-07-20 노광 장치(aligner) Ceased KR950006540A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP93/235351 1993-08-26
JP5235351A JPH07168366A (ja) 1993-08-26 1993-08-26 露光装置

Publications (1)

Publication Number Publication Date
KR950006540A true KR950006540A (ko) 1995-03-21

Family

ID=16984807

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940017474A Ceased KR950006540A (ko) 1993-08-26 1994-07-20 노광 장치(aligner)

Country Status (4)

Country Link
JP (1) JPH07168366A (cs)
KR (1) KR950006540A (cs)
GB (1) GB2281980A (cs)
TW (1) TW288255B (cs)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100315950B1 (ko) * 1999-12-15 2001-12-24 김규환 라벨용 열전사지의 제조방법 및 그 제조방법에 의하여제조된 라벨용 열전사지
KR20030054444A (ko) * 2001-12-26 2003-07-02 한맥전자 (주) 감광성 레지스터로 적층된 인쇄 회로 기판용 노광장치의진공흡입판과 마스크캐리어장치

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2822968B1 (fr) * 2001-03-28 2003-08-15 Automa Tech Sa Chassis d'exposition a la lumiere d'un circuit imprime
FR2822966B1 (fr) * 2001-03-28 2003-12-12 Automa Tech Sa Chassis d'exposition a la lumiere d'un circuit imprime
FR2842617B1 (fr) * 2002-07-17 2005-01-21 Automa Tech Sa Machine d'exposition de panneaux de circuit imprime
EP1494075B1 (en) 2003-06-30 2008-06-25 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
FR2917850B1 (fr) * 2007-10-12 2009-10-16 Automa Tech Sa Machine d'exposition pour panneaux de circuit imprime

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1222299A (en) * 1969-10-20 1971-02-10 Charles Game An improved apparatus for use in the reproduction of sheet originals
GB1511332A (en) * 1974-04-30 1978-05-17 Hoechst Ag Printing frame
US4054383A (en) * 1976-02-02 1977-10-18 International Business Machines Corporation Jig and process for contact printing
US4504142A (en) * 1983-09-26 1985-03-12 Richards Sr Chester L Photography printing frame
US4704028A (en) * 1986-01-24 1987-11-03 Richards Sr Chester L Vacuum printing frame

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100315950B1 (ko) * 1999-12-15 2001-12-24 김규환 라벨용 열전사지의 제조방법 및 그 제조방법에 의하여제조된 라벨용 열전사지
KR20030054444A (ko) * 2001-12-26 2003-07-02 한맥전자 (주) 감광성 레지스터로 적층된 인쇄 회로 기판용 노광장치의진공흡입판과 마스크캐리어장치

Also Published As

Publication number Publication date
JPH07168366A (ja) 1995-07-04
GB9413941D0 (en) 1994-08-31
GB2281980A (en) 1995-03-22
TW288255B (cs) 1996-10-11

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Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 19940720

N231 Notification of change of applicant
PN2301 Change of applicant

Patent event date: 19950124

Comment text: Notification of Change of Applicant

Patent event code: PN23011R01D

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 19990109

Comment text: Request for Examination of Application

Patent event code: PA02011R01I

Patent event date: 19940720

Comment text: Patent Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20001030

Patent event code: PE09021S01D

E601 Decision to refuse application
PE0601 Decision on rejection of patent

Patent event date: 20010511

Comment text: Decision to Refuse Application

Patent event code: PE06012S01D

Patent event date: 20001030

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I

N231 Notification of change of applicant
PN2301 Change of applicant

Patent event date: 20010515

Comment text: Notification of Change of Applicant

Patent event code: PN23011R01D