KR930006866A - 페리클 접착장치 - Google Patents

페리클 접착장치 Download PDF

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Publication number
KR930006866A
KR930006866A KR1019920017387A KR920017387A KR930006866A KR 930006866 A KR930006866 A KR 930006866A KR 1019920017387 A KR1019920017387 A KR 1019920017387A KR 920017387 A KR920017387 A KR 920017387A KR 930006866 A KR930006866 A KR 930006866A
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KR
South Korea
Prior art keywords
pellicle
elastic
entire circumference
subscribers
pellicle frame
Prior art date
Application number
KR1019920017387A
Other languages
English (en)
Other versions
KR970001694B1 (ko
Inventor
마사끼 스즈끼
켄타로 신고
Original Assignee
다니이 아끼오
마쯔시다덴기산교 가부시기가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 다니이 아끼오, 마쯔시다덴기산교 가부시기가이샤 filed Critical 다니이 아끼오
Publication of KR930006866A publication Critical patent/KR930006866A/ko
Application granted granted Critical
Publication of KR970001694B1 publication Critical patent/KR970001694B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C65/00—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor
    • B29C65/02—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor by heating, with or without pressure
    • B29C65/40—Applying molten plastics, e.g. hot melt
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/17—Surface bonding means and/or assemblymeans with work feeding or handling means
    • Y10T156/1702—For plural parts or plural areas of single part
    • Y10T156/1744—Means bringing discrete articles into assembled relationship

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Mechanical Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Lining Or Joining Of Plastics Or The Like (AREA)
  • Joining Of Glass To Other Materials (AREA)

Abstract

본 발명은 페리클 프레임의 전체둘레를 완전접착하고, 먼지의 침입을 방지해서 노광 결함을 방지할 수 있는 페리클 접착장치를 제공하는 것을 목적으로 하는 것으로서, 그 구성에 있어서, 페리클 프레임(4),(5)의 가압력에 비해, 가압시 변형에 대한 반발력이 충분히 작은 탄성 가입자(37),(38)과, 페리클 프레임(4),(5)전체 둘레를 따라서 탄성 가입자(37),(38)을 개재해서 유체 압력을 균일하게 가하는 아압수단을 설정하므로서, 레크릴 유리(1)과 페리클 프레임(4),(5)를 균일하게 접착할 수 있는 것을 특징으로 한다.

Description

페리클 접착장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 일 실시예에 있어서의 페리클 접착 장치의 단면도,
제2도는 동장치로부터 가공된 레크틸유리에 페리클 프레임을 접착한 것을 표시한 도면,
제3도(a)는 본 발명의 일 실시예에 있어서의 페리클 접착 장치의 지지플레이트 및 튜브를 표시한 구성도,
제3도(b)는 본발명의 제2의 실시예에 있어서의 페리클 접착장치의 구성도.

Claims (1)

  1. 레크틸 유리의 양면 또는 한쪽면에 페리클 프레임을 가압 접착하는 페리클 접착장치에 있어서, 페리클 프레임에의 가압력에 비해, 가압시 변형에 대한 반발력이 충분히 작은 탄성 가압자와 페리클 프레임 전체둘레를 따라서 탄성 가압자를 개재해서 유체 압력을 균일하게 가하는 가압수단을 가진 것을 특징으로 하는 페리클 접착 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019920017387A 1991-09-27 1992-09-24 페리클 접착장치 KR970001694B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP91-248790 1991-09-27
JP3248790A JP2814785B2 (ja) 1991-09-27 1991-09-27 ペリクル接着装置

Publications (2)

Publication Number Publication Date
KR930006866A true KR930006866A (ko) 1993-04-22
KR970001694B1 KR970001694B1 (ko) 1997-02-13

Family

ID=17183440

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920017387A KR970001694B1 (ko) 1991-09-27 1992-09-24 페리클 접착장치

Country Status (3)

Country Link
US (1) US5311250A (ko)
JP (1) JP2814785B2 (ko)
KR (1) KR970001694B1 (ko)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5422704A (en) * 1992-07-13 1995-06-06 Intel Corporation Pellicle frame
JPH0772617A (ja) * 1993-09-02 1995-03-17 Shin Etsu Chem Co Ltd ペリクル
US5953107A (en) 1997-03-07 1999-09-14 Taiwan Semiconductor Manufacturing Company, Ltd. Mask pellicle remove tool
US6639650B2 (en) * 1999-12-21 2003-10-28 Shin-Etsu Chemical Co., Ltd. Light exposure method, light exposure apparatus, pellicle and method for relieving warpage of pellicle membrane
US6654077B1 (en) * 2000-01-18 2003-11-25 Aurora Systems, Inc. Precision surface mount for a display device
US6619359B2 (en) 2001-02-16 2003-09-16 Brooks Automation, Inc. Pellicle mounting apparatus
US6734445B2 (en) * 2001-04-23 2004-05-11 Intel Corporation Mechanized retractable pellicles and methods of use
DE10330907A1 (de) * 2003-07-07 2005-02-03 Dynamic Microsystems Semiconductor Equipment Gmbh Vorrichtung und Verfahren zum Bearbeiten einer Maskenvorlage für die Halbleiterherstellung
JP2007510937A (ja) * 2003-10-06 2007-04-26 トッパン、フォウタマスクス、インク フォトマスク上にペリクル・アセンブリを自動的に装着するシステムおよび方法。
US6862817B1 (en) * 2003-11-12 2005-03-08 Asml Holding N.V. Method and apparatus for kinematic registration of a reticle
US20050157288A1 (en) * 2003-11-26 2005-07-21 Sematech, Inc. Zero-force pellicle mount and method for manufacturing the same
KR100624643B1 (ko) * 2005-09-09 2006-09-15 민경준 페리클 접착장치
KR100596025B1 (ko) 2005-12-07 2006-07-03 권선용 펠리클 프레임용 지그어셈블리
KR100742176B1 (ko) * 2006-01-27 2007-07-24 주식회사 피케이엘 페리클 부착장치
KR100837282B1 (ko) 2007-06-14 2008-06-12 삼성전자주식회사 비휘발성 메모리 장치, 그것을 포함하는 메모리 시스템,그것의 프로그램 방법 및 읽기 방법
KR101357305B1 (ko) 2007-08-29 2014-01-28 삼성전자주식회사 펠리클 부착 장치 및 이를 이용한 펠리클 부착 방법
WO2009044483A1 (ja) * 2007-10-05 2009-04-09 Asahi Kasei Emd Corporation ペリクル貼付装置のペリクル加圧機構
US8268514B2 (en) * 2009-01-26 2012-09-18 Taiwan Semiconductor Manufacturing Co., Ltd. Pellicle mounting method and apparatus
CN102472901B (zh) * 2009-07-22 2014-10-15 夏普株式会社 液晶显示装置的制造装置和液晶显示装置的制造方法
JP5600921B2 (ja) * 2009-10-19 2014-10-08 凸版印刷株式会社 ペリクル貼付装置
JP2012112998A (ja) * 2010-11-19 2012-06-14 Shin Etsu Chem Co Ltd リソグラフィ用ペリクルの貼り付け方法および装置
US9256142B2 (en) * 2013-03-11 2016-02-09 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle mounting system and method
CN113853550A (zh) * 2019-02-28 2021-12-28 Asml荷兰有限公司 用于组装掩模版组件的设备

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4443098A (en) * 1982-12-21 1984-04-17 General Signal Corporation Pellicle mounting fixture
JPS6238468A (ja) * 1985-08-13 1987-02-19 Oki Electric Ind Co Ltd ペリクル装着装置
US4637713A (en) * 1985-09-27 1987-01-20 Scss Instruments, Inc. Pellicle mounting apparatus
KR910009320B1 (ko) * 1986-08-19 1991-11-09 미쓰비시 마테리알 가부시기가이샤 연마장치
JPS6371852A (ja) * 1986-09-16 1988-04-01 Hitachi Ltd 組立装置

Also Published As

Publication number Publication date
JPH0588358A (ja) 1993-04-09
JP2814785B2 (ja) 1998-10-27
US5311250A (en) 1994-05-10
KR970001694B1 (ko) 1997-02-13

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