JPH06112253A - 半導体素子用ボンディング線 - Google Patents
半導体素子用ボンディング線Info
- Publication number
- JPH06112253A JPH06112253A JP4262216A JP26221692A JPH06112253A JP H06112253 A JPH06112253 A JP H06112253A JP 4262216 A JP4262216 A JP 4262216A JP 26221692 A JP26221692 A JP 26221692A JP H06112253 A JPH06112253 A JP H06112253A
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- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L24/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
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- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05599—Material
- H01L2224/056—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05617—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
- H01L2224/05624—Aluminium [Al] as principal constituent
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/4501—Shape
- H01L2224/45012—Cross-sectional shape
- H01L2224/45015—Cross-sectional shape being circular
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45144—Gold (Au) as principal constituent
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/485—Material
- H01L2224/48505—Material at the bonding interface
- H01L2224/48599—Principal constituent of the connecting portion of the wire connector being Gold (Au)
- H01L2224/486—Principal constituent of the connecting portion of the wire connector being Gold (Au) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/48617—Principal constituent of the connecting portion of the wire connector being Gold (Au) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950 °C
- H01L2224/48624—Aluminium (Al) as principal constituent
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- Power Engineering (AREA)
- Wire Bonding (AREA)
Abstract
時に、その添加量を適度な範囲として、高温放置試験に
おけるA点剥がれの発生率を低下させる。 【構成】高純度Auに、高純度のPdを0.01〜1wt%含
有せしめ、且つ、Fe,Si,Be,Ca,Ge,Y,
Sc,希土類元素の少なくとも1種を0.0001〜0.005 wt
%含有せしめて溶解鋳造し、次に溝ロール加工を施し、
その途中で焼なまし処理を施した後に線引加工し、更に
十分な応力除去を行って線径25μmの母線を成形した。
Description
極と基板上の外部リードとを接続するために用いられる
半導体素子用ボンディングAu線、特にワイヤボンディ
ング法及びバンプ接続法に好適なものに関する。
垂下せしめたAu線の先端を電気トーチにより溶融させ
てボールを形成し、このボールをチップ上のAl又はA
l合金からなる電極に圧着・切断してバンプ電極を形成
するバンプ接続法や、前記ボールをチップ電極に圧着,
接合せしめた後、ループ状に外部リードまで導いて該外
部リードに圧着・切断することにより、チップ電極と外
部リードを接続させるワイヤボンディング法が知られて
いる。また、この種ボンディングに用いるに有用なAu
線として、特公昭62−23455号,特開平2−91
944号に開示されるような、所定範囲量のPdを添加
してなるものがある。
ボンディング線では、Pdの1wt%以上の添加によって
Au線における強度の向上は図れるものの、チップ上の
Al電極とボールとの接合面(即ち、A点)におけるA
uとAlの相互拡散が阻害され、その結果、ボンディン
グ後の高温放置試験におけるA点剥がれの発生率が高く
なるという不具合があった。
れたものであり、その目的とするところは、Pdの添加
によりAu線の強度向上を図ると同時に、高温放置試験
におけるA点剥がれの発生率を低下させることにある。
めに、本発明の半導体素子用ボンディング線は、高純度
Auに、高純度のPdを0.01〜1wt%含有せしめる
と共に、Fe,Si,Be,Ca,Ge,Y,Sc,希
土類元素の中から少なくとも1種を、総添加量0.00
01〜0.005wt%含有せしめたことを特徴とする。
〜1wt%の範囲内とし、且つFe,Si,Be,Ca,
Ge,Y,Sc,希土類元素の中から少なくとも1種を
添加することで、Au線の破断強度が向上すると同時
に、ボールとチップ電極の下地金属層との接合面におけ
るAuとAlの相互拡散が適度になされ、該接合面、即
ち、A点における接合強度が改善される。
未満では満足な破断強度が得られないと共に、前記接合
面におけるAuとAlの相互拡散が過剰になり、接合強
度の低下が生じる。また、Pdの添加量が1wt%を越え
ると、前記接合面におけるAuとAlの相互拡散が阻害
されて接合強度が低下し、A点剥がれの発生率が高くな
る。
Y,Sc,希土類元素の総添加量が0.0001wt%未
満だと満足な特性が得られず、また、これら添加元素の
総添加量が0.005wt%を越えると、ボール形成時に
おけるボール形状が安定せず、ボールとチップ電極との
接合強度が低下してA点剥がれの発生率が高くなる。
の範囲に、Fe,Si,Be,Ca,Ge,Y,Sc,
希土類元素の総添加量を0.0001〜0.005wt%
の範囲に、各々設定した。
d,Fe,Si,Be,Ca,Ge,Y,Sc,Laを
表1中に示す含有率に基づき添加して溶解鋳造し、次に
溝ロール加工を施し、その途中で焼なまし処理を施した
後に線引加工で線径25μmの母線に成形し、更に十分
な応力除去を行うことにより各試料とした。
uにPdを添加すると共に、Fe,Si,Be,Ca,
Ge,Y,Sc,希土類元素の代表としてLaを選び、
その中から少なくとも1種を添加した本発明実施品であ
る。また、試料No.15は高純度Auに何も添加しな
い比較品、試料No.16は高純度AuにPdを6wt%
添加せしめた比較品、試料No.17,18はFe,S
i,Be,Ca,Ge,Y,Sc,希土類元素の総添加
量を0.005wt%を越えるものとした比較品、試料N
o.19,20は同添加量を0.0001wt未満とした
比較品である。
のデータを示したが、これ以外の希土類元素はLaと同
質性のため省略した。
により所定の伸び率に合わせた後、破断強度及びA点剥
がれ発生率を測定した。
mにて引張速度10mm/minで引張り試験を行った
時の破断荷重を測定した。
(0.8μm厚)のチップ電極上に所定条件にてボンデ
ィングした後、Alが拡散し易い高温条件下で放置し
(200℃×300時間)、その後にC点(ループ部)
を引張るプルテストを行って、ボンディングワイヤがチ
ップとの接合面から剥がれた割合を計算した。これらの
結果も表1中に示す。
度AuにPdを0.01〜1wt%の範囲内で添加すると
共に、Fe,Si,Be,Ca,Ge,Y,Sc,希土
類元素の中から少なくとも1種を所定量添加すれば、所
望の破断強度が得られると同時に、ボールとチップ電極
の下地金属層との接合面(A点)において剥がれが発生
せず、該接合面における接合強度が改善されることが確
認できた。
dの添加が0.01wt%未満では所定の破断強度が得ら
れないと共に、A点剥がれの発生率が高いこと、試料N
o.16の測定結果から、Pdの添加が1wt%を越える
と、破断強度は満足し得るもののA点剥がれの発生率が
高いことが確認できた。
から、Pdの添加量が0.01〜1wt%の範囲内であっ
ても、Fe,Si,Be,Ca,Ge,Y,Sc,希土
類元素の添加総量が0.0001wt%未満では満足な特
性を得られないことが、0.005wt%を越えるとA点
剥がれが発生することが、夫々確認できた。
線は以上説明したように構成したので、Pdの添加によ
る破断強度の向上効果はそのまま維持しつつ、その添加
量を所定の範囲内に限定し、且つ、Fe,Si,Be,
Ca,Ge,Y,Sc,希土類元素を所定量添加するこ
とで、ボンディング後の高温放置試験におけるA点剥が
れの発生率を著しく低下できる。
度を得られると共に、ボールとチップ電極の接合強度を
著しく改善して、ワイヤボンディング法及びバンプ接続
法に用いるに極めて有用な半導体素子用ボンディング線
を提供できた。
Claims (1)
- 【請求項1】 高純度Auに、高純度のPdを0.01
〜1wt%含有せしめると共に、Fe,Si,Be,C
a,Ge,Y,Sc,希土類元素の中から少なくとも1
種を、総添加量0.0001〜0.005wt%含有せし
めてなる半導体素子用ボンディング線。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4262216A JP3064692B2 (ja) | 1992-09-30 | 1992-09-30 | 半導体素子用ボンディング線 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4262216A JP3064692B2 (ja) | 1992-09-30 | 1992-09-30 | 半導体素子用ボンディング線 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH06112253A true JPH06112253A (ja) | 1994-04-22 |
JP3064692B2 JP3064692B2 (ja) | 2000-07-12 |
Family
ID=17372694
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4262216A Expired - Lifetime JP3064692B2 (ja) | 1992-09-30 | 1992-09-30 | 半導体素子用ボンディング線 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3064692B2 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5945065A (en) * | 1996-07-31 | 1999-08-31 | Tanaka Denshi Kogyo | Method for wedge bonding using a gold alloy wire |
US6159420A (en) * | 1996-05-28 | 2000-12-12 | Tanaka Denshi Kogyo K.K. | Gold alloy wire and method for making a bump |
JP2006032643A (ja) * | 2004-07-15 | 2006-02-02 | Sumitomo Bakelite Co Ltd | 半導体装置 |
JP2012099802A (ja) * | 2010-10-08 | 2012-05-24 | Tatsuta Electric Wire & Cable Co Ltd | ボールボンディング用ワイヤ |
JP2012109556A (ja) * | 2010-10-25 | 2012-06-07 | Tatsuta Electric Wire & Cable Co Ltd | バンプ用ワイヤ |
-
1992
- 1992-09-30 JP JP4262216A patent/JP3064692B2/ja not_active Expired - Lifetime
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6159420A (en) * | 1996-05-28 | 2000-12-12 | Tanaka Denshi Kogyo K.K. | Gold alloy wire and method for making a bump |
US6213382B1 (en) | 1996-05-28 | 2001-04-10 | Tanaka Denshi Kogyo K.K. | Method for making a bump |
US5945065A (en) * | 1996-07-31 | 1999-08-31 | Tanaka Denshi Kogyo | Method for wedge bonding using a gold alloy wire |
JP2006032643A (ja) * | 2004-07-15 | 2006-02-02 | Sumitomo Bakelite Co Ltd | 半導体装置 |
JP4513440B2 (ja) * | 2004-07-15 | 2010-07-28 | 住友ベークライト株式会社 | 半導体装置 |
JP2012099802A (ja) * | 2010-10-08 | 2012-05-24 | Tatsuta Electric Wire & Cable Co Ltd | ボールボンディング用ワイヤ |
JP2012109556A (ja) * | 2010-10-25 | 2012-06-07 | Tatsuta Electric Wire & Cable Co Ltd | バンプ用ワイヤ |
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