JPH0586850B2 - - Google Patents
Info
- Publication number
- JPH0586850B2 JPH0586850B2 JP60108704A JP10870485A JPH0586850B2 JP H0586850 B2 JPH0586850 B2 JP H0586850B2 JP 60108704 A JP60108704 A JP 60108704A JP 10870485 A JP10870485 A JP 10870485A JP H0586850 B2 JPH0586850 B2 JP H0586850B2
- Authority
- JP
- Japan
- Prior art keywords
- sub
- pattern
- deflector
- deflection
- sample stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10870485A JPS61267320A (ja) | 1985-05-21 | 1985-05-21 | 荷電ビ−ム露光方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10870485A JPS61267320A (ja) | 1985-05-21 | 1985-05-21 | 荷電ビ−ム露光方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61267320A JPS61267320A (ja) | 1986-11-26 |
JPH0586850B2 true JPH0586850B2 (enrdf_load_stackoverflow) | 1993-12-14 |
Family
ID=14491498
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10870485A Granted JPS61267320A (ja) | 1985-05-21 | 1985-05-21 | 荷電ビ−ム露光方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61267320A (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07111945B2 (ja) * | 1987-05-15 | 1995-11-29 | 東芝機械株式会社 | 荷電ビ−ム描画方法及び描画装置 |
US4818885A (en) * | 1987-06-30 | 1989-04-04 | International Business Machines Corporation | Electron beam writing method and system using large range deflection in combination with a continuously moving table |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59231810A (ja) * | 1983-06-14 | 1984-12-26 | Toshiba Corp | 電子ビ−ム露光装置 |
-
1985
- 1985-05-21 JP JP10870485A patent/JPS61267320A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61267320A (ja) | 1986-11-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |