JPH0577065B2 - - Google Patents

Info

Publication number
JPH0577065B2
JPH0577065B2 JP61118492A JP11849286A JPH0577065B2 JP H0577065 B2 JPH0577065 B2 JP H0577065B2 JP 61118492 A JP61118492 A JP 61118492A JP 11849286 A JP11849286 A JP 11849286A JP H0577065 B2 JPH0577065 B2 JP H0577065B2
Authority
JP
Japan
Prior art keywords
acid
photosensitive
weight
diazo resin
photosensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP61118492A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62275243A (ja
Inventor
Koichiro Aono
Hiroshi Misu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP11849286A priority Critical patent/JPS62275243A/ja
Publication of JPS62275243A publication Critical patent/JPS62275243A/ja
Publication of JPH0577065B2 publication Critical patent/JPH0577065B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP11849286A 1986-05-23 1986-05-23 感光性材料の製造方法 Granted JPS62275243A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11849286A JPS62275243A (ja) 1986-05-23 1986-05-23 感光性材料の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11849286A JPS62275243A (ja) 1986-05-23 1986-05-23 感光性材料の製造方法

Publications (2)

Publication Number Publication Date
JPS62275243A JPS62275243A (ja) 1987-11-30
JPH0577065B2 true JPH0577065B2 (enrdf_load_stackoverflow) 1993-10-25

Family

ID=14738010

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11849286A Granted JPS62275243A (ja) 1986-05-23 1986-05-23 感光性材料の製造方法

Country Status (1)

Country Link
JP (1) JPS62275243A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0812420B2 (ja) * 1988-09-27 1996-02-07 富士写真フイルム株式会社 感光性平版印刷版
JP2627011B2 (ja) * 1990-02-14 1997-07-02 富士写真フイルム株式会社 感光性平版印刷版
US6020436A (en) * 1993-03-09 2000-02-01 The Chromaline Corporation Photosensitive resin composition

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5012139A (enrdf_load_stackoverflow) * 1973-05-29 1975-02-07
JPS603632A (ja) * 1983-06-21 1985-01-10 Fuji Photo Film Co Ltd 感光性平版印刷版
JPS6151142A (ja) * 1984-08-20 1986-03-13 Fuji Photo Film Co Ltd 感光性平版印刷版

Also Published As

Publication number Publication date
JPS62275243A (ja) 1987-11-30

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees