JPH0322617B2 - - Google Patents

Info

Publication number
JPH0322617B2
JPH0322617B2 JP59172958A JP17295884A JPH0322617B2 JP H0322617 B2 JPH0322617 B2 JP H0322617B2 JP 59172958 A JP59172958 A JP 59172958A JP 17295884 A JP17295884 A JP 17295884A JP H0322617 B2 JPH0322617 B2 JP H0322617B2
Authority
JP
Japan
Prior art keywords
acid
weight
photosensitive
diazo resin
printing plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59172958A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6151142A (ja
Inventor
Koichiro Aono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP17295884A priority Critical patent/JPS6151142A/ja
Publication of JPS6151142A publication Critical patent/JPS6151142A/ja
Publication of JPH0322617B2 publication Critical patent/JPH0322617B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP17295884A 1984-08-20 1984-08-20 感光性平版印刷版 Granted JPS6151142A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17295884A JPS6151142A (ja) 1984-08-20 1984-08-20 感光性平版印刷版

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17295884A JPS6151142A (ja) 1984-08-20 1984-08-20 感光性平版印刷版

Publications (2)

Publication Number Publication Date
JPS6151142A JPS6151142A (ja) 1986-03-13
JPH0322617B2 true JPH0322617B2 (enrdf_load_stackoverflow) 1991-03-27

Family

ID=15951511

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17295884A Granted JPS6151142A (ja) 1984-08-20 1984-08-20 感光性平版印刷版

Country Status (1)

Country Link
JP (1) JPS6151142A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62275243A (ja) * 1986-05-23 1987-11-30 Fuji Photo Film Co Ltd 感光性材料の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5033769A (enrdf_load_stackoverflow) * 1973-07-26 1975-04-01
JPS5856986B2 (ja) * 1976-10-05 1983-12-17 東光株式会社 発振素子

Also Published As

Publication number Publication date
JPS6151142A (ja) 1986-03-13

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