JPS62275243A - 感光性材料の製造方法 - Google Patents

感光性材料の製造方法

Info

Publication number
JPS62275243A
JPS62275243A JP11849286A JP11849286A JPS62275243A JP S62275243 A JPS62275243 A JP S62275243A JP 11849286 A JP11849286 A JP 11849286A JP 11849286 A JP11849286 A JP 11849286A JP S62275243 A JPS62275243 A JP S62275243A
Authority
JP
Japan
Prior art keywords
acid
photosensitive
diazo resin
weight
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11849286A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0577065B2 (enrdf_load_stackoverflow
Inventor
Koichiro Aono
青野 小一郎
Hiroshi Misu
三須 寛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP11849286A priority Critical patent/JPS62275243A/ja
Publication of JPS62275243A publication Critical patent/JPS62275243A/ja
Publication of JPH0577065B2 publication Critical patent/JPH0577065B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP11849286A 1986-05-23 1986-05-23 感光性材料の製造方法 Granted JPS62275243A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11849286A JPS62275243A (ja) 1986-05-23 1986-05-23 感光性材料の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11849286A JPS62275243A (ja) 1986-05-23 1986-05-23 感光性材料の製造方法

Publications (2)

Publication Number Publication Date
JPS62275243A true JPS62275243A (ja) 1987-11-30
JPH0577065B2 JPH0577065B2 (enrdf_load_stackoverflow) 1993-10-25

Family

ID=14738010

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11849286A Granted JPS62275243A (ja) 1986-05-23 1986-05-23 感光性材料の製造方法

Country Status (1)

Country Link
JP (1) JPS62275243A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0290163A (ja) * 1988-09-27 1990-03-29 Fuji Photo Film Co Ltd 感光性平版印刷版
JPH03236052A (ja) * 1990-02-14 1991-10-22 Fuji Photo Film Co Ltd 感光性平版印刷版
US5506089A (en) * 1993-03-09 1996-04-09 The Chromaline Corporation Photosensitive resin composition

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5012139A (enrdf_load_stackoverflow) * 1973-05-29 1975-02-07
JPS603632A (ja) * 1983-06-21 1985-01-10 Fuji Photo Film Co Ltd 感光性平版印刷版
JPS6151142A (ja) * 1984-08-20 1986-03-13 Fuji Photo Film Co Ltd 感光性平版印刷版

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5012139A (enrdf_load_stackoverflow) * 1973-05-29 1975-02-07
JPS603632A (ja) * 1983-06-21 1985-01-10 Fuji Photo Film Co Ltd 感光性平版印刷版
JPS6151142A (ja) * 1984-08-20 1986-03-13 Fuji Photo Film Co Ltd 感光性平版印刷版

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0290163A (ja) * 1988-09-27 1990-03-29 Fuji Photo Film Co Ltd 感光性平版印刷版
JPH03236052A (ja) * 1990-02-14 1991-10-22 Fuji Photo Film Co Ltd 感光性平版印刷版
US5506089A (en) * 1993-03-09 1996-04-09 The Chromaline Corporation Photosensitive resin composition

Also Published As

Publication number Publication date
JPH0577065B2 (enrdf_load_stackoverflow) 1993-10-25

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees