JPH0573826B2 - - Google Patents

Info

Publication number
JPH0573826B2
JPH0573826B2 JP58176666A JP17666683A JPH0573826B2 JP H0573826 B2 JPH0573826 B2 JP H0573826B2 JP 58176666 A JP58176666 A JP 58176666A JP 17666683 A JP17666683 A JP 17666683A JP H0573826 B2 JPH0573826 B2 JP H0573826B2
Authority
JP
Japan
Prior art keywords
dust
vacuum chamber
clean gas
vacuum
workpiece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58176666A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6067664A (ja
Inventor
Tomitaro Koyama
Hisayoshi Sano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP17666683A priority Critical patent/JPS6067664A/ja
Publication of JPS6067664A publication Critical patent/JPS6067664A/ja
Publication of JPH0573826B2 publication Critical patent/JPH0573826B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP17666683A 1983-09-24 1983-09-24 真空成膜装置 Granted JPS6067664A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17666683A JPS6067664A (ja) 1983-09-24 1983-09-24 真空成膜装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17666683A JPS6067664A (ja) 1983-09-24 1983-09-24 真空成膜装置

Publications (2)

Publication Number Publication Date
JPS6067664A JPS6067664A (ja) 1985-04-18
JPH0573826B2 true JPH0573826B2 (enrdf_load_stackoverflow) 1993-10-15

Family

ID=16017580

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17666683A Granted JPS6067664A (ja) 1983-09-24 1983-09-24 真空成膜装置

Country Status (1)

Country Link
JP (1) JPS6067664A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62205268A (ja) * 1986-03-04 1987-09-09 Ulvac Corp 真空処理槽のクリ−ニング装置
JPH03219069A (ja) * 1990-01-24 1991-09-26 Mitsubishi Kasei Corp 真空槽のクリーニング方法
JP3838878B2 (ja) 2000-04-28 2006-10-25 松下電器産業株式会社 電池用電極板およびその製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS591677A (ja) * 1982-06-29 1984-01-07 Citizen Watch Co Ltd イオンプレ−テイング装置

Also Published As

Publication number Publication date
JPS6067664A (ja) 1985-04-18

Similar Documents

Publication Publication Date Title
JP3367421B2 (ja) 被処理体の収納装置及び搬出入ステージ
JPH07105365B2 (ja) タングステンの選択的付着方法
KR100248562B1 (ko) 진공처리장치
JP3012328B2 (ja) 圧力密閉室内の基板をガス中の汚染物質から保護する方法および装置
JPH0573826B2 (enrdf_load_stackoverflow)
JP3020567B2 (ja) 真空処理方法
JP4116149B2 (ja) 枚葉式ロードロック装置
JPH09298136A (ja) 基板処理方法およびその装置
JP2006147859A (ja) 処理装置及び処理方法
JP2003515244A (ja) 半導体ウェーハから汚染物を減らす方法と装置
US5900047A (en) Exhaust system for a semiconductor etcher that utilizes corrosive gas
JPH04272643A (ja) イオン注入装置およびイオン注入方法
JPH0693427A (ja) 真空成膜方法
JP3595508B2 (ja) 半導体製造装置
JPH06158284A (ja) 真空装置
JPH0598434A (ja) マルチチヤンバー型スパツタリング装置
JPH06224097A (ja) 真空排気装置
JPS6037871B2 (ja) スパッタリング装置の作動方法
JPH04154121A (ja) スパッタリング装置
JP2814864B2 (ja) エアーロック室、イオン注入装置、並びに、エアーロック室のクリーニング方法
JPH0245920A (ja) 半導体製造装置
JPH04228499A (ja) 真空装置
JP2002198411A (ja) 圧力制御方法、搬送装置およびクラスタツール
JPH11162934A (ja) 半導体製造装置
JPH0580591B2 (enrdf_load_stackoverflow)