JPH0560252B2 - - Google Patents
Info
- Publication number
- JPH0560252B2 JPH0560252B2 JP59230355A JP23035584A JPH0560252B2 JP H0560252 B2 JPH0560252 B2 JP H0560252B2 JP 59230355 A JP59230355 A JP 59230355A JP 23035584 A JP23035584 A JP 23035584A JP H0560252 B2 JPH0560252 B2 JP H0560252B2
- Authority
- JP
- Japan
- Prior art keywords
- alignment
- manual
- mask
- wafer
- manual processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59230355A JPS61110428A (ja) | 1984-11-02 | 1984-11-02 | 半導体焼付装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59230355A JPS61110428A (ja) | 1984-11-02 | 1984-11-02 | 半導体焼付装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61110428A JPS61110428A (ja) | 1986-05-28 |
JPH0560252B2 true JPH0560252B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-09-01 |
Family
ID=16906558
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59230355A Granted JPS61110428A (ja) | 1984-11-02 | 1984-11-02 | 半導体焼付装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61110428A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR910008036B1 (ko) * | 1987-11-04 | 1991-10-07 | 구보다 뎃꼬오 가부시끼가이샤 | 트랙터 추진축의 전동구조 |
JP3013359B2 (ja) * | 1989-04-12 | 2000-02-28 | キヤノン株式会社 | 半導体露光装置 |
JPH05172191A (ja) * | 1991-12-19 | 1993-07-09 | Mitsubishi Motors Corp | スライディングギア |
CN109870885A (zh) * | 2017-12-05 | 2019-06-11 | 山东华光光电子股份有限公司 | 一种手动光刻机的预对准方法及预对准装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59101830A (ja) * | 1982-12-01 | 1984-06-12 | Canon Inc | 転写装置 |
-
1984
- 1984-11-02 JP JP59230355A patent/JPS61110428A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61110428A (ja) | 1986-05-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |