JPH0555859B2 - - Google Patents
Info
- Publication number
- JPH0555859B2 JPH0555859B2 JP60026994A JP2699485A JPH0555859B2 JP H0555859 B2 JPH0555859 B2 JP H0555859B2 JP 60026994 A JP60026994 A JP 60026994A JP 2699485 A JP2699485 A JP 2699485A JP H0555859 B2 JPH0555859 B2 JP H0555859B2
- Authority
- JP
- Japan
- Prior art keywords
- developer
- positive photoresist
- resist
- ethylene glycol
- polyethylene glycol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2699485A JPS61185745A (ja) | 1985-02-14 | 1985-02-14 | ポジ型フオトレジスト現像液組成物 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2699485A JPS61185745A (ja) | 1985-02-14 | 1985-02-14 | ポジ型フオトレジスト現像液組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61185745A JPS61185745A (ja) | 1986-08-19 |
JPH0555859B2 true JPH0555859B2 (enrdf_load_html_response) | 1993-08-18 |
Family
ID=12208710
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2699485A Granted JPS61185745A (ja) | 1985-02-14 | 1985-02-14 | ポジ型フオトレジスト現像液組成物 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61185745A (enrdf_load_html_response) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4027299A1 (de) * | 1990-08-29 | 1992-03-05 | Hoechst Ag | Entwicklerzusammensetzung fuer bestrahlte, strahlungsempfindliche, positiv und negativ arbeitende sowie umkehrbare reprographische schichten und verfahren zur entwicklung solcher schichten |
JP2546451B2 (ja) * | 1991-05-21 | 1996-10-23 | 東レ株式会社 | 水なし平版印刷版用現像液 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50158280A (enrdf_load_html_response) * | 1974-06-10 | 1975-12-22 | ||
JPS608494B2 (ja) * | 1978-03-01 | 1985-03-04 | 富士通株式会社 | ポジ型レジスト像の形成法 |
JPS589413A (ja) * | 1981-07-09 | 1983-01-19 | Victor Co Of Japan Ltd | 音声信号伝送回路 |
JPS61167948A (ja) * | 1985-01-21 | 1986-07-29 | Mitsubishi Chem Ind Ltd | ポジ型感光性組成物用現像液 |
-
1985
- 1985-02-14 JP JP2699485A patent/JPS61185745A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61185745A (ja) | 1986-08-19 |
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