JPH0544171B2 - - Google Patents

Info

Publication number
JPH0544171B2
JPH0544171B2 JP57105519A JP10551982A JPH0544171B2 JP H0544171 B2 JPH0544171 B2 JP H0544171B2 JP 57105519 A JP57105519 A JP 57105519A JP 10551982 A JP10551982 A JP 10551982A JP H0544171 B2 JPH0544171 B2 JP H0544171B2
Authority
JP
Japan
Prior art keywords
scaling value
stage
input
pattern
start position
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57105519A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58223324A (ja
Inventor
Hideo Nakamura
Shinsuke Tamura
Takeshi Kono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP10551982A priority Critical patent/JPS58223324A/ja
Publication of JPS58223324A publication Critical patent/JPS58223324A/ja
Publication of JPH0544171B2 publication Critical patent/JPH0544171B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP10551982A 1982-06-21 1982-06-21 描画装置 Granted JPS58223324A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10551982A JPS58223324A (ja) 1982-06-21 1982-06-21 描画装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10551982A JPS58223324A (ja) 1982-06-21 1982-06-21 描画装置

Publications (2)

Publication Number Publication Date
JPS58223324A JPS58223324A (ja) 1983-12-24
JPH0544171B2 true JPH0544171B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-07-05

Family

ID=14409843

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10551982A Granted JPS58223324A (ja) 1982-06-21 1982-06-21 描画装置

Country Status (1)

Country Link
JP (1) JPS58223324A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0282513A (ja) * 1988-09-19 1990-03-23 Jeol Ltd 荷電粒子ビーム描画方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57107035A (en) * 1980-12-25 1982-07-03 Toshiba Mach Co Ltd Drawing system by electron ray

Also Published As

Publication number Publication date
JPS58223324A (ja) 1983-12-24

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