JPH0524495B2 - - Google Patents

Info

Publication number
JPH0524495B2
JPH0524495B2 JP61246835A JP24683586A JPH0524495B2 JP H0524495 B2 JPH0524495 B2 JP H0524495B2 JP 61246835 A JP61246835 A JP 61246835A JP 24683586 A JP24683586 A JP 24683586A JP H0524495 B2 JPH0524495 B2 JP H0524495B2
Authority
JP
Japan
Prior art keywords
plate material
photosensitive resin
photosensitive
resin plate
dye
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP61246835A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62229127A (ja
Inventor
Yasushi Umeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Priority to ES86202205T priority Critical patent/ES2060579T3/es
Priority to DE3689949T priority patent/DE3689949T2/de
Priority to CA000524766A priority patent/CA1325354C/en
Priority to EP86202205A priority patent/EP0225676B1/en
Priority to AU66356/86A priority patent/AU593046B2/en
Publication of JPS62229127A publication Critical patent/JPS62229127A/ja
Priority to US07/525,116 priority patent/US5039592A/en
Publication of JPH0524495B2 publication Critical patent/JPH0524495B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP24683586A 1985-12-09 1986-10-16 感光性樹脂版材 Granted JPS62229127A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
ES86202205T ES2060579T3 (es) 1985-12-09 1986-12-08 Material de impresion a base de resina fotosensible.
DE3689949T DE3689949T2 (de) 1985-12-09 1986-12-08 Druckmaterial auf der Basis eines lichtempfindlichen Harzes.
CA000524766A CA1325354C (en) 1985-12-09 1986-12-08 Photosensitive resin base printing material
EP86202205A EP0225676B1 (en) 1985-12-09 1986-12-08 Photosensitive resin base printing material
AU66356/86A AU593046B2 (en) 1985-12-09 1986-12-09 Photosensitive resin base printing material
US07/525,116 US5039592A (en) 1985-12-09 1990-05-17 Photosensitive resin base material for making relief printing plates having a slip layer containing a blue anthroquinone

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP60-276531 1985-12-09
JP27653185 1985-12-09

Publications (2)

Publication Number Publication Date
JPS62229127A JPS62229127A (ja) 1987-10-07
JPH0524495B2 true JPH0524495B2 (en, 2012) 1993-04-08

Family

ID=17570770

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24683586A Granted JPS62229127A (ja) 1985-12-09 1986-10-16 感光性樹脂版材

Country Status (1)

Country Link
JP (1) JPS62229127A (en, 2012)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62287234A (ja) * 1986-06-06 1987-12-14 Nippon Paint Co Ltd 感光性樹脂版材
JPS6310150A (ja) * 1986-07-02 1988-01-16 Fuotopori Ouka Kk 感光性樹脂版
JP2938886B2 (ja) * 1988-05-18 1999-08-25 東レ株式会社 水なし平版印刷原版
JPH0789218B2 (ja) * 1988-05-24 1995-09-27 東京応化工業株式会社 フレキソ印刷用版材及びその製版方法
JP2977265B2 (ja) * 1990-11-19 1999-11-15 旭化成工業株式会社 感光性エラストマー構成体
WO2000039640A1 (fr) 1998-12-25 2000-07-06 Asahi Kasei Kabushiki Kaisha Cliche flexographique et planche originale pour ce dernier
JP6161961B2 (ja) * 2013-06-04 2017-07-12 シーメット株式会社 硬化性樹脂組成物及び立体造形物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5129137A (en) * 1974-09-04 1976-03-12 Nippon Paint Co Ltd Chakushokukiborigazonosakuseiho
JPS57208556A (en) * 1981-06-18 1982-12-21 Nippon Paint Co Ltd Photosensitive printing plate material
JPS6153645A (ja) * 1984-08-24 1986-03-17 Fuotopori Ouka Kk フレキソ印刷版の製版方法
JPS6169130A (ja) * 1984-09-13 1986-04-09 Toshiba Corp パタ−ン形成方法

Also Published As

Publication number Publication date
JPS62229127A (ja) 1987-10-07

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Legal Events

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R250 Receipt of annual fees

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R250 Receipt of annual fees

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LAPS Cancellation because of no payment of annual fees