JPS5129137A - Chakushokukiborigazonosakuseiho - Google Patents
ChakushokukiborigazonosakuseihoInfo
- Publication number
- JPS5129137A JPS5129137A JP49102175A JP10217574A JPS5129137A JP S5129137 A JPS5129137 A JP S5129137A JP 49102175 A JP49102175 A JP 49102175A JP 10217574 A JP10217574 A JP 10217574A JP S5129137 A JPS5129137 A JP S5129137A
- Authority
- JP
- Japan
- Prior art keywords
- chakushokukiborigazonosakuseiho
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP49102175A JPS5129137A (en) | 1974-09-04 | 1974-09-04 | Chakushokukiborigazonosakuseiho |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP49102175A JPS5129137A (en) | 1974-09-04 | 1974-09-04 | Chakushokukiborigazonosakuseiho |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5129137A true JPS5129137A (en) | 1976-03-12 |
JPS5340538B2 JPS5340538B2 (en) | 1978-10-27 |
Family
ID=14320339
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP49102175A Granted JPS5129137A (en) | 1974-09-04 | 1974-09-04 | Chakushokukiborigazonosakuseiho |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5129137A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5513780A (en) * | 1978-05-09 | 1980-01-30 | Dynachem Corp | Fluoran coupler containing phototropic photosensitive composition |
JPS62229127A (en) * | 1985-12-09 | 1987-10-07 | Nippon Paint Co Ltd | Photosensitive resin block material |
JPS6310150A (en) * | 1986-07-02 | 1988-01-16 | Fuotopori Ouka Kk | Photosensitive resin plate |
KR20230028206A (en) | 2020-06-18 | 2023-02-28 | 마루젠 세끼유가가꾸 가부시키가이샤 | High-purity 4-hydroxystyrene solution, method for producing the same, and method for producing 4-hydroxystyrene-based polymer |
-
1974
- 1974-09-04 JP JP49102175A patent/JPS5129137A/en active Granted
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5513780A (en) * | 1978-05-09 | 1980-01-30 | Dynachem Corp | Fluoran coupler containing phototropic photosensitive composition |
JPS6352369B2 (en) * | 1978-05-09 | 1988-10-18 | Dynachem Corp | |
JPS62229127A (en) * | 1985-12-09 | 1987-10-07 | Nippon Paint Co Ltd | Photosensitive resin block material |
JPH0524495B2 (en) * | 1985-12-09 | 1993-04-08 | Nippon Paint Co Ltd | |
JPS6310150A (en) * | 1986-07-02 | 1988-01-16 | Fuotopori Ouka Kk | Photosensitive resin plate |
KR20230028206A (en) | 2020-06-18 | 2023-02-28 | 마루젠 세끼유가가꾸 가부시키가이샤 | High-purity 4-hydroxystyrene solution, method for producing the same, and method for producing 4-hydroxystyrene-based polymer |
Also Published As
Publication number | Publication date |
---|---|
JPS5340538B2 (en) | 1978-10-27 |