JPH0519831B2 - - Google Patents

Info

Publication number
JPH0519831B2
JPH0519831B2 JP58109928A JP10992883A JPH0519831B2 JP H0519831 B2 JPH0519831 B2 JP H0519831B2 JP 58109928 A JP58109928 A JP 58109928A JP 10992883 A JP10992883 A JP 10992883A JP H0519831 B2 JPH0519831 B2 JP H0519831B2
Authority
JP
Japan
Prior art keywords
thin film
region
insulating film
main electrode
tft
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58109928A
Other languages
English (en)
Japanese (ja)
Other versions
JPS601868A (ja
Inventor
Masafumi Shinho
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP58109928A priority Critical patent/JPS601868A/ja
Publication of JPS601868A publication Critical patent/JPS601868A/ja
Publication of JPH0519831B2 publication Critical patent/JPH0519831B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/6728Vertical TFTs

Landscapes

  • Liquid Crystal (AREA)
  • Thin Film Transistor (AREA)
JP58109928A 1983-06-17 1983-06-17 薄膜トランジスタ Granted JPS601868A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58109928A JPS601868A (ja) 1983-06-17 1983-06-17 薄膜トランジスタ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58109928A JPS601868A (ja) 1983-06-17 1983-06-17 薄膜トランジスタ

Publications (2)

Publication Number Publication Date
JPS601868A JPS601868A (ja) 1985-01-08
JPH0519831B2 true JPH0519831B2 (enrdf_load_stackoverflow) 1993-03-17

Family

ID=14522661

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58109928A Granted JPS601868A (ja) 1983-06-17 1983-06-17 薄膜トランジスタ

Country Status (1)

Country Link
JP (1) JPS601868A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6089958A (ja) * 1983-10-24 1985-05-20 Semiconductor Energy Lab Co Ltd 半導体装置
JPH07120803B2 (ja) * 1985-08-12 1995-12-20 日本電信電話株式会社 絶縁ゲ−ト型薄膜トランジスタ及びその製法
KR950001159B1 (ko) * 1991-12-27 1995-02-11 삼성전자 주식회사 반도체 메모리장치의 박막트랜지스터 및 그 제조방법
KR102551998B1 (ko) * 2018-11-20 2023-07-06 엘지디스플레이 주식회사 수직 구조 트랜지스터 및 전자장치

Also Published As

Publication number Publication date
JPS601868A (ja) 1985-01-08

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