JPH045046Y2 - - Google Patents

Info

Publication number

JPH045046Y2

JPH045046Y2 JP10074785U JP10074785U JPH045046Y2 JP H045046 Y2 JPH045046 Y2 JP H045046Y2 JP 10074785 U JP10074785 U JP 10074785U JP 10074785 U JP10074785 U JP 10074785U JP H045046 Y2 JPH045046 Y2 JP H045046Y2

Authority

JP

Japan

Prior art keywords

magnetic

ferromagnetic metal

metal thin

thin film

oxide

Prior art date

1985-07-02

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired

Links

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• 230000005291 magnetic effect Effects 0.000 claims description 93
• 239000010409 thin film Substances 0.000 claims description 42
• 230000005294 ferromagnetic effect Effects 0.000 claims description 40
• 229910052751 metal Inorganic materials 0.000 claims description 38
• 239000002184 metal Substances 0.000 claims description 38
• 239000010408 film Substances 0.000 claims description 28
• 239000000696 magnetic material Substances 0.000 claims description 26
• 238000005516 engineering process Methods 0.000 claims description 5
• 230000015572 biosynthetic process Effects 0.000 claims description 3
• 239000011162 core material Substances 0.000 description 19
• 239000000758 substrate Substances 0.000 description 15
• 230000001105 regulatory effect Effects 0.000 description 12
• 238000000034 method Methods 0.000 description 9
• 229910045601 alloy Inorganic materials 0.000 description 7
• 239000000956 alloy Substances 0.000 description 7
• 239000000463 material Substances 0.000 description 7
• 230000008569 process Effects 0.000 description 6
• 238000004519 manufacturing process Methods 0.000 description 4
• 238000004804 winding Methods 0.000 description 4
• 229910000859 α-Fe Inorganic materials 0.000 description 4
• 229910004298 SiO 2 Inorganic materials 0.000 description 3
• 239000007769 metal material Substances 0.000 description 3
• 229910000808 amorphous metal alloy Inorganic materials 0.000 description 2
• 229910052804 chromium Inorganic materials 0.000 description 2
• 230000000694 effects Effects 0.000 description 2
• 230000004907 flux Effects 0.000 description 2
• 229910052735 hafnium Inorganic materials 0.000 description 2
• 229910052742 iron Inorganic materials 0.000 description 2
• 229910052759 nickel Inorganic materials 0.000 description 2
• 125000006850 spacer group Chemical group 0.000 description 2
• 238000007740 vapor deposition Methods 0.000 description 2
• 229910052726 zirconium Inorganic materials 0.000 description 2
• 229910017082 Fe-Si Inorganic materials 0.000 description 1
• 229910017133 Fe—Si Inorganic materials 0.000 description 1
• 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
• 229910000676 Si alloy Inorganic materials 0.000 description 1
• 230000009471 action Effects 0.000 description 1
• 239000000853 adhesive Substances 0.000 description 1
• 230000001070 adhesive effect Effects 0.000 description 1
• 229910052790 beryllium Inorganic materials 0.000 description 1
• 229910052796 boron Inorganic materials 0.000 description 1
• 229910052799 carbon Inorganic materials 0.000 description 1
• 239000002131 composite material Substances 0.000 description 1
• 238000005520 cutting process Methods 0.000 description 1
• 230000007547 defect Effects 0.000 description 1
• 238000005137 deposition process Methods 0.000 description 1
• 229910052732 germanium Inorganic materials 0.000 description 1
• 239000011521 glass Substances 0.000 description 1
• 229910052738 indium Inorganic materials 0.000 description 1
• 239000011229 interlayer Substances 0.000 description 1
• 238000007733 ion plating Methods 0.000 description 1
• 238000010884 ion-beam technique Methods 0.000 description 1
• 239000006247 magnetic powder Substances 0.000 description 1
• 229910052748 manganese Inorganic materials 0.000 description 1
• 229910052752 metalloid Inorganic materials 0.000 description 1
• 229910052750 molybdenum Inorganic materials 0.000 description 1
• 229910052758 niobium Inorganic materials 0.000 description 1
• 229910052698 phosphorus Inorganic materials 0.000 description 1
• 239000000843 powder Substances 0.000 description 1
• 229910052761 rare earth metal Inorganic materials 0.000 description 1
• 230000004044 response Effects 0.000 description 1
• 229910052710 silicon Inorganic materials 0.000 description 1
• 238000004544 sputter deposition Methods 0.000 description 1
• 229910052715 tantalum Inorganic materials 0.000 description 1
• 238000000427 thin-film deposition Methods 0.000 description 1
• 229910052718 tin Inorganic materials 0.000 description 1
• 229910052719 titanium Inorganic materials 0.000 description 1
• 230000007704 transition Effects 0.000 description 1
• 229910052721 tungsten Inorganic materials 0.000 description 1
• 238000007738 vacuum evaporation Methods 0.000 description 1