JPH045046Y2 - - Google Patents
Info
- Publication number
- JPH045046Y2 JPH045046Y2 JP10074785U JP10074785U JPH045046Y2 JP H045046 Y2 JPH045046 Y2 JP H045046Y2 JP 10074785 U JP10074785 U JP 10074785U JP 10074785 U JP10074785 U JP 10074785U JP H045046 Y2 JPH045046 Y2 JP H045046Y2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- ferromagnetic metal
- metal thin
- thin film
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005291 magnetic effect Effects 0.000 claims description 93
- 239000010409 thin film Substances 0.000 claims description 42
- 230000005294 ferromagnetic effect Effects 0.000 claims description 40
- 229910052751 metal Inorganic materials 0.000 claims description 38
- 239000002184 metal Substances 0.000 claims description 38
- 239000010408 film Substances 0.000 claims description 28
- 239000000696 magnetic material Substances 0.000 claims description 26
- 238000005516 engineering process Methods 0.000 claims description 5
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 239000011162 core material Substances 0.000 description 19
- 239000000758 substrate Substances 0.000 description 15
- 230000001105 regulatory effect Effects 0.000 description 12
- 238000000034 method Methods 0.000 description 9
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 230000008569 process Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000004804 winding Methods 0.000 description 4
- 229910000859 α-Fe Inorganic materials 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 229910052735 hafnium Inorganic materials 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 229910017082 Fe-Si Inorganic materials 0.000 description 1
- 229910017133 Fe—Si Inorganic materials 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Description
【考案の詳細な説明】
〔産業上の利用分野〕
本考案は磁気ヘツドに関するものであり、特
に、主コア材として強磁性金属薄膜を用い、補助
コア材として磁性フエライトを用いる高周波対応
の磁気ヘツドに関するものである。[Detailed description of the invention] [Field of industrial application] The present invention relates to a magnetic head, and in particular to a magnetic head compatible with high frequencies that uses a ferromagnetic metal thin film as the main core material and magnetic ferrite as the auxiliary core material. It is related to.
本考案は、酸化物磁性材料よりなる磁気コア半
体に真空薄膜形成技術により強磁性金属薄膜を被
着形成し、この強磁性金属薄膜同士を突き合わせ
て磁気ギヤツプを構成してなる磁気ヘツドにおい
て、
磁気記録媒体対接面から見たときに上記磁気ギ
ヤツプに対して非平行に配置される強磁性金属薄
膜と酸化物磁性材料との間に非磁性中間膜を形成
することにより、
強磁性金属薄膜の付着力の弱さを解決し、疑似
ギヤツプの発生がなく、かつ構造的に強い磁気ヘ
ツドを提供しようとするものである。
The present invention provides a magnetic head in which a ferromagnetic metal thin film is deposited on a magnetic core half made of an oxide magnetic material using vacuum thin film formation technology, and the ferromagnetic metal thin films are butted against each other to form a magnetic gap. A ferromagnetic metal thin film is formed by forming a non-magnetic intermediate film between a ferromagnetic metal thin film and an oxide magnetic material that are arranged non-parallel to the magnetic gap when viewed from the surface facing the magnetic recording medium. The aim is to solve the problem of the weak adhesive force of the magnetic head, to provide a magnetic head that is structurally strong and free from pseudo-gaps.
例えばVTR（ビデオテープレコーダ）等の磁気
記録再生装置においては、記録信号の高密度化が
進められており、この高密度記録に対応して磁気
記録媒体として磁性粉にFe，Co，Ni等の強磁性
金属の粉末を用いた、いわゆるメタルテープや、
強磁性金属材料を蒸着等の真空薄膜形成技術によ
りベースフイルム上に直接被着した、いわゆる蒸
着テープ等が使用されるようになつている。
For example, in magnetic recording and reproducing devices such as VTRs (video tape recorders), the recording signal density is increasing, and in response to this high density recording, magnetic powders such as Fe, Co, and Ni are used as magnetic recording media. So-called metal tape using ferromagnetic metal powder,
A so-called vapor deposition tape, etc., in which a ferromagnetic metal material is directly deposited on a base film by a vacuum thin film forming technique such as vapor deposition, has come into use.
この種の磁気記録媒体は、高い抗磁力Hcを有
するので、記録再生に用いる磁気ヘツドのヘツド
材料には、高飽和磁束密度を有することが要求さ
れる。例えば、従来ヘツド材料として多用されて
いるフエライト材では、飽和磁束密度が低く、こ
の高抗磁力化に対処しきれない。 Since this type of magnetic recording medium has a high coercive force Hc, the head material of the magnetic head used for recording and reproduction is required to have a high saturation magnetic flux density. For example, ferrite materials, which have conventionally been widely used as head materials, have a low saturation magnetic flux density and cannot cope with this increase in coercive force.
そこで従来、これら高抗磁力磁気記録媒体に対
応するために、磁気コア部がフエライト等の酸化
物磁性材料からなり、これら各磁気コア部に主コ
ア材として強磁性金属薄膜を被着形成し、これら
強磁性金属薄膜同士を突き合わせて磁気ギヤツプ
を構成するようにした、いわゆる複合型の磁気ヘ
ツドが提案されている。 Conventionally, in order to correspond to these high coercive force magnetic recording media, the magnetic core part is made of an oxide magnetic material such as ferrite, and a ferromagnetic metal thin film is deposited on each of these magnetic core parts as the main core material. A so-called composite magnetic head has been proposed in which these ferromagnetic metal thin films are butted against each other to form a magnetic gap.
ところで、上述の構成の磁気ヘツドにおいて
は、疑似ギヤツプの発生を防ぐために、酸化物磁
性材料からなる磁気コア部に直接強磁性金属薄膜
を形成する必要があるが、この場合にはこれら強
磁性金属薄膜と酸化物磁性材料との付着強度が不
足し、膜ハガレ等の不良が発生し易かつた。
By the way, in the magnetic head with the above configuration, in order to prevent the occurrence of pseudo gaps, it is necessary to form a ferromagnetic metal thin film directly on the magnetic core made of oxide magnetic material. The adhesion strength between the thin film and the oxide magnetic material was insufficient, and defects such as film peeling were likely to occur.
そこで本考案は、疑似ギヤツプを発生すること
なく強磁性金属薄膜の付着強度を向上し、膜ハガ
レ等のない信頼性の高い磁気ヘツドを提供するこ
とを目的とする。 Therefore, an object of the present invention is to improve the adhesion strength of a ferromagnetic metal thin film without generating false gaps, and to provide a highly reliable magnetic head without film peeling.
このような目的を達成するために、本考案の磁
気ヘツドは、酸化物磁性材料よりなる磁気コア半
体に真空薄膜形成技術により強磁性金属薄膜を被
着形成し、この強磁性金属薄膜同士を突き合わせ
て磁気ギヤツプを構成してなる磁気ヘツドにおい
て、磁気記録媒体対接面から見たときに上記磁気
ギヤツプに対して非平行に配置される強磁性金属
薄膜と酸化物磁性材料との間に非磁性中間膜を形
成したことを特徴とするものである。
In order to achieve this purpose, the magnetic head of the present invention has a ferromagnetic metal thin film deposited on a magnetic core half made of an oxide magnetic material using vacuum thin film formation technology, and the ferromagnetic metal thin films are bonded to each other. In a magnetic head formed by abutting against each other to form a magnetic gap, there is a non-contact between a ferromagnetic metal thin film and an oxide magnetic material disposed non-parallel to the magnetic gap when viewed from the surface facing the magnetic recording medium. It is characterized by forming a magnetic intermediate film.
磁気記録媒体対接面から見たときに上記磁気ギ
ヤツプに対して非平行に配置される強磁性金属薄
膜と酸化物磁性材料との間に非磁性中間膜を形成
することにより、これら強磁性金属薄膜と酸化物
磁性材料との付着強度が確保される。また、磁気
ギヤツプに平行な部分には非磁性中間膜は形成さ
れないので、疑似ギヤツプが発生することはな
い。
By forming a non-magnetic intermediate film between the ferromagnetic metal thin film and the oxide magnetic material, which are disposed non-parallel to the magnetic gap when viewed from the surface facing the magnetic recording medium, these ferromagnetic metal Adhesion strength between the thin film and the oxide magnetic material is ensured. Furthermore, since no nonmagnetic intermediate film is formed in the portion parallel to the magnetic gap, no pseudo gap occurs.
以下、本考案を適用した磁気ヘツドの一実施例
について、図面を参照しながら説明する。
An embodiment of a magnetic head to which the present invention is applied will be described below with reference to the drawings.
第１図は本考案を適用した磁気ヘツドの一例を
示す外観斜視図であり、第２図はその磁気テープ
摺接面を示す要部拡大平面図である。 FIG. 1 is an external perspective view showing an example of a magnetic head to which the present invention is applied, and FIG. 2 is an enlarged plan view of the main part showing the sliding surface of the magnetic tape.
この磁気ヘツドにおいては、磁気コア半体１
１，１２が酸化物磁性材料、例えばMn−Zn系フ
エライトで形成され、その当接面付近は、トラツ
ク幅を規制するためのトラツク幅規制溝によつて
両側が略円弧状に切り欠かれている。また、一方
の磁気コア半体１１には、この磁気ヘツドに信号
を供給するためのコイルを巻回するための巻線孔
１７が穿設されている。 In this magnetic head, the magnetic core half 1
1 and 12 are made of an oxide magnetic material, such as Mn-Zn ferrite, and the vicinity of the contact surface is cut out in a substantially arc shape on both sides by track width regulating grooves for regulating the track width. There is. Further, one magnetic core half 11 is provided with a winding hole 17 for winding a coil for supplying signals to the magnetic head.
そして、上記各磁気コア半体１１，１２の当接
面には、上記トラツク幅規制溝内も含んで、それ
ぞれ強磁性金属薄膜１３，１４がフロントギヤツ
プ形成面からバツクギヤツプ形成面に至るまで連
続して被着形成されており、これら強磁性金属薄
膜１３，１４の当接面に形成される平行部分１３
ａ，１４ａ同士を突き当てることにより磁気ギヤ
ツプｇが構成されている。なお、上記トラツク幅
規制溝内には、トラツク幅を規制し強磁性金属薄
膜１３，１４の摩耗を防止するための非磁性材１
５，１６が溶融充填されている。 On the abutment surfaces of the magnetic core halves 11 and 12, including the inside of the track width regulating grooves, ferromagnetic metal thin films 13 and 14 are applied continuously from the front gap forming surface to the back gap forming surface, respectively. A parallel portion 13 is formed on the contact surfaces of these ferromagnetic metal thin films 13 and 14.
A magnetic gap g is formed by abutting a and 14a against each other. In addition, a nonmagnetic material 1 is provided in the track width regulating groove to regulate the track width and prevent wear of the ferromagnetic metal thin films 13 and 14.
5 and 16 are melt-filled.
上記強磁性金属薄膜１３，１４は、強磁性非晶
質金属合金、いわゆるアモルフアス合金（例えば
Fe，Ni，Coの１つ以上の元素とＰ，Ｃ，Ｂ，Si
の１つ以上の元素とからなる合金、またはこれを
主成分としＡ，Ge，Be，Sn，In，Mo，Ｗ，
Ti，Mn，Cr，Zr，Hf，Nb等を含んだ合金等の
メタル−メタロイド系アモルフアス合金、あるい
はCo，Hf，Zr等の遷移元素や希土類元素を主成
分とするメタル−メタル系アモルフアス合金）、
Fe−Ａ−Si系合金、Fe−Ａ系合金、Fe−Si
−Co系合金、Fe−Ni系合金等の強磁性金属材料
により形成され、真空蒸着法、スパツタリング
法、イオンプレーテイング法、クラスター・イオ
ンビーム法等に代表される真空薄膜形成技術によ
り形成される。 The ferromagnetic metal thin films 13 and 14 are made of a ferromagnetic amorphous metal alloy, a so-called amorphous alloy (for example,
One or more elements of Fe, Ni, Co and P, C, B, Si
An alloy consisting of one or more elements of A, Ge, Be, Sn, In, Mo, W,
Metal-metalloid amorphous alloys such as alloys containing Ti, Mn, Cr, Zr, Hf, Nb, etc., or metal-metallic amorphous alloys whose main components are transition elements or rare earth elements such as Co, Hf, Zr) ,
Fe-A-Si alloy, Fe-A alloy, Fe-Si
- Made of ferromagnetic metal materials such as Co-based alloys and Fe-Ni-based alloys, and formed using vacuum thin film forming techniques such as vacuum evaporation, sputtering, ion plating, cluster ion beam methods, etc. .
この強磁性金属薄膜１３，１４と酸化物磁性材
料からなる磁気コア半体１１，１２の界面には、
上記強磁性金属薄膜１３，１４のうち磁気ギヤツ
プｇを構成する部分１３ａ，１４ａと非平行に配
置される部分、すなわちトラツク幅規制溝に被着
される部分１３ｂ，１４ｂにおいて、それぞれ非
磁性中間膜１６が被着形成されている。 At the interface between the ferromagnetic metal thin films 13 and 14 and the magnetic core halves 11 and 12 made of oxide magnetic material,
In the portions of the ferromagnetic metal thin films 13 and 14 that are disposed non-parallel to the portions 13a and 14a constituting the magnetic gap g, that is, the portions 13b and 14b that are adhered to the track width regulating grooves, non-magnetic intermediate films are formed, respectively. 16 is formed by adhesion.
上記非磁性中間膜１６の材質としては、強磁性
金属薄膜と酸化物磁性材料との密着を上げるもの
であれば如何なるものであつてもよいが、具体的
にはTa，Cr，Ti，Ａ等の金属材料やそれらの
酸化物、あるいはSiO2等が挙げられる。この非
磁性中間膜１６を形成することにより、強磁性金
属薄膜１３，１４と磁気コア半体１１，１２の密
着性が向上し、構造的に強いものとなる。また、
この非磁性中間膜１６は、磁気ギヤツプｇと平行
な部分１３ａ，１４ａには形成されないので、疑
似ギヤツプが発生することもない。 The material of the non-magnetic intermediate film 16 may be any material as long as it increases the adhesion between the ferromagnetic metal thin film and the oxide magnetic material, but specific examples include Ta, Cr, Ti, A, etc. metal materials, their oxides, SiO 2 , etc. By forming this nonmagnetic intermediate film 16, the adhesion between the ferromagnetic metal thin films 13 and 14 and the magnetic core halves 11 and 12 is improved, resulting in a stronger structure. Also,
Since this nonmagnetic intermediate film 16 is not formed in the portions 13a and 14a parallel to the magnetic gap g, no pseudo gap occurs.
次に、この実施例を一層明確なものとするため
に、その製造方法について説明する。 Next, in order to make this example more clear, a manufacturing method thereof will be explained.
上記実施例の磁気ヘツドを作製するには、先
ず、第３図に示すように、例えばMn−Zn系フエ
ライト等の酸化物磁性材料基板２０の上面２０
ａ、すなわちこの酸化物磁性材料基板２０におけ
る磁気コア半体突き合わせ時の接合面に、回転砥
石等により断面略半円形状のトラツク幅規制溝２
１を全幅に亘つて複数平行に形成する。 In order to manufacture the magnetic head of the above embodiment, first, as shown in FIG.
a, that is, a track width regulating groove 2 having a substantially semicircular cross section is formed by a rotary grindstone or the like on the joint surface of the oxide magnetic material substrate 20 when the magnetic core halves are butted together.
1 are formed in parallel across the entire width.
次いで、第４図に示すように、この酸化物磁性
材料基板２０の全面に（トラツク幅規制溝内も含
む）、例えばSiO2等の非磁性材を非磁性中間膜２
２として被着形成する。 Next, as shown in FIG. 4, a nonmagnetic material such as SiO 2 is coated over the entire surface of the oxide magnetic material substrate 20 (including inside the track width regulating grooves) as a nonmagnetic intermediate film 2.
2. Adhesion is formed as 2.
続いて、第５図に示すように、上記酸化物磁性
材料基板２０の上面２０ａを平面研削し、接合面
である上面２０ａ上に被着される余分や非磁性中
間膜２２を除去し、上記トラツク幅規制溝２１内
にのみ非磁性中間膜２２が残存するようにする。 Subsequently, as shown in FIG. 5, the upper surface 20a of the oxide magnetic material substrate 20 is ground to remove the excess and non-magnetic intermediate film 22 deposited on the upper surface 20a, which is the bonding surface. The non-magnetic intermediate film 22 is made to remain only within the track width regulating groove 21.
このように、予めトラツク幅規制溝２１内に非
磁性中間膜２２を被着した後、第６図に示すよう
に、強磁性金属薄膜２３を真空薄膜形成技術によ
つて全面に亘つて被着形成する。 In this way, after the non-magnetic intermediate film 22 has been deposited in the track width regulating groove 21 in advance, a ferromagnetic metal thin film 23 is deposited over the entire surface by vacuum thin film forming technology, as shown in FIG. Form.
このとき、上記強磁性金属薄膜２３は、上記非
磁性中間膜２２の作用により、高い付着力により
酸化物磁性材料基板２０に対して被着され、後の
工程において膜ハガレ等の損傷が発生することが
防止される。 At this time, the ferromagnetic metal thin film 23 is adhered to the oxide magnetic material substrate 20 with a high adhesion force due to the action of the non-magnetic intermediate film 22, and damage such as film peeling occurs in later steps. This will be prevented.
上述のような工程により作製される一対の酸化
物磁性材料２０のうち、一方の基板２０に対し
て、第７図に示すように、トラツク幅規制溝２１
と直交する方向に溝加工を施し、巻線溝２４を形
成して酸化物磁性材料基板３０とする。 As shown in FIG. 7, track width regulating grooves 21 are formed on one substrate 20 of the pair of oxide magnetic materials 20 produced by the above-described process.
Groove processing is performed in a direction orthogonal to the winding groove 24 to form an oxide magnetic material substrate 30.
続いて、上記基板２０の上面２０ａか上記基板
３０の上面３０ａのいずれか一方にギヤツプスペ
ーサを被着し、第８図に示すように、これら基板
２０，３０を上記強磁性金属薄膜２３同士が突き
合わされるように接合配置する。そして、これら
基板２０，３０をガラスにより融着すると同時
に、上記トラツク幅規制溝２１内に非磁性材２５
を充填する。なお、上記ギヤツプスペーサとして
は、SiO2，ZrO2，Ta2O5，Cr等が使用される。 Next, a gear spacer is attached to either the upper surface 20a of the substrate 20 or the upper surface 30a of the substrate 30, and as shown in FIG. Arrange the joints so that they match. Then, at the same time as these substrates 20 and 30 are fused together with glass, a non-magnetic material 25 is inserted into the track width regulating groove 21.
Fill it. Note that SiO 2 , ZrO 2 , Ta 2 O 5 , Cr, etc. are used as the gear spacer.
そして、第８図中Ａ−Ａ線及びA′−A′線の位
置でスライシング加工し、複数個のヘツドチツプ
を切り出した後、磁気テープ摺接面を円筒研磨し
て第１図に示す磁気ヘツドを完成する。なお、こ
のとき基板２０，３０に対するスライシング方向
を突き合わせ面に対して傾斜させることにより、
アジマス記録用の磁気ヘツドとすることもでき
る。 After cutting out a plurality of head chips by slicing along the lines A-A and A'-A' in Figure 8, the magnetic tape sliding surface was cylindrically polished to form the magnetic head shown in Figure 1. complete. At this time, by tilting the slicing direction of the substrates 20 and 30 with respect to the abutting surfaces,
It can also be used as a magnetic head for azimuth recording.
ここで、第１図の磁気ヘツドの一方の磁気コア
半体１１は酸化物磁性材料基板３０に対応してお
り、他方の基板１２は基板２０に対応している。
また、非磁性中間膜１６は非磁性中間膜２２に、
強磁性金属薄膜１３，１４は強磁性金属薄膜２３
にそれぞれ対応する。 Here, one magnetic core half 11 of the magnetic head shown in FIG. 1 corresponds to the oxide magnetic material substrate 30, and the other substrate 12 corresponds to the substrate 20.
Further, the non-magnetic intermediate film 16 is attached to the non-magnetic intermediate film 22,
The ferromagnetic metal thin films 13 and 14 are the ferromagnetic metal thin films 23
correspond to each.
このような製造工程により作製される磁気ヘツ
ドにおいては、強磁性金属薄膜２３の基板２０，
３０に対する付着強度が非磁性中間膜２２により
確保され、したがつて後工程での膜ハガレ等が生
ずることなく、信頼性の高いものとなる。 In the magnetic head manufactured by such a manufacturing process, the substrate 20 of the ferromagnetic metal thin film 23,
The adhesion strength to 30 is ensured by the non-magnetic intermediate film 22, so that film peeling and the like do not occur in subsequent steps, resulting in high reliability.
以上、本考案の具体的な実施例について説明し
たが、本考案がこの実施例に限定されるものでは
ない。 Although specific embodiments of the present invention have been described above, the present invention is not limited to these embodiments.
例えば、第９図に示すように、磁気ギヤツプｇ
が磁気テープ摺接面から見たときに凸状の磁気コ
ア半体１１，１２を突き合わせることにより構成
される磁気ヘツドにも適用することができる。こ
の場合、非磁性中間膜１６は、磁気コア半体１
１，１２の磁気ギヤツプｇと直交する面、および
傾斜する面に被着形成される。 For example, as shown in FIG.
The present invention can also be applied to a magnetic head constructed by abutting convex magnetic core halves 11 and 12 when viewed from the magnetic tape sliding surface. In this case, the nonmagnetic intermediate film 16 is the magnetic core half 1
It is adhered and formed on the surfaces perpendicular to the magnetic gap g of Nos. 1 and 12, and on the inclined surface.
あるいは、第１０図に示すように、強磁性金属
薄膜１３，１４が磁気ギヤツプｇを挟んで略Ｘ字
状に形成される磁気ヘツドに適用することも可能
である。この場合には、非磁性中間膜１６を強磁
性金属薄膜１３，１４と酸化物磁性材料である磁
気コア半体１１，１２の界面の全てに亘つて形成
することができる。 Alternatively, as shown in FIG. 10, it is also possible to apply the present invention to a magnetic head in which ferromagnetic metal thin films 13 and 14 are formed in a substantially X-shape with a magnetic gap g in between. In this case, the nonmagnetic intermediate film 16 can be formed over the entire interface between the ferromagnetic metal thin films 13 and 14 and the magnetic core halves 11 and 12 made of oxide magnetic material.
なお、これら第９図および第１０図に示す実施
例において、先の第１図に示す磁気ヘツドと同一
の部材には同一の符号を付してある。 In the embodiments shown in FIGS. 9 and 10, the same members as in the magnetic head shown in FIG. 1 are given the same reference numerals.
以上の説明からも明らかなように、本考案にお
いては、磁気ギヤツプに対して非平行に配置され
る強磁性金属薄膜と酸化物磁性材料との間に非磁
性中間膜を形成しているので、これら強磁性金属
薄膜と酸化物磁性材料との密着性が大幅に向上
し、膜ハガレ等のない信頼性の高い磁気ヘツドと
なつている。
As is clear from the above explanation, in the present invention, a non-magnetic intermediate film is formed between the ferromagnetic metal thin film and the oxide magnetic material, which are arranged non-parallel to the magnetic gap. The adhesion between the ferromagnetic metal thin film and the oxide magnetic material has been greatly improved, resulting in a highly reliable magnetic head free from film peeling.
また、上記非磁性中間膜は、磁気ギヤツプと平
行な部分には形成されないので、疑似ギヤツプが
発生することもなく、良好な記録再生が可能であ
る。 Further, since the non-magnetic intermediate film is not formed in a portion parallel to the magnetic gap, good recording and reproduction is possible without generating a pseudo gap.
第１図は本考案を適用した磁気ヘツドの一実施
例を示す外観斜視図であり、第２図はその磁気テ
ープ摺接面を示す要部拡大平面図である。第３図
ないし第８図は第１図に示す磁気ヘツドの製造工
程をその工程順序に従つて示す概略的な斜視図で
あり、第３図はトラツク幅規制溝形成工程、第４
図は非磁性中間膜被着工程、第５図は平面研削工
程、第６図は強磁性金属薄膜被着工程、第７図は
巻線溝形成工程、第８図は基板接合及びスライシ
ング加工工程をそれぞれ示す。第９図は本考案の
他の実施例における磁気テープ摺接面を示す要部
拡大平面図であり、第１０図は本考案のさらに他
の実施例の磁気テープ摺接面を示す要部拡大平面
図である。
１１，１２……磁気コア半体（酸化物磁性材
料）、１３，１４……強磁性金属薄膜、１６……
非磁性中間膜。
FIG. 1 is an external perspective view showing an embodiment of a magnetic head to which the present invention is applied, and FIG. 2 is an enlarged plan view of the main part showing the sliding surface of the magnetic tape. 3 to 8 are schematic perspective views showing the manufacturing process of the magnetic head shown in FIG. 1 according to the process order, and FIG. 3 is a track width regulating groove forming step,
The figure shows the non-magnetic intermediate film deposition process, Figure 5 shows the surface grinding process, Figure 6 shows the ferromagnetic metal thin film deposition process, Figure 7 shows the winding groove forming process, and Figure 8 shows the substrate bonding and slicing process. are shown respectively. FIG. 9 is an enlarged plan view of a main part showing a magnetic tape sliding contact surface in another embodiment of the present invention, and FIG. 10 is an enlarged main part showing a magnetic tape sliding contact surface in still another embodiment of the present invention. FIG. 11, 12...Magnetic core half (oxide magnetic material), 13, 14...Ferromagnetic metal thin film, 16...
Non-magnetic interlayer.
Claims (1)
膜形成技術により強磁性金属薄膜を被着形成し、
この強磁性金属薄膜同士を突き合わせて磁気ギヤ
ツプを構成してなる磁気ヘツドにおいて、 磁気記録媒体対接面から見たときに上記磁気ギ
ヤツプに対して非平行に配置される強磁性金属薄
膜と酸化物磁性材料との間に非磁性中間膜を形成
したことを特徴とする磁気ヘツド。[Claims for Utility Model Registration] A ferromagnetic metal thin film is deposited on a magnetic core half made of an oxide magnetic material using vacuum thin film formation technology,
In a magnetic head in which a magnetic gap is formed by abutting two ferromagnetic metal thin films, a ferromagnetic metal thin film and an oxide are arranged non-parallel to the magnetic gap when viewed from the surface facing the magnetic recording medium. A magnetic head characterized in that a non-magnetic intermediate film is formed between the head and a magnetic material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10074785U JPH045046Y2 (en) | 1985-07-02 | 1985-07-02 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10074785U JPH045046Y2 (en) | 1985-07-02 | 1985-07-02 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6211217U JPS6211217U (en) | 1987-01-23 |
| JPH045046Y2 true JPH045046Y2 (en) | 1992-02-13 |
Family
ID=30970856
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10074785U Expired JPH045046Y2 (en) | 1985-07-02 | 1985-07-02 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH045046Y2 (en) |
-
1985
- 1985-07-02 JP JP10074785U patent/JPH045046Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6211217U (en) | 1987-01-23 |
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