JPH0430175B2 - - Google Patents
Info
- Publication number
- JPH0430175B2 JPH0430175B2 JP57122026A JP12202682A JPH0430175B2 JP H0430175 B2 JPH0430175 B2 JP H0430175B2 JP 57122026 A JP57122026 A JP 57122026A JP 12202682 A JP12202682 A JP 12202682A JP H0430175 B2 JPH0430175 B2 JP H0430175B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- reticle
- stage
- patterns
- reticle pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 7
- 238000013461 design Methods 0.000 claims description 4
- 238000001514 detection method Methods 0.000 description 26
- 235000012431 wafers Nutrition 0.000 description 18
- 238000012545 processing Methods 0.000 description 10
- 230000006870 function Effects 0.000 description 6
- 238000012937 correction Methods 0.000 description 5
- 238000005286 illumination Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 238000009499 grossing Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000004069 differentiation Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57122026A JPS5913324A (ja) | 1982-07-15 | 1982-07-15 | 縮小投影露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57122026A JPS5913324A (ja) | 1982-07-15 | 1982-07-15 | 縮小投影露光装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3131647A Division JPH05234845A (ja) | 1991-05-08 | 1991-05-08 | 縮小投影露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5913324A JPS5913324A (ja) | 1984-01-24 |
| JPH0430175B2 true JPH0430175B2 (th) | 1992-05-21 |
Family
ID=14825746
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57122026A Granted JPS5913324A (ja) | 1982-07-15 | 1982-07-15 | 縮小投影露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5913324A (th) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0789534B2 (ja) * | 1986-07-04 | 1995-09-27 | キヤノン株式会社 | 露光方法 |
| JP2592475B2 (ja) * | 1987-12-30 | 1997-03-19 | 株式会社日立製作所 | 投影露光装置及びそのパターンオフセツト補正方法 |
| JPH0666244B2 (ja) * | 1989-12-15 | 1994-08-24 | キヤノン株式会社 | 半導体製造方法 |
-
1982
- 1982-07-15 JP JP57122026A patent/JPS5913324A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5913324A (ja) | 1984-01-24 |
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