JPH0410219B2 - - Google Patents

Info

Publication number
JPH0410219B2
JPH0410219B2 JP57182180A JP18218082A JPH0410219B2 JP H0410219 B2 JPH0410219 B2 JP H0410219B2 JP 57182180 A JP57182180 A JP 57182180A JP 18218082 A JP18218082 A JP 18218082A JP H0410219 B2 JPH0410219 B2 JP H0410219B2
Authority
JP
Japan
Prior art keywords
tungsten
silicon
metal
metal film
chloride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57182180A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5972131A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP57182180A priority Critical patent/JPS5972131A/ja
Publication of JPS5972131A publication Critical patent/JPS5972131A/ja
Publication of JPH0410219B2 publication Critical patent/JPH0410219B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10D64/011—

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP57182180A 1982-10-19 1982-10-19 半導体装置の製造方法 Granted JPS5972131A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57182180A JPS5972131A (ja) 1982-10-19 1982-10-19 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57182180A JPS5972131A (ja) 1982-10-19 1982-10-19 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS5972131A JPS5972131A (ja) 1984-04-24
JPH0410219B2 true JPH0410219B2 (show.php) 1992-02-24

Family

ID=16113735

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57182180A Granted JPS5972131A (ja) 1982-10-19 1982-10-19 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS5972131A (show.php)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60119750A (ja) * 1983-12-02 1985-06-27 Hitachi Ltd 半導体装置の製造方法
JPS60245149A (ja) * 1984-05-18 1985-12-04 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
JPS61128521A (ja) * 1984-11-27 1986-06-16 Nippon Telegr & Teleph Corp <Ntt> 半導体装置の製造方法
JPS61203671A (ja) * 1985-03-06 1986-09-09 Nippon Telegr & Teleph Corp <Ntt> 半導体装置の製造方法
JPS6214424A (ja) * 1985-07-11 1987-01-23 Fujitsu Ltd 半導体装置の製造方法
JP2553346B2 (ja) * 1987-04-08 1996-11-13 日本真空技術株式会社 金属薄膜形成方法
US4985371A (en) * 1988-12-09 1991-01-15 At&T Bell Laboratories Process for making integrated-circuit device metallization

Also Published As

Publication number Publication date
JPS5972131A (ja) 1984-04-24

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