JPH0365249U - - Google Patents
Info
- Publication number
- JPH0365249U JPH0365249U JP12726889U JP12726889U JPH0365249U JP H0365249 U JPH0365249 U JP H0365249U JP 12726889 U JP12726889 U JP 12726889U JP 12726889 U JP12726889 U JP 12726889U JP H0365249 U JPH0365249 U JP H0365249U
- Authority
- JP
- Japan
- Prior art keywords
- protective sheet
- top surface
- sheet
- chip
- semiconductors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000001681 protective effect Effects 0.000 claims description 12
- 239000010410 layer Substances 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims description 5
- 239000000853 adhesive Substances 0.000 claims description 3
- 230000001070 adhesive effect Effects 0.000 claims description 3
- 239000012790 adhesive layer Substances 0.000 claims description 3
- 239000000428 dust Substances 0.000 claims 1
- 230000006355 external stress Effects 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68318—Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
- H01L2221/68322—Auxiliary support including means facilitating the selective separation of some of a plurality of devices from the auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
Landscapes
- Laminated Bodies (AREA)
- Adhesive Tapes (AREA)
- Dicing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989127268U JPH0635473Y2 (ja) | 1989-10-30 | 1989-10-30 | 半導体用保護シート |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989127268U JPH0635473Y2 (ja) | 1989-10-30 | 1989-10-30 | 半導体用保護シート |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0365249U true JPH0365249U (enrdf_load_stackoverflow) | 1991-06-25 |
JPH0635473Y2 JPH0635473Y2 (ja) | 1994-09-14 |
Family
ID=31675032
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1989127268U Expired - Lifetime JPH0635473Y2 (ja) | 1989-10-30 | 1989-10-30 | 半導体用保護シート |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0635473Y2 (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010061782A1 (ja) * | 2008-11-25 | 2010-06-03 | 日東電工株式会社 | ダイシング用表面保護テープ及びダイシング用表面保護テープの剥離除去方法 |
JP2010194819A (ja) * | 2009-02-24 | 2010-09-09 | Nitto Denko Corp | 自発巻回性積層シート及び自発巻回性粘着シート |
JP2011054641A (ja) * | 2009-08-31 | 2011-03-17 | Nitto Denko Corp | 被切断体からのダイシング表面保護テープの剥離除去方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS604579A (ja) * | 1983-06-22 | 1985-01-11 | Nitto Electric Ind Co Ltd | マスキング用感圧性接着テ−プまたはシ−ト |
JPS6461208A (en) * | 1987-09-01 | 1989-03-08 | Fsk Kk | Cutting method of wafer |
-
1989
- 1989-10-30 JP JP1989127268U patent/JPH0635473Y2/ja not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS604579A (ja) * | 1983-06-22 | 1985-01-11 | Nitto Electric Ind Co Ltd | マスキング用感圧性接着テ−プまたはシ−ト |
JPS6461208A (en) * | 1987-09-01 | 1989-03-08 | Fsk Kk | Cutting method of wafer |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010061782A1 (ja) * | 2008-11-25 | 2010-06-03 | 日東電工株式会社 | ダイシング用表面保護テープ及びダイシング用表面保護テープの剥離除去方法 |
JP2010129607A (ja) * | 2008-11-25 | 2010-06-10 | Nitto Denko Corp | ダイシング用表面保護テープ及びダイシング用表面保護テープの剥離除去方法 |
JP2010194819A (ja) * | 2009-02-24 | 2010-09-09 | Nitto Denko Corp | 自発巻回性積層シート及び自発巻回性粘着シート |
JP2011054641A (ja) * | 2009-08-31 | 2011-03-17 | Nitto Denko Corp | 被切断体からのダイシング表面保護テープの剥離除去方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0635473Y2 (ja) | 1994-09-14 |
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