JPH0358784B2 - - Google Patents

Info

Publication number
JPH0358784B2
JPH0358784B2 JP56208000A JP20800081A JPH0358784B2 JP H0358784 B2 JPH0358784 B2 JP H0358784B2 JP 56208000 A JP56208000 A JP 56208000A JP 20800081 A JP20800081 A JP 20800081A JP H0358784 B2 JPH0358784 B2 JP H0358784B2
Authority
JP
Japan
Prior art keywords
film
cumulative
aqueous phase
diacetylene
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56208000A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58111029A (ja
Inventor
Hideaki Doi
Teruo Sakagami
Kenichi Kokubu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kureha Corp
Original Assignee
Kureha Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kureha Corp filed Critical Kureha Corp
Priority to JP56208000A priority Critical patent/JPS58111029A/ja
Publication of JPS58111029A publication Critical patent/JPS58111029A/ja
Publication of JPH0358784B2 publication Critical patent/JPH0358784B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Laminated Bodies (AREA)
JP56208000A 1981-12-24 1981-12-24 ジアセチレン化合物累積膜の製造方法 Granted JPS58111029A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56208000A JPS58111029A (ja) 1981-12-24 1981-12-24 ジアセチレン化合物累積膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56208000A JPS58111029A (ja) 1981-12-24 1981-12-24 ジアセチレン化合物累積膜の製造方法

Publications (2)

Publication Number Publication Date
JPS58111029A JPS58111029A (ja) 1983-07-01
JPH0358784B2 true JPH0358784B2 (enExample) 1991-09-06

Family

ID=16549008

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56208000A Granted JPS58111029A (ja) 1981-12-24 1981-12-24 ジアセチレン化合物累積膜の製造方法

Country Status (1)

Country Link
JP (1) JPS58111029A (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2553531B1 (fr) * 1983-10-14 1995-12-29 Canon Kk Monomere photopolymerisable pour milieu d'enregistrement optique et milieu le contenant
JPS60222847A (ja) * 1984-04-20 1985-11-07 Canon Inc 像形成方法
JPS6194041A (ja) * 1984-10-16 1986-05-12 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPS6194042A (ja) * 1984-10-16 1986-05-12 Matsushita Electric Ind Co Ltd 分子構築体およびその製造方法
JPS61180437A (ja) * 1985-02-05 1986-08-13 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPS61203448A (ja) * 1985-03-05 1986-09-09 Mitsubishi Petrochem Co Ltd 光記録媒体
JPS6221151A (ja) * 1985-07-19 1987-01-29 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPH0698960B2 (ja) * 1985-11-21 1994-12-07 住友重機械工業株式会社 航空機用回転ブラシ式洗浄装置の制御装置
JPS62217615A (ja) * 1986-03-19 1987-09-25 Fujitsu Ltd 半導体素子の製造方法
JPH0675194B2 (ja) * 1986-03-31 1994-09-21 キヤノン株式会社 重合性薄膜
JPH0727215B2 (ja) * 1986-05-09 1995-03-29 松下電器産業株式会社 単分子累積膜パタ−ン形成方法
JPH01236207A (ja) * 1987-07-24 1989-09-21 Nippon Steel Corp ポリジアセチレン薄膜の製造法
JPH0678393B2 (ja) * 1987-10-15 1994-10-05 松下電器産業株式会社 ポリアセチレンの製造方法
JPH0678394B2 (ja) * 1987-10-15 1994-10-05 松下電器産業株式会社 ポリアセチレンの製造方法
JPH0667981B2 (ja) * 1988-04-28 1994-08-31 松下電器産業株式会社 ポリアセチレン又はポリアセン型超長共役ポリマーの製造方法
JP2769833B2 (ja) * 1989-02-06 1998-06-25 富士写真フイルム株式会社 金属材料パターンの形成方法

Also Published As

Publication number Publication date
JPS58111029A (ja) 1983-07-01

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